公开(公告)号：US5155412A

公开(公告)日：1992-10-13

申请号：US706035

申请日：1991-05-28

申请人： Tai-Hon P. Chang ,  Dieter P. Kern ,  Lawrence P. Muray

发明人： Tai-Hon P. Chang ,  Dieter P. Kern ,  Lawrence P. Muray

IPC分类号： G01Q60/10 ,  H01J3/02

CPC分类号： B82Y15/00 ,  H01J3/021

摘要： The present invention is directed to a method for selectively scaling the dimensions of a field emission electron gun. The electron gun includes a field emission tip followed by a dual electrode immersion lens. The lens consists of two planar electrodes separated by a dielectric layer. A well defined circular hole is present at the center of each electrode and the dielectric layer. A high scaling factor is applied to the region consisting of the first electrode and the emission tip, reducing the first electrode thickness and bore diameter and the distance between the tip and first electrode to the micrometer range. A weaker scaling factor is applied to the bore diameter of the second electrode and the spacing between the electrodes such that the second electrode bore diameter and distance between the electrodes are approximately equal and are greater than the first electrode thickness and bore diameter and the distance between the tip and first electrode.

摘要翻译： 本发明涉及一种用于选择性地缩放场致发射电子枪尺寸的方法。 电子枪包括场发射尖端，后面是双电极浸没透镜。 该透镜由两层由电介质层隔开的平面电极组成。 在每个电极和电介质层的中心存在明确的圆形孔。 将高比例因子应用于由第一电极和发射尖端组成的区域，将第一电极厚度和孔直径以及尖端和第一电极之间的距离减小到微米范围。 将较小的比例因子应用于第二电极的孔径和电极之间的间隔，使得第二电极孔直径和电极之间的距离近似相等并且大于第一电极厚度和孔直径以及第二电极之间的距离 尖端和第一电极。

公开(公告)号：US06555829B1

公开(公告)日：2003-04-29

申请号：US09481103

申请日：2000-01-10

申请人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

发明人： James P. Spallas ,  Lawrence P. Muray ,  David Trost ,  Ho-Seob Kim ,  Tai-Hon P. Chang

IPC分类号： G01B902

CPC分类号： B23Q1/34 ,  B23Q1/621 ,  H01J37/023 ,  H01J2237/20264 ,  H01L21/68

摘要： Disclosed is a positioning stage for precisely positioning an object within a limited range of travel (e.g. 100 &mgr;m). By way of example, the stage can be used to position an electron source such as a field emitter in an electron beam microcolumn. The stage includes a block which defines a channel to allow flexure along a first axis. The block also defines another channel to allow flexure along a second axis perpendicular to the first axis. Using actuators in the channels to flex a portion of the block, the object supported by the block can be precisely positioned to a desired location in a horizontal plane defined by the first and second axes.

摘要翻译： 公开了一种用于在有限的旅行范围内（例如，100mum）精确地定位物体的定位台。 作为示例，该级可用于将诸如场致发射体的电子源定位在电子束微柱中。 舞台包括限定通道以允许沿着第一轴弯曲的块。 该块还限定另一个通道，以允许沿垂直于第一轴线的第二轴线弯曲。 使用通道中的致动器来弯曲块的一部分，由块支撑的物体可精确地定位在由第一和第二轴限定的水平平面中的期望位置。

公开(公告)号：US4426583A

公开(公告)日：1984-01-17

申请号：US376350

申请日：1982-05-10

申请人： Tai-Hon P. Chang ,  Phillip J. Coane ,  Fritz-Jurgen Hohn ,  Dieter P. Kern

发明人： Tai-Hon P. Chang ,  Phillip J. Coane ,  Fritz-Jurgen Hohn ,  Dieter P. Kern

IPC分类号： H01J37/06 ,  G01R31/02 ,  G01R31/302 ,  H01J37/04 ,  H01J37/28 ,  H01J37/30 ,  H01L21/66 ,  H05K3/00 ,  H01J3/14

CPC分类号： H01J37/04 ,  H01J37/3007

摘要： The electron potential of an electron beam is switched between different values without moving the focal plane by effectively changing the axial position of the electron source at the same time that the electron potential is changed. The effective change in axial position of the electron source exactly compensates for the altered effectiveness which magnetic lenses have upon an electron beam of altered electron potential such that the final focal plane remains at the same position without adjusting the field strength of any magnetic lens.

摘要翻译： 电子束的电子电位在不同值之间切换，而不会通过在电子电位改变的同时有效地改变电子源的轴向位置来移动焦平面。 电子源的轴向位置的有效变化精确地补偿了磁透镜对电子电位变化的电子束的有效性的改变，使得最终焦平面保持在相同的位置，而不调整任何磁性透镜的场强。

公开(公告)号：US6011269A

公开(公告)日：2000-01-04

申请号：US58258

申请日：1998-04-10

申请人： Lee H. Veneklasen ,  Tai-Hon P. Chang ,  Marian Mankos

发明人： Lee H. Veneklasen ,  Tai-Hon P. Chang ,  Marian Mankos

IPC分类号： G03F1/08 ,  G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： A shaped electron beam column focuses electrons from an electron source to produce a shadow image of a shaped aperture on a writing plane. The shadow image of the shaped aperture is the defocused image of a shape aperture. This defocused shadow image is in the the object plane of the shaped electron beam column. The shadow image in the writing plane is defocused because an electron beam lens produces a focused image of the electron source off the writing plane. The size of the shadow image on the writing plane may be altered by adjusting the electron beam lens to change the distance between the electron source image and the writing plane, i.e., defocus. Thus, a relatively large shaped aperture may be used in comparison to shaped apertures used in conventional electron beam columns. Further, only a small total linear demagnification may be used, which permits the length of the shaped electron beam column to be decreased. Consequently, the electron-electron interactions are reduced resulting in increased edge resolution of the image on the writing plane and increased current in the shaped electron beam column thereby increasing throughput.

摘要翻译： 成形的电子束列聚焦来自电子源的电子，以在写入平面上产生成形孔的阴影图像。 成形孔的阴影图像是形状孔径的散焦图像。 该散焦的阴影图像位于成形电子束列的物平面内。 写入平面中的阴影图像散焦，因为电子束透镜产生离开写入平面的电子源的聚焦图像。 可以通过调整电子束透镜来改变电子源图像与书写平面之间的距离，即散焦，来改变写入平面上的阴影图像的大小。 因此，与常规电子束柱中使用的成形孔相比，可以使用相对大的成形孔。 此外，可以仅使用小的总线性缩小，这允许成形的电子束柱的长度减小。 因此，电子 - 电子相互作用减小，从而增加了写入平面上图像的边缘分辨率，并增加了成形电子束列中的电流，从而提高了产量。

公开(公告)号：US4477729A

公开(公告)日：1984-10-16

申请号：US432170

申请日：1982-10-01

申请人： Tai-Hon P. Chang ,  Alan D. Wilson

发明人： Tai-Hon P. Chang ,  Alan D. Wilson

IPC分类号： B23K26/00 ,  H01J37/302 ,  H01J37/317 ,  H01J37/304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/15 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/30494 ,  H01J2237/31764 ,  H01J2237/31776

摘要： A large lithographic pattern is written as quickly as possible by writing successive subpatterns in a vector scan mode of operation without any interruption between successive subpatterns. This is made possible by arranging the subpatterns so that they are adjacent to each other and are preferably overlapping and by gradually moving the workpiece with respect to the writing field so as to always keep the subpattern being written within the writing field of the beam. The speed and direction of the workpiece movement (relative to the writing field) is not predetermined for all patterns but is controlled instead by the pattern being written. A sparsely written pattern or portion of a pattern is accompanied by a more rapid table movement than what accompanies a densely written pattern or portion of a pattern. This is made possible by embedding pattern determined workpiece movement commands within the pattern defining data. Through the workpiece movement commands, relative movement between the workpiece and the writing field may be continuously controlled with respect to movement direction, velocity and acceleration.The desired relative position of the workpiece is continuously updated in tiny increments while a laser interferometer control system measures the error between the actual workpiece position and the desired workpiece position and causes the workpiece to track the desired position.

摘要翻译： 通过在矢量扫描操作模式中写入连续的子模式，在连续的子模式之间没有任何中断的情况下，尽可能快地写入大的光刻图案。 这通过将子图案布置成使得它们彼此相邻并且优选地重叠并且通过相对于写入场逐渐移动工件来实现，以便始终将子图案写入波束的写入场内。 工件运动的速度和方向（相对于写入场）对于所有图案都不是预先确定的，而是被写入的图案所控制。 一个稀疏写成的图案或图案的一部分伴随着比紧密写入的图案或图案部分更快的桌子移动。 这可以通过在图案定义数据中嵌入图案确定的工件移动命令来实现。 通过工件移动命令，可以相对于移动方向，速度和加速度连续地控制工件与写入区域之间的相对运动。 当激光干涉仪控制系统测量实际工件位置和所需工件位置之间的误差并使工件跟踪所需位置时，工件的期望相对位置以微小增量连续更新。

公开(公告)号：US6023060A

公开(公告)日：2000-02-08

申请号：US34893

申请日：1998-03-03

申请人： Tai-Hon P. Chang ,  Ho-Seob Kim

发明人： Tai-Hon P. Chang ,  Ho-Seob Kim

IPC分类号： H01J37/26 ,  G01Q30/02 ,  G01Q30/20 ,  G01Q70/08 ,  G01S19/04 ,  G01S19/13 ,  H01J37/16 ,  H01J37/28 ,  H01J3/14 ,  G21K7/00

CPC分类号： H01J37/28 ,  H01J2237/1205

摘要： A charged particle-beam microcolumn, which for example may be used for charged particle microscopy, with a T-shape configuration has a relatively narrow base structure supporting the beam forming charged particle optical column. The narrow base structure permits the T-shaped microcolumn and sample to be positioned at an angle other than normal with respect to each other, which allows generation of three-dimensional-like images of the sample surface. Thus, the incidence angle of the charged particle beam generated by the T-shaped microcolumn may be varied while a short working distance is maintained. A conventional secondary/backscattered charged particle detector may be used because the reflected angle of the charged particles allows a charged particle detector to be separated from the T-shaped microcolumn. Further, the small size of the T-shaped microcolumn permits observation of different parts of a large stationary sample by moving the T-shaped microcolumn with respect to the sample. Moreover, multiple T-shaped microcolumns may be arrayed to improve throughput.

摘要翻译： 具有T形构造的例如可用于带电粒子显微镜的带电粒子束微柱具有支撑束形成带电粒子光学柱的相对狭窄的基底结构。 狭窄的基部结构允许T形微柱和样品相对于彼此以正常的角度定位，这允许产生样品表面的三维样图像。 因此，由T形微柱产生的带电粒子束的入射角可以变化，同时保持短的工作距离。 可以使用常规的二次/反向散射带电粒子检测器，因为带电粒子的反射角允许带电粒子检测器与T形微柱分离。 此外，T形微柱的小尺寸允许通过相对于样品移动T形微柱来观察大的固定样品的不同部分。 此外，可以排列多个T形微柱以提高产量。

公开(公告)号：US5122663A

公开(公告)日：1992-06-16

申请号：US734986

申请日：1991-07-24

申请人： Tai-Hon P. Chang ,  Harry J. Mamin ,  Daniel Rugar

发明人： Tai-Hon P. Chang ,  Harry J. Mamin ,  Daniel Rugar

IPC分类号： G01N13/12 ,  G11B9/00 ,  G11B9/10 ,  H01J37/073 ,  H01J37/244 ,  H01J37/28

CPC分类号： G11B9/10 ,  G11B9/1409 ,  H01J37/073 ,  H01J37/244 ,  H01J37/28 ,  B82Y10/00 ,  H01J2237/1205 ,  H01J2237/2441 ,  H01J2237/2447 ,  H01J2237/2448 ,  H01J2237/24592

摘要： An electron beam imaging system is described wherein a sharp-tip electron source is biased to produce an electron flow and a conductive target is placed in the path of the electron flow. A planar, electrostatic lens is positioned in the electron flow path and between the electron source and target. The lens includes an aperture; at least a first conductive plane that is biased less negative than the electron source; and one or more conductive planes separated by dielectric layers. A secondary electron detector is formed on the surface of the electrostatic lens that is closest to the conductive target, whereby the lens may be positioned close to the target and still not obstruct secondary electrons emitted from the target from impinging on the secondary electron detector.

摘要翻译： 描述了一种电子束成像系统，其中尖端电子源被偏置以产生电子流，并且导电靶位于电子流的路径中。 平面静电透镜位于电子流动路径中，并位于电子源和靶之间。 透镜包括孔; 至少第一导电平面被偏压小于电子源的负值; 以及由电介质层分离的一个或多个导电平面。 在最靠近导电靶的静电透镜的表面上形成二次电子检测器，由此透镜可以靠近目标定位，并且不会阻碍从靶发射的二次电子撞击在二次电子检测器上。

公开(公告)号：US4621232A

公开(公告)日：1986-11-04

申请号：US610445

申请日：1984-05-15

申请人： Tai-Hon P. Chang ,  Philip J. Coane ,  Fritz-Jurgen Hohn ,  Walter W. Molzen, Jr. ,  Arthur R. Zingher

发明人： Tai-Hon P. Chang ,  Philip J. Coane ,  Fritz-Jurgen Hohn ,  Walter W. Molzen, Jr. ,  Arthur R. Zingher

IPC分类号： G01R1/073 ,  G01R31/26 ,  H01B1/24 ,  G01R31/02

CPC分类号： G01R31/2644 ,  G01R1/073 ,  H01B1/24

摘要： Apparatus and methods are disclosed for inspecting unsintered single or multiple layer ceramic specimens containing or carrying metal paste patterns of the type commonly used to ultimately form laminated multilayer ceramic (MLC) carriers for large scale integrated (LSI) chips. A relatively large surface area of an unsintered ceramic specimen (large in comparison with the minimum feature size of the paste patterns) is temporarily electrically contacted with a conforming electrode. The conforming electrode makes non-damaging electrical contact to any metallic paste exposed at the contacted area. Electric charge is either collected or delivered by this electrode, depending upon the mode of operation. The electrical continuity of metallic paste paths which contact the electrode and extend through the unfired ceramic specimen to surface positions not contacted by the electrode are tested either by delivering electric charge to the other surface locations and correlating therewith the collection of charge by the electrode, or by delivering charge by the electrode to all paste paths in contact therewith and detecting the presence of charge at the other surface locations. A preferred method either for delivering charge to such other surface locations or for detecting charge at such other surface locations is by using an electron probe beam. Various embodiments for the conforming electrode are described.

摘要翻译： 公开了用于检查含有或携带通常用于最终形成用于大规模集成（LSI）芯片的层叠多层陶瓷（MLC）载体的类型的金属浆料图案的未烧结的单层或多层陶瓷样品的装置和方法。 未烧结的陶瓷样品的相对较大的表面积（与糊状图案的最小特征尺寸相比较大）与暂时与适形电极电接触。 合适的电极与暴露在接触区域的任何金属膏形成非破坏性的电接触。 根据操作模式，电极是由该电极收集或传送的。 通过将电极接触而延伸穿过未焙烧的陶瓷样品到不与电极接触的表面位置的金属糊路径的电连续性通过将电荷递送到其它表面位置并与电极的电荷收集相关联来进行测试，或 通过电极将电荷递送到与其接触的所有糊状路径，并检测其他表面位置处的电荷的存在。 用于将电荷输送到这种其它表面位置或用于在这样的其它表面位置处检测电荷的优选方法是通过使用电子探针光束。 描述了适配电极的各种实施例。