MODULAR PRESSURIZED WORKSTATION
    4.
    发明公开

    公开(公告)号:US20230178401A1

    公开(公告)日:2023-06-08

    申请号:US18104731

    申请日:2023-02-01

    CPC classification number: H01L21/67703 H01L21/67196 H01L21/67727

    Abstract: In an embodiment, a system, includes: a first pressurized load port interfaced with a workstation body; a second pressurized load port interfaced with the workstation body; the workstation body maintained at a set pressure level, wherein the workstation body comprises an internal material handling system configured to move a semiconductor workpiece within the workstation body between the first and second pressurized load ports at the set pressure level; a first modular tool interfaced with the first pressurized load port, wherein the first modular tool is configured to process the semiconductor workpiece; and a second modular tool interfaced with the second pressurized load port, wherein the second modular tool is configured to inspect the semiconductor workpiece processed by the first modular tool.

    MODULAR PRESSURIZED WORKSTATION
    5.
    发明申请

    公开(公告)号:US20210265187A1

    公开(公告)日:2021-08-26

    申请号:US17317747

    申请日:2021-05-11

    Abstract: In an embodiment, a system, includes: a first pressurized load port interfaced with a workstation body; a second pressurized load port interfaced with the workstation body; the workstation body maintained at a set pressure level, wherein the workstation body comprises an internal material handling system configured to move a semiconductor workpiece within the workstation body between the first and second pressurized load ports at the set pressure level; a first modular tool interfaced with the first pressurized load port, wherein the first modular tool is configured to process the semiconductor workpiece; and a second modular tool interfaced with the second pressurized load port, wherein the second modular tool is configured to inspect the semiconductor workpiece processed by the first modular tool.

    MODULAR PRESSURIZED WORKSTATION
    6.
    发明公开

    公开(公告)号:US20240136213A1

    公开(公告)日:2024-04-25

    申请号:US18403613

    申请日:2024-01-03

    CPC classification number: H01L21/67703 H01L21/67196 H01L21/67727

    Abstract: In an embodiment, a system, includes: a first pressurized load port interfaced with a workstation body; a second pressurized load port interfaced with the workstation body; the workstation body maintained at a set pressure level, wherein the workstation body comprises an internal material handling system configured to move a semiconductor workpiece within the workstation body between the first and second pressurized load ports at the set pressure level; a first modular tool interfaced with the first pressurized load port, wherein the first modular tool is configured to process the semiconductor workpiece; and a second modular tool interfaced with the second pressurized load port, wherein the second modular tool is configured to inspect the semiconductor workpiece processed by the first modular tool.

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