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公开(公告)号：US20180040424A1
公开(公告)日：2018-02-08
申请号：US15658791
申请日：2017-07-25
Applicant: TDK CORPORATION
Inventor： Tetsuhiro TAKAHASHI
CPC classification number: H01G4/1254 , C04B35/495 , C04B35/6261 , C04B35/62645 , C04B35/64 , C04B2235/3201 , C04B2235/3206 , C04B2235/3213 , C04B2235/3215 , C04B2235/3225 , C04B2235/3227 , C04B2235/3251 , C04B2235/3293 , C04B2235/3294 , C04B2235/3409 , C04B2235/3418 , C04B2235/3436 , C04B2235/3445 , C04B2235/447 , C04B2235/5436 , C04B2235/5445 , C04B2235/6562 , C04B2235/6565 , C04B2235/6567 , C04B2235/6582 , C04B2235/661 , C04B2235/662 , H01G4/1272 , H01G4/30
Abstract: A dielectric composition is provided. The dielectric composition includes a tungsten bronze type complex oxide expressed by a chemical formula (K1-xNax)Sr2Nb5O15 as a main component, x satisfying 0≦x≦0.50, wherein the dielectric composition includes a secondary phase of at least one or more selected from: MgO.SiO2; BaO.2MgO.2SiO2; and 2MgO.B2O3; or the dielectric composition includes a tungsten bronze type complex oxide expressed by a chemical formula (K1-xNax)Sr2Nb5O15 as a main component, x satisfying 0≦x≦0.40, wherein the dielectric composition includes: MgO; BaO; B2O3; SiO2; and P2O5 as a first accessory component in a total content of 2.5 mol to 20.0 mol per 100 mol of the main component.
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公开(公告)号：US20170372840A1
公开(公告)日：2017-12-28
申请号：US15632955
申请日：2017-06-26
Applicant: TDK CORPORATION
Inventor： Tetsuhiro TAKAHASHI
IPC: H01G4/12 , C04B35/64 , H01G4/30 , H01G4/012 , C04B35/626 , C04B35/495 , H01G4/248
CPC classification number: H01G4/1263 , B32B18/00 , C04B35/495 , C04B35/499 , C04B35/6261 , C04B35/6264 , C04B35/62675 , C04B35/62685 , C04B35/63416 , C04B35/63424 , C04B35/6365 , C04B35/638 , C04B35/64 , C04B2235/3201 , C04B2235/3208 , C04B2235/3213 , C04B2235/3215 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3234 , C04B2235/3244 , C04B2235/3249 , C04B2235/3255 , C04B2235/3454 , C04B2235/442 , C04B2235/5436 , C04B2235/5445 , C04B2235/6562 , C04B2235/6567 , C04B2235/6582 , C04B2235/6585 , C04B2235/785 , C04B2235/786 , C04B2235/96 , C04B2237/34 , C04B2237/68 , H01G4/012 , H01G4/1218 , H01G4/1236 , H01G4/248 , H01G4/30
Abstract: A dielectric composition is provided. The dielectric composition includes: a main component made of: a first complex oxide expressed by a chemical formula {K(Ba1-xSrx)2Nb5O15}; and a second complex oxide expressed by a chemical formula that differs the chemical formula of the first complex oxide. The second complex oxide is a complex oxide expressed by one of chemical formulae: {(Ca1-ySry)(Zr1-zTiz)O3}; {Ba(Ti1-uZru)O3}; {(Ca1-vSrv)TiSiO5}; and {(Ba1-wRe2w/3)Nb2O6}, x satisfies 0.35≦x≦0.75, and a satisfies 0.25≦a≦0.75 when a molar ratio between the first and second complex oxides is defined by a:b in an order and a+b=1.00.
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3.发明公开公开(公告)号：US20230268120A1
公开(公告)日：2023-08-24
申请号：US18012530
申请日：2020-12-24
Applicant: TDK Corporation
Inventor： Daiki ISHII , Yoshihiko YANO , Yuki YAMASHITA , Kenichi YOSHIDA , Tetsuhiro TAKAHASHI
CPC classification number: H01G4/005 , H01G4/33 , H05K1/18 , H05K2201/10015
Abstract: A thin film capacitor includes: a metal foil having a roughened upper surface; a dielectric film covering the upper surface of the metal foil and having an opening through which the metal foil is partly exposed; a first electrode layer contacting the metal foil through the opening; a second electrode layer contacting the dielectric film without contacting the metal foil; and an insulating member separating the first and second electrode layers. The insulating member has a tapered shape in cross section. With the above configuration, both the first and second electrode layers can be disposed on the upper surface of the metal foil. In addition, since the insulating member has a tapered shape in cross section, adhesion performance of the insulating member can be enhanced, thus making it possible to prevent short-circuit between the first and second electrode layers.
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公开(公告)号：US20230253154A1
公开(公告)日：2023-08-10
申请号：US17982635
申请日：2022-11-08
Applicant: TDK Corporation
Inventor： Tetsuhiro TAKAHASHI , Toshihiro IGUCHI , Tomoko SUZUKI
IPC: H01G4/12 , C04B35/495
CPC classification number: H01G4/1254 , C04B35/495 , C04B2235/3206 , C04B2235/3232 , C04B2235/3255 , C04B2235/3256 , C04B2235/3244 , C04B2235/3262 , C04B2235/3418 , C04B2235/96
Abstract: Provided is a dielectric composition containing: a main component expressed by {BaxSr(1-x)}mTa4O12; and a first subcomponent, m satisfying a relationship of 1.95≤m≤2.40. The first subcomponent includes silicon and magnesium. When the amount of the main component contained in the dielectric composition is set to 100 parts by mole, the amount of silicon contained in the dielectric composition is 7.5 to 15.0 parts by mole in terms of SiO2, and the amount of magnesium contained in the dielectric composition is 5.0 to 22.5 parts by mole in terms of MgO.
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公开(公告)号：US20230268133A1
公开(公告)日：2023-08-24
申请号：US18012135
申请日：2020-12-24
Applicant: TDK Corporation
Inventor： Daiki ISHII , Yoshihiko YANO , Kenichi YOSHIDA , Tetsuhiro TAKAHASHI , Yuki YAMASHITA
Abstract: To provide a thin film capacitor in which peeling-off of an electrode layer is less likely to occur. A thin film capacitor includes a metal foil having a roughened upper surface, a dielectric film covering the upper surface of the metal foil and having an opening for partly exposing the metal foil therethrough, a first electrode layer contacting the metal foil through the opening and further contacting the dielectric film, and a second electrode layer contacting the dielectric film without contacting the metal foil. With this configuration, both the first and second electrode layers can be disposed on the upper surface of the metal foil. In addition, the first electrode layer contacts not only the metal foil but also the dielectric film, making peeling of the first electrode layer less likely to occur.
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Patent Agency Ranking
公开(公告)号：US20230145549A1
公开(公告)日：2023-05-11
申请号：US17951305
申请日：2022-09-23
Applicant: TDK Corporation
Inventor： Toshihiro IGUCHI , Tetsuhiro TAKAHASHI , Hiroki AKIBA , Ryota NOMURA
IPC: H01G4/12
CPC classification number: H01G4/1254
Abstract: A dielectric composition includes a main component containing tantalum and at least one of barium or strontium, and a subcomponent containing calcium and silicon.
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公开(公告)号：US20220230776A1
公开(公告)日：2022-07-21
申请号：US17557824
申请日：2021-12-21
Applicant: TDK CORPORATION
Inventor： Toshihiro IGUCHI , Tetsuhiro TAKAHASHI , Hiroki AKIBA , Ryota NOMURA
IPC: H01B3/12 , H01G4/12 , C04B35/495
Abstract: In order to provide a dielectric composition having high relative permittivity at a wide range of temperatures, the main component of a dielectric composition includes strontium and tantalum.
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公开(公告)号：US20240105388A1
公开(公告)日：2024-03-28
申请号：US18469157
申请日：2023-09-18
Applicant: TDK CORPORATION
Inventor： Hiroki AKIBA , Tetsuhiro TAKAHASHI , Toshihiro IGUCHI
CPC classification number: H01G4/1263 , C01G35/006 , H01G4/30 , C01P2002/52 , C01P2006/40
Abstract: A dielectric composition including a tungsten bronze type composite oxide as a main component represented by (Ba1-xSrx)aRbZrcTadO30+0.5e in terms of an atomic ratio. In the dielectric composition, c=(2a+3b−10)−e and d=(20−2a−3b)+e are satisfied. R includes at least one selected from the group consisting of La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Y, and Sc. In the dielectric composition, 0.000≤x≤0.500, 5.100≤a≤5.860, 0.000≤b≤0.100, and −0.150≤e≤0.150 are satisfied.
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9.发明公开公开(公告)号：US20230335579A1
公开(公告)日：2023-10-19
申请号：US18012553
申请日：2020-12-24
Applicant: TDK Corporation
Inventor： Daiki ISHII , Yoshihiko YANO , Yuki YAMASHITA , Kenichi YOSHIDA , Tetsuhiro TAKAHASHI
IPC: H01L23/495 , H01L25/16
Abstract: A thin film capacitor includes: a metal foil having a roughened upper surface; a dielectric film covering the upper surface of the metal foil and having an opening through which the metal foil is partly exposed; a first electrode layer contacting the metal foil through the opening; a second electrode layer contacting the dielectric film without contacting the metal foil; and an insulating member provided on the upper surface of the metal foil to surround the first and second electrode layers. The metal foil has an outer peripheral area which is positioned outside an area surrounded by the insulating member and which is not covered with the first and second electrode layers. A height of the electrode layer is equal to or higher than a height of the insulating member. This makes the outer peripheral portion of the thin film capacitor have a step-like shape.
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公开(公告)号：US20230260713A1
公开(公告)日：2023-08-17
申请号：US18012820
申请日：2020-12-24
Applicant: TDK Corporation
Inventor： Daiki ISHII , Yoshihiko YANO , Yuki YAMASHITA , Kenichi YOSHIDA , Tetsuhiro TAKAHASHI
Abstract: To provide a thin film capacitor having high adhesion with respect to a circuit substrate. A thin film capacitor includes: a metal foil having a roughened upper surface; a dielectric film covering the upper surface of the metal foil and having an opening through which the metal foil is partly exposed; a first electrode layer contacting the metal foil through the opening; and a second electrode layer contacting the dielectric film without contacting the metal foil. An angle θa formed by the other main surface of the metal foil and a side surface thereof is more than 20° and less than 80°. The side surface is thus tapered at an angle of more than 20° and less than 80°, so that it is possible to suppress warpage and to enhance adhesion with respect to a multilayer substrate when the thin film capacitor is embedded in the multilayer substrate.
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