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公开(公告)号:US10347574B2
公开(公告)日:2019-07-09
申请号:US15876227
申请日:2018-01-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Dai-Jang Chen , Hsiang-Tai Lu , Hsien-Wen Liu , Chih-Hsien Lin , Shih-Ting Hung , Po-Yao Chuang
IPC: H01L23/49 , H01L23/31 , H01L25/04 , H01L25/07 , H01L25/11 , H01L23/498 , H01L21/66 , H01L25/065 , H01L21/56 , H01L23/00 , H01L25/00 , H01L23/538 , H01L23/373 , H01L25/075 , H01L23/36 , H01L23/367
Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes a first semiconductor chip, a plurality of through integrated fan-out vias, an encapsulation layer and a redistribution layer structure. The first semiconductor chip includes a heat dissipation layer, and the heat dissipation layer covers at least 30 percent of a first surface of the first semiconductor chip. The through integrated fan-out vias are aside the first semiconductor chip. The encapsulation layer encapsulates the through integrated fan-out vias. The redistribution layer structure is at a first side of the first semiconductor chip and thermally connected to the heat dissipation layer of the first semiconductor chip.
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公开(公告)号:US20190096791A1
公开(公告)日:2019-03-28
申请号:US15876227
申请日:2018-01-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Dai-Jang Chen , Hsiang-Tai Lu , Hsien-Wen Liu , Chih-Hsien Lin , Shih-Ting Hung , Po-Yao Chuang
IPC: H01L23/498 , H01L23/31 , H01L21/66 , H01L25/065 , H01L25/00 , H01L21/56 , H01L23/00 , H01L23/373
CPC classification number: H01L23/49822 , H01L21/56 , H01L22/14 , H01L22/32 , H01L23/3114 , H01L23/36 , H01L23/3677 , H01L23/3736 , H01L23/49833 , H01L23/5383 , H01L23/5384 , H01L23/5389 , H01L24/03 , H01L24/81 , H01L25/043 , H01L25/0657 , H01L25/074 , H01L25/0756 , H01L25/117 , H01L25/50 , H01L2224/02331 , H01L2224/02379 , H01L2224/0401 , H01L2224/73204 , H01L2224/73259 , H01L2224/81005 , H01L2924/15311 , H01L2924/1533
Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes a first semiconductor chip, a plurality of through integrated fan-out vias, an encapsulation layer and a redistribution layer structure. The first semiconductor chip includes a heat dissipation layer, and the heat dissipation layer covers at least 30 percent of a first surface of the first semiconductor chip. The through integrated fan-out vias are aside the first semiconductor chip. The encapsulation layer encapsulates the through integrated fan-out vias. The redistribution layer structure is at a first side of the first semiconductor chip and thermally connected to the heat dissipation layer of the first semiconductor chip.
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公开(公告)号:US09607999B2
公开(公告)日:2017-03-28
申请号:US14880997
申请日:2015-10-12
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Hsiang-Tai Lu , Chih-Hsien Lin
IPC: H01L27/115 , H01L21/3205 , G11C29/04 , H01L21/28 , G11C16/02 , G11C16/04 , G11C16/22 , H01L21/66
CPC classification number: H01L27/11521 , G11C16/02 , G11C16/0416 , G11C16/225 , G11C29/04 , G11C2029/0403 , H01L21/28273 , H01L21/3205 , H01L22/14 , H01L27/11558
Abstract: A method of forming a semiconductor memory storage device that includes forming first and second doped regions of a first type in a semiconductor substrate and laterally spaced from one another, forming a gate dielectric extends over the semiconductor substrate between the first and second doped regions, forming a floating gate on the gate dielectric, and forming an ultraviolet (UV) light blocking material vertically disposed above the floating gate such that the floating gate remains electrically charged after the semiconductor memory storage device is exposed to UV light.
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公开(公告)号:US20200013707A1
公开(公告)日:2020-01-09
申请号:US16504324
申请日:2019-07-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Shin-Puu Jeng , Dai-Jang Chen , Hsiang-Tai Lu , Hsien-Wen Liu , Chih-Hsien Lin , Shih-Ting Hung , Po-Yao Chuang
IPC: H01L23/498 , H01L23/31 , H01L21/66 , H01L25/065 , H01L21/56 , H01L23/00 , H01L25/00 , H01L23/538
Abstract: Integrated fan-out packages and methods of forming the same are disclosed. An integrated fan-out package includes a first semiconductor chip, a plurality of through integrated fan-out vias, an encapsulation layer and a redistribution layer structure. The first semiconductor chip includes a heat dissipation layer, and the heat dissipation layer covers at least 30 percent of a first surface of the first semiconductor chip. The through integrated fan-out vias are aside the first semiconductor chip. The encapsulation layer encapsulates the through integrated fan-out vias. The redistribution layer structure is at a first side of the first semiconductor chip and thermally connected to the heat dissipation layer of the first semiconductor chip.
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