公开(公告)号：US10069033B2

公开(公告)日：2018-09-04

申请号：US15109845

申请日：2015-01-15

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan ,  Jeramy Zimmerman

IPC: H01L31/18 ,  H01L31/0304 ,  H01L31/0687 ,  H01L31/0693 ,  H01L31/054 ,  H01L31/0352

Abstract: There is disclosed a method of preparing a photovoltaic device. In particular, the method comprises integrating epitaxial lift-off solar cells with mini-parabolic concentrator arrays via a printing method. Thus, there is disclosed a method comprising providing a growth substrate; depositing at least one protection layer on the growth substrate; depositing at least one sacrificial layer on the protection layer; depositing at least one photoactive cell on the sacrificial layer; etching a pattern of at least two parallel trenches that extend from the at least one photoactive cell to the sacrificial layer; depositing a metal on the at least one photoactive cell; bonding said metal to a host substrate; and removing the sacrificial layer with one or more etch steps. The host substrate can be a siloxane, which when rolled, can form a stamp used to integrate solar cells into concentrator arrays. There are also disclosed a method of making a growth substrate and the growth substrate made therefrom.

公开(公告)号：US12207535B2

公开(公告)日：2025-01-21

申请号：US17684168

申请日：2022-03-01

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Xinjing Huang ,  Dejiu Fan

IPC: H10K71/20 ,  H10K30/20 ,  H10K30/81

Abstract: A method of fabricating an organic optoelectronic device comprises positioning a patterning layer over a substrate, etching the patterning layer using a photolithographic process to create an etched patterning layer, positioning a layer of an organic material over the etched patterning layer, and removing at least a portion of the etched patterning layer and at least a portion of the layer of the organic material to create a patterned organic layer over the substrate.

公开(公告)号：US11901473B2

公开(公告)日：2024-02-13

申请号：US17232243

申请日：2021-04-16

Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN

Inventor： Tobias Burger ,  Byungjun Lee ,  Dejiu Fan ,  Andrej Lenert ,  Stephen R. Forrest

IPC: H01L31/0735 ,  H01L31/0687 ,  H01L31/18 ,  G03F7/00 ,  H01L31/0232 ,  H01L31/0264 ,  H01L33/00 ,  C30B25/04 ,  C30B25/22 ,  H01L31/043

CPC classification number: H01L31/0687 ,  C30B25/04 ,  C30B25/22 ,  G03F7/0005 ,  H01L31/0264 ,  H01L31/02327 ,  H01L31/043 ,  H01L31/0735 ,  H01L31/1852 ,  H01L31/1896 ,  H01L33/0093

Abstract: To reach high efficiencies, thermophotovoltaic cells must utilize the broad spectrum of a radiative thermal source. One promising approach to overcome this challenge is to have low-energy photons reflected and reabsorbed by the thermal emitter, where their energy can have another chance at contributing toward photogeneration in the cell. However, current methods for photon recuperation are limited by insufficient bandwidth or parasitic absorption, resulting in large efficiency losses relative to theoretical limits. This work demonstrates nearly perfect reflection of low-energy photons (˜99%) by embedding an air layer within the TPV cell. This result represents a four-fold reduction in parasitic absorption relative to existing TPV cells. As out-of-band reflectance approaches unity, TPV efficiency becomes nearly insensitive to cell bandgap and emitter temperature. Accessing this regime unlocks a range of possible materials and heat sources that were previously inaccessible to TPV energy conversion.

公开(公告)号：US20220278280A1

公开(公告)日：2022-09-01

申请号：US17684168

申请日：2022-03-01

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Xinjing Huang ,  Dejiu Fan

IPC: H01L51/00 ,  H01L51/42

Abstract: A method of fabricating an organic optoelectronic device comprises positioning a patterning layer over a substrate, etching the patterning layer using a photolithographic process to create an etched patterning layer, positioning a layer of an organic material over the etched patterning layer, and removing at least a portion of the etched patterning layer and at least a portion of the layer of the organic material to create a patterned organic layer over the substrate.

公开(公告)号：US10680132B2

公开(公告)日：2020-06-09

申请号：US15111218

申请日：2015-01-15

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan

IPC: H01L31/00 ,  H01L31/18 ,  H01L31/0304 ,  H01L31/0352 ,  H01L31/0687 ,  H01L31/0693 ,  H01L31/0735

Abstract: The present disclosure relates to methods and growth structures for making thin-film electronic and optoelectronic devices, such as flexible photovoltaic devices, using epitaxial lift-off (ELO). In particular, disclosed herein are wafer protection schemes that preserve the integrity of the wafer surface during ELO and increase the number of times that the wafer may be used for regrowth. The wafer protection schemes use growth structures that include at least one superlattice layer.

公开(公告)号：US20160329457A1

公开(公告)日：2016-11-10

申请号：US15109845

申请日：2015-01-15

Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan ,  Jeramy Zimmerman

IPC: H01L31/18

CPC classification number: H01L31/1896 ,  H01L31/03046 ,  H01L31/035281 ,  H01L31/0547 ,  H01L31/0687 ,  H01L31/0693 ,  H01L31/1892 ,  Y02E10/52 ,  Y02E10/544 ,  Y02P70/521

Abstract: There is disclosed a method of preparing a photovoltaic device. In particular, the method comprises integrating epitaxial lift-off solar cells with mini-parabolic concentrator arrays via a printing method. Thus, there is disclosed a method comprising providing a growth substrate; depositing at least one protection layer on the growth substrate; depositing at least one sacrificial layer on the protection layer; depositing at least one photoactive cell on the sacrificial layer; etching a pattern of at least two parallel trenches that extend from the at least one photoactive cell to the sacrificial layer; depositing a metal on the at least one photoactive cell; bonding said metal to a host substrate; and removing the sacrificial layer with one or more etch steps. The host substrate can be a siloxane, which when rolled, can form a stamp used to integrate solar cells into concentrator arrays. There are also disclosed a method of making a growth substrate and the growth substrate made therefrom.

Abstract translation: 公开了一种制备光伏器件的方法。 特别地，该方法包括通过印刷方法将外延剥离太阳能电池与微型抛物面聚光器阵列集成。 因此，公开了一种包括提供生长衬底的方法; 在生长衬底上沉积至少一个保护层; 在保护层上沉积至少一个牺牲层; 在所述牺牲层上沉积至少一个光活性单元; 蚀刻从至少一个光活性单元延伸到牺牲层的至少两个平行沟槽的图案; 在所述至少一个光活性电池上沉积金属; 将所述金属键合到主体衬底; 以及用一个或多个蚀刻步骤去除牺牲层。 主体衬底可以是硅氧烷，其在卷绕时可以形成用于将太阳能电池集成到聚光器阵列中的印模。 还公开了一种制备生长衬底和由其制成的生长衬底的方法。

公开(公告)号：US11716864B2

公开(公告)日：2023-08-01

申请号：US16920555

申请日：2020-07-03

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Caleb Coburn ,  Dejiu Fan

IPC: H01L27/146 ,  H10K39/32 ,  H04N25/53 ,  H04N25/71 ,  H04N25/75 ,  H10K30/30 ,  H10K30/82 ,  H10K85/20

CPC classification number: H10K39/32 ,  H04N25/53 ,  H04N25/71 ,  H04N25/75 ,  H10K30/30 ,  H10K30/82 ,  H10K85/211

Abstract: An organic optoelectronic device comprises a substrate having first and second regions, a first electrode positioned over the first region of the substrate, a shutter electrode positioned over the second region of the substrate, an organic heterojunction layer comprising an organic heterojunction material, positioned over at least a portion of the first electrode, an insulator layer positioned over at least a portion of the shutter electrode, an organic channel layer, comprising an organic channel material, positioned over at least a portion of the heterojunction and insulator layers, and a second electrode positioned over the channel layer in the second region of the substrate, wherein the shutter electrode is configured to generate a repulsive potential barrier in the channel layer, suitable to at least reduce movement of charge in the channel layer. A method of measuring received light in an optoelectronic device is also described.

公开(公告)号：US10340187B2

公开(公告)日：2019-07-02

申请号：US15558230

申请日：2016-03-18

Applicant: The Regents Of The University Of Michigan

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan

IPC: H01L21/02 ,  H01L31/18 ,  H01L21/78 ,  C30B33/08 ,  C09K13/00 ,  H01L33/00

Abstract: Disclosed herein are methods to eliminate or reduce the peeling-off of epitaxial lifted-off thin film epilayers on secondary host substrates that allow for the fabrication of high yield ELO processed thin film devices. The methods employ patterned strain-relief trenches.

公开(公告)号：US20170076986A1

公开(公告)日：2017-03-16

申请号：US15212104

申请日：2016-07-15

Applicant: The Regents of the University of Michigan

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan ,  Byungjun Lee

IPC: H01L21/78 ,  C30B33/02 ,  C30B33/10 ,  C30B33/12 ,  C23F1/16 ,  C23F4/00

CPC classification number: H01L21/7813 ,  C30B29/42 ,  C30B33/02 ,  C30B33/10 ,  C30B33/12 ,  H01L21/30612 ,  H01L31/1896

Abstract: Disclosed are methods for preserving the integrity of large-sized growth substrates. The methods pertain to accelerating the rate of epitaxial liftoff, and improved cleaning and etching steps. Also disclosed are devices produced therein.

Abstract translation: 公开了保留大尺寸生长基质完整性的方法。 该方法涉及加速外延提升速率，以及改进的清洗和蚀刻步骤。 还公开了其中生产的装置。

公开(公告)号：US20160351747A1

公开(公告)日：2016-12-01

申请号：US15111218

申请日：2015-01-15

Applicant: THE REGENTS OF THE UNIVERSITY OF MICHIGAN

Inventor： Stephen R. Forrest ,  Kyusang Lee ,  Dejiu Fan

IPC: H01L31/18 ,  H01L31/0352 ,  H01L31/0304 ,  H01L31/0735

Abstract: The present disclosure relates to methods and growth structures for making thin-film electronic and optoelectronic devices, such as flexible photovoltaic devices, using epitaxial lift-off (ELO). In particular, disclosed herein are wafer protection schemes that preserve the integrity of the wafer surface during ELO and increase the number of times that the wafer may be used for regrowth. The wafer protection schemes use growth structures that include at least one superlattice layer.

Abstract translation: 本公开涉及使用外延剥离（ELO）制造薄膜电子和光电子器件（例如柔性光伏器件）的方法和生长结构。 特别地，本文公开了晶片保护方案，其在ELO期间保持晶片表面的完整性并且增加晶片可用于再生长的次数。 晶片保护方案使用包括至少一个超晶格层的生长结构。