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1.发明授权Apparatus for heating or cooling a polishing surface of a polishing apparatus 有权用于加热或冷却抛光装置的抛光表面的装置公开(公告)号：US07837534B2
公开(公告)日：2010-11-23
申请号：US12155618
申请日：2008-06-06
申请人： Shunichi Aiyoshizawa , Ryuichi Kosuge , Ryo Kato , Yu Ishii
发明人： Shunichi Aiyoshizawa , Ryuichi Kosuge , Ryo Kato , Yu Ishii
IPC分类号： B24B49/00
CPC分类号： B24B37/015 , B24B55/02
摘要： The present invention provides an apparatus for heating or cooling a polishing surface. This apparatus includes a heat exchanger arranged so as to face the polishing surface when the workpiece is polished. The heat exchanger includes a medium passage through which a heat-exchanging medium flows, and a bottom surface facing the polishing surface. At least a part of the bottom surface is inclined with an upward gradient above the polishing surface such that a polishing liquid on the polishing surface generates a lift exerted on the bottom surface during movement of the polishing surface.
摘要翻译： 本发明提供一种用于加热或冷却抛光表面的设备。 该装置包括在抛光工件时布置成面向抛光表面的热交换器。 热交换器包括热交换介质流过的介质通道和面向抛光表面的底面。 底表面的至少一部分在研磨表面上方向上倾斜地倾斜，使得抛光表面上的抛光液体在抛光表面的移动期间产生施加在底表面上的升力。
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2.发明申请公开(公告)号：US20080311823A1
公开(公告)日：2008-12-18
申请号：US12155618
申请日：2008-06-06
申请人： Shunichi Aiyoshizawa , Ryuichi Kosuge , Ryo Kato , Yu Ishii
发明人： Shunichi Aiyoshizawa , Ryuichi Kosuge , Ryo Kato , Yu Ishii
IPC分类号： B24B51/00
CPC分类号： B24B37/015 , B24B55/02
摘要： The present invention provides an apparatus for heating or cooling a polishing surface. This apparatus includes a heat exchanger arranged so as to face the polishing surface when the workpiece is polished. The heat exchanger includes a medium passage through which a heat-exchanging medium flows, and a bottom surface facing the polishing surface. At least a part of the bottom surface is inclined with an upward gradient above the polishing surface such that a polishing liquid on the polishing surface generates a lift exerted on the bottom surface during movement of the polishing surface.
摘要翻译： 本发明提供一种用于加热或冷却抛光表面的设备。 该装置包括在抛光工件时布置成面向抛光表面的热交换器。 热交换器包括热交换介质流过的介质通道和面向抛光表面的底面。 底表面的至少一部分在研磨表面上方向上倾斜地倾斜，使得抛光表面上的抛光液体在抛光表面的移动期间产生施加在底表面上的升力。
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公开(公告)号：US5223758A
公开(公告)日：1993-06-29
申请号：US665213
申请日：1991-03-05
申请人： Takashi Kataoka , Yuji Shirao , Daisuke Konno , Yoshio Sato , Yoichi Kanemitsu , Hideo Tsuboi , Shunichi Aiyoshizawa , Kazuyuki Kasahara
发明人： Takashi Kataoka , Yuji Shirao , Daisuke Konno , Yoshio Sato , Yoichi Kanemitsu , Hideo Tsuboi , Shunichi Aiyoshizawa , Kazuyuki Kasahara
CPC分类号： F16C32/044 , F16C17/02 , F16C17/107 , F16C25/045 , F16C32/0402 , F16C33/107 , H02K5/165 , H02K7/09
摘要： A spindle motor has a rotor supported by a stator through a thrust bearing and a radial bearing. At least the thrust bearing is a hydrodynamic bearing. The spindle motor is provided with a device for adjusting the thrust laod that is applied to the thrust bearing. The load adjusting device has an electromagnet that is provided on the stator and a permanent magnet that is provided on the rotor in opposing relation to the electromagnet. Either the repelling force or the attraction force, which acts between the electromagnet and the permanent magnet, is controlled by changing the current supplied to the electromagnet.
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公开(公告)号：US5142173A
公开(公告)日：1992-08-25
申请号：US564313
申请日：1990-08-08
申请人： Daisuke Konno , Sachihiko Miwa , Shunichi Aiyoshizawa , Kazuyuki Kasahara , Yoshio Sato , Kazuto Hirokawa , Yumiko Noda
发明人： Daisuke Konno , Sachihiko Miwa , Shunichi Aiyoshizawa , Kazuyuki Kasahara , Yoshio Sato , Kazuto Hirokawa , Yumiko Noda
CPC分类号： F16C33/107 , F16C17/107 , F16C39/063 , G11B19/2018 , F16C2370/12
摘要： A bearing structure suitable for a spindle motor or the like, which enables such a motor to rotate with minimal vibrations. The bearing structure comprises a stator including a support shaft which is disposed on a base, and a rotor which is rotatably disposed around the support shaft. A radial hydrodynamic bearing and a thrust hydrodynamic bearing are disposed between the stator and the rotor. The stator has the support shaft, a thrust plate and a radial cylindrical member which is concentric with the support shaft. The thrust plate is secured to an end surface of the radial cylindrical member. The support shaft extends through the centers of the radial cylindrical member and the thrust plate. The rotor has a radial sleeve. The radial hydrodynamic bearing is formed from the inner peripheral surface of the radial sleeve and the outer peripheral surface of the radial cylindrical member, which face each other and either of which is formed with herringbone-shaped grooves for generating dynamic pressure. The thrust hydrodynamic bearing is formed from an end surface of the radial sleeve and a sliding surface of the thrust plate, which face each other and either of which is formed with spiral grooves for generating dynamic pressure. A rolling bearing may be added in order to minimize the starting torque in the bearing structure.
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公开(公告)号：US20080220621A1
公开(公告)日：2008-09-11
申请号：US12115308
申请日：2008-05-05
IPC分类号： H01L21/00
CPC分类号： G03F7/7075 , G03F7/70808 , G03F7/70991 , G03F9/7003 , G03F9/7011 , H01L21/67017 , H01L21/67225 , H01L21/67248 , H01L21/67748 , H01L21/68 , H01L21/681
摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.
摘要翻译： 处理基板的基板处理装置具有界面部，基板装载部，减压气体输送室，曝光处理室。 接口部分具有能够将处理中的基板自由地装载和卸载到设备中的输送机构，反之亦然。 处理后的基板可以通过界面部分的输送机构沿一个方向装载和卸载基板装载/卸载部分。 减压气氛输送室与基板装载/卸载部的方向相邻且垂直的方向配置，具有在减压气氛下处理基板的输送机构。 暴露处理室与减压气体输送室的方向相邻且平行地配置，对被处理基板进行曝光处理。
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公开(公告)号：US06881268B2
公开(公告)日：2005-04-19
申请号：US10168823
申请日：2000-12-21
IPC分类号： F17D1/02 , C23C16/40 , C23C16/44 , C23C16/455 , H01L21/00 , B01D39/16 , B01D47/05 , C23F1/00 , H01L21/306
CPC分类号： C23C16/45593 , C23C16/405 , C23C16/4402 , C23C16/4412 , H01L21/67017
摘要： The present apparatus includes a casing (1) having a gas introduction opening (3) for introducing a gas into the casing and a gas discharge opening (5) for discharging the gas from the casing, a gas circulating tube passage (8) communicating with the casing for effecting circulation of the gas, a circulating fan (11) for effecting circulation of the gas in the casing through the gas circulating tube passage, and a valve (6, 7) switchable between a position for conducting the introducing and discharging of the gas into and from the casing through the gas introduction opening and the gas discharge opening and a position for effecting circulation of the gas in the casing through the gas circulating tube passage. The apparatus further includes a trap (10), a filter (4) and a heat exchanger (9) for conducting a desired treatment with respect to the circulated gas, such as removal of particles.
摘要翻译： 本发明的装置包括具有用于将气体引入壳体的气体导入口（3）和用于从壳体排出气体的排气口（5）的壳体（1），与气体排出口 用于实现气体循环的壳体，用于通过气体循环管通道使壳体中的气体循环的循环风扇（11）;以及可在可引导和排出的位置之间切换的阀（6,7） 气体通过气体引入开口和气体排出口进入和离开壳体，以及通过气体循环管通道使气体在壳体中循环的位置。 该装置还包括用于对循环气体进行所需处理的捕集器（10），过滤器（4）和热交换器（9），例如去除颗粒。
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公开(公告)号：US20110200469A1
公开(公告)日：2011-08-18
申请号：US12859915
申请日：2010-08-20
CPC分类号： F04D29/086 , F04D13/0606 , F04D29/588
摘要： A submersible motor pump includes a water jacket having a circulation passage of a coolant, a centrifugal impeller for circulating the coolant, a suction passage configured to provide fluid communication between the circulation passage and a fluid inlet of the centrifugal impeller, and a discharge passage configured to provide fluid communication between a fluid outlet of the centrifugal impeller and the circulation passage. The discharge passage includes a heat-exchange passage formed by two wall surfaces, one of which is constituted by a member which contacts a liquid conveyed by a main impeller. The heat-exchange passage has a circular shape extending radially outwardly from the fluid outlet of the centrifugal impeller. The heat-exchange passage includes at least one axial passage section having a length component in an axial direction of the rotational shaft.
摘要翻译： 潜水电动泵包括具有冷却剂循环通道的水套，用于使冷却剂循环的离心式叶轮，构造成在循环通道和离心式叶轮的流体入口之间提供流体连通的吸入通道，以及配置 以在离心式叶轮的流体出口和循环通道之间提供流体连通。 排出通道包括由两个壁表面形成的热交换通道，其中一个由与主叶轮输送的液体接触的部件构成。 热交换通道具有从离心式叶轮的流体出口径向向外延伸的圆形形状。 热交换通道包括在旋转轴的轴向上具有长度分量的至少一个轴向通道部分。
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公开(公告)号：US20070092651A1
公开(公告)日：2007-04-26
申请号：US11614224
申请日：2006-12-21
CPC分类号： G03F7/7075 , G03F7/70808 , G03F7/70991 , G03F9/7003 , G03F9/7011 , H01L21/67017 , H01L21/67225 , H01L21/67248 , H01L21/67748 , H01L21/68 , H01L21/681
摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.
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公开(公告)号：US5089732A
公开(公告)日：1992-02-18
申请号：US556255
申请日：1990-07-19
申请人： Daisuke Konno , Sachihiko Miwa , Shunichi Aiyoshizawa , Kazuyuki Kasahara , Yoshio Sato , Kazuto Hirokawa
发明人： Daisuke Konno , Sachihiko Miwa , Shunichi Aiyoshizawa , Kazuyuki Kasahara , Yoshio Sato , Kazuto Hirokawa
CPC分类号： F16C33/107 , F16C17/107 , F16C25/045 , F16C39/063 , G11B19/2009 , H02K5/1677 , F16C2370/12
摘要： A spindle motor which is designed to rotate with minimal vibrations and hence is suitable for a hard disk driver. The spindle motor employs hydrodynamic bearings as radial and thrust bearings. A support shaft is formed in a cylindrical configuration with a center hole, and a rotor has a columnar portion which is inserted into the center hole in the support shaft. A thrust bearing collar is attached to the lower end of the rotor, and a thrust bearing member is secured to a base in opposing relation to the thrust bearing collar. A group of stator coils and a radial bearing member are disposed on either the inner peripheral surface of the center hole in the support shaft or the outer peripheral surface of the support shaft, and a group of rotor magnets and a radial bearing sleeve are disposed on either the outer peripheral surface of the columnar portion or the inner peripheral surface of the rotor in opposing relation to the stator coil group and the radial bearing member.
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公开(公告)号：US20070095791A1
公开(公告)日：2007-05-03
申请号：US11614367
申请日：2006-12-21
CPC分类号： G03F7/7075 , G03F7/70808 , G03F7/70991 , G03F9/7003 , G03F9/7011 , H01L21/67017 , H01L21/67225 , H01L21/67248 , H01L21/67748 , H01L21/68 , H01L21/681
摘要： A substrate treatment apparatus that treats a substrate under treatment has an interface section, a substrate loading/unloading section, a reduced pressure atmosphere conveyance chamber, and an exposure treatment chamber. The interface section has a conveyance mechanism that can freely load and unload the substrate under treatment from another device into the apparatus or vice versa. The substrate under treatment can be loaded and unloaded into and from the substrate loading/unloading section in one direction by the conveyance mechanism of the interface section. The reduced pressure atmosphere conveyance chamber is disposed adjacent to and perpendicular to the direction of the substrate loading/unloading section and has a conveyance mechanism that conveys the substrate under treatment under a reduced pressure atmosphere. The exposure treatment chamber is disposed adjacent to and in parallel with the direction of the reduced pressure atmosphere conveyance chamber and performs an exposure treatment for the substrate under treatment.
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