利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

35 条记录 (耗时 0.035 秒)

    Photo CVD apparatus with a glow discharge system
    4.
    发明授权
    Photo CVD apparatus with a glow discharge system 失效
    具有辉光放电系统的照相CVD装置

    公开(公告)号：US5183511A

    公开(公告)日：1993-02-02

    申请号：US352644

    申请日：1989-05-12

    申请人： Shunpei Yamazaki ,  Shigenori Hayashi ,  Takashi Inujima ,  Naoki Hirose

    发明人： Shunpei Yamazaki ,  Shigenori Hayashi ,  Takashi Inujima ,  Naoki Hirose

    IPC分类号： C23C16/48 ,  H01J37/32

    CPC分类号： H01J37/32458 ,  C23C16/482 ,  C23C16/488 ,  H01J37/32862

    摘要： A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.

    摘要翻译： 照相CVD装置包括反应室，通过光窗将光照射到室内的光源，以及设置在用于辉光放电的室中的一对电极，其中一个电极位于光窗上。 在通过光CVD沉积之后，通过在电极之间发生辉光放电，通过等离子体蚀刻来清洁用于透射UV光的光窗口。 用于等离子体蚀刻的光源和电极共享用于提供高频电力的一个电源。

    Microwave enhanced CVD method and apparatus
    6.
    发明授权
    Microwave enhanced CVD method and apparatus 失效
    微波增强CVD方法和装置

    公开(公告)号：US06677001B1

    公开(公告)日：2004-01-13

    申请号：US08470596

    申请日：1995-06-06

    申请人： Takashi Inujima ,  Naoki Hirose ,  Mamoru Tashiro ,  Shunpei Yamazaki

    发明人： Takashi Inujima ,  Naoki Hirose ,  Mamoru Tashiro ,  Shunpei Yamazaki

    IPC分类号： H05H146

    CPC分类号： C23C16/274 ,  C23C16/277 ,  C23C16/458 ,  C23C16/481 ,  H01J37/32192 ,  H01J37/32678

    摘要： A new chemical vapor reaction system is described. Instead of ECR where electrons can move as independent particles without interaction, a mixed cyclotron resonance is a main exciting principal for chemical vapor reaction. In the new proposed resonance, the resonating space is comparatively large so that a material having a high melting point such as diamond can be deposited in the form of a thin film by this inovative method.

    摘要翻译： 描述了一种新的化学气相反应系统。 电子可以作为独立的颗粒而不相互作用而代替ECR，混合回旋加速器共振是化学气相反应的主要兴奋原理。 在新提出的共振中，谐振空间相对较大，因此通过该方法可以以薄膜的形式沉积具有高熔点的金属如金刚石的材料。

    Chemical vapor reaction process by virtue of uniform irradiation
    9.
    发明授权
    Chemical vapor reaction process by virtue of uniform irradiation 失效
    化学蒸汽反应过程凭借均匀的照射

    公开(公告)号：US4803095A

    公开(公告)日：1989-02-07

    申请号：US154290

    申请日：1988-02-10

    申请人： Shigenori Hayashi ,  Naoki Hirose ,  Takashi Inujima ,  Kenji Ito

    发明人： Shigenori Hayashi ,  Naoki Hirose ,  Takashi Inujima ,  Kenji Ito

    IPC分类号： C23C16/48 ,  B05D3/06

    CPC分类号： C23C16/482

    摘要： An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source, an obturating plate is placed so that the intensity of the light source is apparently reduced at the center position. With this light, the substrate is irradiated with light having uniform intensity over the surface of the substrate to be processed.

    摘要翻译： 描述了改进的化学气相反应系统。 该系统的特征在于其光源将紫外光辐射到待处理的基板。 在光源之前，放置一个闭孔板，使得光源的强度在中心位置明显减小。 利用该光，在被处理基板的表面上照射具有均匀强度的光。

    CVD of conformal coatings over a depression using alkylmetal precursors
    10.
    发明授权
    CVD of conformal coatings over a depression using alkylmetal precursors 失效
    使用烷基金属前体在凹凸上进行保形涂层CVD

    公开(公告)号：US5462767A

    公开(公告)日：1995-10-31

    申请号：US139864

    申请日：1993-10-22

    申请人： Shunpei Yamazaki ,  Takashi Inujima

    发明人： Shunpei Yamazaki ,  Takashi Inujima

    IPC分类号： C23C16/04 ,  C23C16/48 ,  H01L21/02 ,  H01L21/268 ,  C23C16/00 ,  H01L21/306

    CPC分类号： H01L28/40 ,  C23C16/045 ,  C23C16/482 ,  H01L21/268

    摘要： A CVD method for forming a conformal coating over a depression or a cave in a top surface is disclosed, which comprises the steps of forming at least one depression or a cave in said top surface where at least a portion of the depression or the cave has an inner surface; providing a reactive precursor containing at least an alkyl metal compound; and CVD forming from a gas of said reactive precursor at least one metal-containing layer over said top surface and said depression or cave such that the ratio ds/dt of the thickness (ds) of the layer on the inner surafce of the depression or cave and the thickness (dt) of the layer on the top surface is substantially one.

    摘要翻译： 公开了一种用于在顶表面的凹陷或洞穴上形成保形涂层的CVD方法，其包括以下步骤：在所述顶表面中形成至少一个凹陷或洞穴，其中凹陷或者洞穴的至少一部分具有 内表面 提供至少含有烷基金属化合物的反应性前体; 以及从所述反应性前体的气体在所述顶表面和所述凹陷或洞穴上形成至少一个含金属层的CVD，使得所述层在所述凹陷或所述凹陷或所述凹陷的内侧上的厚度（ds）的比率ds / dt 顶部表面上的层的厚度（dt）基本上为一个。