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42 条记录 (耗时 0.035 秒)

    Microphone
    4.
    发明授权
    Microphone 有权
    麦克风

    公开(公告)号：US08917897B2

    公开(公告)日：2014-12-23

    申请号：US13318248

    申请日：2011-03-16

    申请人： Yusuke Nakagawa ,  Yasuhiro Horimoto ,  Tadashi Inoue ,  Toshiyuki Takahashi

    发明人： Yusuke Nakagawa ,  Yasuhiro Horimoto ,  Tadashi Inoue ,  Toshiyuki Takahashi

    IPC分类号： H04R9/08 ,  H04R11/04 ,  H04R17/02 ,  H04R19/04 ,  H04R21/02 ,  H04R1/04 ,  H04R1/06

    CPC分类号： H04R1/04 ,  H01L2224/16225 ,  H04R1/06 ,  H04R19/04

    摘要： Provided is a microphone capable of reducing a plane area seen from above, and further increasing a capacity of a back chamber of an acoustic sensor. An interposer 52 is mounted on a top surface of a circuit board 43, and an acoustic sensor 51 is mounted on the top surface thereof. A signal processing circuit 53 is accommodated in a space 70 provided in the interposer 52, and mounted on the circuit board 43. The acoustic sensor 51 is connected to the circuit board 43 through a wiring structure provided in the interposer 52. The acoustic sensor 51, the interposer 52 and the like are covered by a cover 42 put on the top surface of the circuit board 43. In the cover 42, a sound introduction hole 48 is opened in a position opposed to the front chamber of the acoustic sensor 51. The interposer 52 is formed with a ventilation notch 71 for acoustically communicating a space below a diaphragm 56 of the acoustic sensor 51 with a space inside the cover 42 and outside the interposer 52.

    摘要翻译： 提供了能够减少从上方看到的平面区域并进一步增加声学传感器的后室的容量的麦克风。 插入器52安装在电路板43的顶表面上，声传感器51安装在其顶表面上。 信号处理电路53容纳在设置在插入器52中的空间70中，并且安装在电路板43上。声传感器51通过设置在插入器52中的布线结构连接到电路板43.声传感器51 插入器52等被放置在电路板43的上表面上的盖42覆盖。在盖42中，声音引入孔48在与声学传感器51的前室相对的位置打开。 内插件52形成有通气凹口71，用于将声传感器51的隔膜56下方的空间与罩42内的空间和插入件52外部隔开。

    Cleaning method and substrate processing apparatus
    5.
    发明授权
    Cleaning method and substrate processing apparatus 有权
    清洗方法和基板处理装置

    公开(公告)号：US08231732B2

    公开(公告)日：2012-07-31

    申请号：US12388921

    申请日：2009-02-19

    申请人： Yusuke Nakagawa

    发明人： Yusuke Nakagawa

    IPC分类号： C25F1/00

    CPC分类号： H01L21/67126 ,  H01J37/32862 ,  H01L21/67069 ,  Y10S134/902 ,  Y10S438/902

    摘要： A cleaning method that can prevent abnormal wear of an O-ring. A cleaning gas containing at least oxygen gas is supplied to the interior of a chamber in which a substrate is accommodated, and radio-frequency voltage is applied to the interior of the chamber to produce oxygen radicals from the cleaning gas. When the amount of deposit produced in the chamber in plasma processing is larger than a predetermined amount, the amount of fluorine radicals in the chamber is increased, and when the amount of the deposit is smaller than the predetermined amount, the amount of fluorine radicals in the chamber is decreased.

    摘要翻译： 可以防止O型圈异常磨损的清洗方法。 至少含有氧气的清洁气体被供给到其中容纳基板的室的内部，并且将高频电压施加到室的内部以从清洁气体产生氧自由基。 当在等离子体处理中在室中产生的沉积量大于预定量时，室内的氟自由基量增加，并且当沉积物的量小于预定量时，氟自由基的量 房间减少。

    Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method
    6.
    发明授权
    Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method 有权
    正型抗蚀剂组合物，用于热流动的正性抗蚀剂组合物和抗蚀剂图案形成方法

    公开(公告)号：US07741008B2

    公开(公告)日：2010-06-22

    申请号：US12089681

    申请日：2006-10-17

    申请人： Sanae Furuya ,  Hideo Hada ,  Yusuke Nakagawa ,  Akiyoshi Yamazaki

    发明人： Sanae Furuya ,  Hideo Hada ,  Yusuke Nakagawa ,  Akiyoshi Yamazaki

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  C08F220/28 ,  G03F7/0007 ,  G03F7/0046 ,  Y10S430/111

    摘要： Disclosed is a positive resist composition comprising a resin component (A) and an acid generator component (B), wherein the component (A) contains a polymer compound (A1) containing a structural unit (a0) represented by formula (a0) shown below and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group: (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents an acid dissociable, dissolution inhibiting group containing a tertiary alkyl group; a represents an integer from 1 to 3, b represents an integer from 0 to 2, and a+b=1 to 3; and c, d and e each represents, independently, an integer from 0 to 3).

    摘要翻译： 公开了包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）含有包含由下式（a0）表示的结构单元（a0）的高分子化合物（A1） 和衍生自含有内酯的环状基团的丙烯酸酯的结构单元（a2）（其中，R表示氢原子，卤素原子，低级烷基或卤代低级烷基; Y1表示脂肪族环状基团 Z表示含有叔烷基的酸解离抑制基团，a表示1〜3的整数，b表示0〜2的整数，a + b = 1〜3，c，d，e各自独立地表示 独立地表示0〜3的整数）。