Process of producing copper plated resin article
    1.
    发明授权
    Process of producing copper plated resin article 失效
    生产铜版树脂制品的工艺

    公开(公告)号:US5106462A

    公开(公告)日:1992-04-21

    申请号:US432811

    申请日:1989-11-07

    IPC分类号: C23C18/08 C25D5/56 H05K3/10

    摘要: Process for producing a copper plated resin article by forming a uniform copper coating having excellent adhesive strength on a fiber-reinforced or unreinforced thermoplastic or thermosetting resin article having a heat deformation temperature higher than 165.degree. C. The resin article is heated along with a source of copper formate under a reduced pressure or in a non-oxidative atmosphere to a temperature in the range above 165.degree. C. but lower than the heat deformation temperature of the resin article. The process makes it possible to produce a resin article having formed thereon a copper layer having an excellent adhesive strength by a very simple manner, and the resin article thus obtained can be used in various industrial fields.

    Process for producing copper fine powder
    3.
    发明授权
    Process for producing copper fine powder 失效
    生产铜粉的工艺

    公开(公告)号:US5094686A

    公开(公告)日:1992-03-10

    申请号:US580675

    申请日:1990-09-11

    IPC分类号: B22F9/30 C22B5/02 C22B9/14

    CPC分类号: B22F9/30 C22B5/02 C22B9/14

    摘要: A process for producing a copper fine powder, which comprises thermally decomposing anhydrous copper formate in a solid phase in a non-oxidizing atmosphere at a temperature in the range of from 150.degree. to 300.degree. C., thereby yielding a copper fine powder having a primary particle diameter of from 0.2 to 1 .mu.m, a specific surface area of from 5 to 0.5 m.sup.2 /g and small agglomerating properties, said anhydrous copper formate being an anhydrous copper formate powder 90 wt % or more of which undergoes thermal decomposition within a temperature range of from 160.degree. to 200.degree. C. when the anhydrous copper formate powder is heated in a nitrogen or hydrogen gas atmosphere at a heating rate of 3.degree. C./min.

    Process for producing glycidyl 2-hydroxyisobutyrate and composition containing the product
    6.
    发明授权
    Process for producing glycidyl 2-hydroxyisobutyrate and composition containing the product 有权
    制备2-羟基异丁酸缩水甘油酯的方法和含有该产物的组合物

    公开(公告)号:US08022233B2

    公开(公告)日:2011-09-20

    申请号:US11993999

    申请日:2006-06-30

    IPC分类号: C07D301/12 C08F283/10

    CPC分类号: C07D301/12 C07D303/16

    摘要: An efficient process for producing glycidyl 2-hydroxyisobutyrate useful as a reactive diluent is provided. When glycidyl 2-hydroxyisobutyrate is produced by reacting allyl 2-hydroxyisobutyrate with hydrogen peroxide, a solution in which allyl 2-hydroxyisobutyrate is dissolved in an aliphatic ester as a solvent is reacted with hydrogen peroxide in the presence of a crystalline titanosilicate catalyst. Thus, a production process of glycidyl 2-hydroxyisobutyrate, which is small in degradation of purity and yield due to generation of peroxides or the like, and products thereof are provided.

    摘要翻译: 提供了一种生产用作反应性稀释剂的2-羟基异丁酸缩水甘油酯的有效方法。 当2-羟基异丁酸缩水甘油酯是通过使2-羟基异丁酸烯丙酯与过氧化氢反应来制备的,其中将2-羟基异丁酸烯丙酯溶解在作为溶剂的脂肪族酯中的溶液与过氧化氢在结晶钛硅酸盐催化剂存在下反应。 因此,提供了由于产生过氧化物等而导致的纯度和产率降低小的2-羟基异丁酸缩水甘油酯的制备方法及其产物。

    Process for preparing lactamide
    7.
    发明授权
    Process for preparing lactamide 失效
    制备酰胺的方法

    公开(公告)号:US6124501A

    公开(公告)日:2000-09-26

    申请号:US261858

    申请日:1999-03-03

    IPC分类号: C07C231/06 C07C235/06

    CPC分类号: C07C231/065

    摘要: A process for preparing lactamide with a high conversion and a high selectivity without the deterioration of a catalytic activity in a short time, which comprises subjecting lactonitrile to a hydrating reaction in the presence of (A) a catalyst including an oxide of manganese as a main component, (B) an oxidizing agent and (C) hydrogen cyanide or hydrogen cyanide and a compound represented by the formula ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom, a C.sub.1 to C.sub.8 alkyl group, a C.sub.1 to C.sub.8 hyroxyalkyl group, a C.sub.1 to C.sub.8 aminoalkyl group or a C.sub.1 to C.sub.8 halogenoalkyl group.

    摘要翻译: 一种制备具有高转化率和高选择性而不会在短时间内催化活性降低的乳酰胺的方法,其包括在(A)包含以锰的氧化物为主要原料的催化剂存在下,使乳腈进行水合反应 组分,(B)氧化剂和(C)氰化氢或氰化氢和由下式表示的化合物其中R1,R2和R3各自为氢原子,C1至C8烷基,C1至C8羟烷基, C1〜C8氨基烷基或C1〜C8卤代烷基。

    PRODUCTION METHOD FOR UBIQUINONE POWDER FOR USE IN PREPARATIONS AND PRODUCT THEREOF
    8.
    发明申请
    PRODUCTION METHOD FOR UBIQUINONE POWDER FOR USE IN PREPARATIONS AND PRODUCT THEREOF 有权
    UBIQUINONE粉末的生产方法用于制备及其制品

    公开(公告)号:US20120059194A1

    公开(公告)日:2012-03-08

    申请号:US13260147

    申请日:2010-03-29

    IPC分类号: C07C49/84 B28B17/00

    摘要: Disclosed are a production method for a ubiquinone powder for use in preparations, including Step 1 of compression molding a ubiquinone crystal powder at a linear molding pressure of from 0.6 to 2.5 tons/cm to obtain a compressed fragment; and Step 2 of grinding the compressed fragment obtained in Step 1 to obtain a powder; and a ubiquinone powder for use in preparations, which is obtained by the subject production method. According to the subject production method, it becomes possible to provide a ubiquinone powder for use in preparations for medicines and health foods, which has a high bulk density, a small angle of repose and excellent handling properties and fluidity, without using an additive such as an excipient, a binder and the like.

    摘要翻译: 公开了用于制备的泛醌粉末的制备方法,包括在0.6-2.5吨/厘米的线性成型压力下压制成型泛醌晶体粉末的步骤1,得到压片; 和步骤2,研磨步骤1中得到的压片,得到粉末; 和用于制备的泛醌粉末,其通过目标制备方法获得。 根据本发明的制备方法,可以提供一种用于药物和保健食品制剂的泛醌粉末,其具有高体积密度,小的休止角和优异的操作性能和流动性,而不使用添加剂如 赋形剂,粘合剂等。

    PROCESS FOR PRODUCING GLYCIDYL 2-HYDROXYISOBUTYRATE AND COMPOSITION CONTAINING THE PRODUCT
    9.
    发明申请
    PROCESS FOR PRODUCING GLYCIDYL 2-HYDROXYISOBUTYRATE AND COMPOSITION CONTAINING THE PRODUCT 有权
    生产甘油二羟基异丁酸酯的方法和含有产品的组合物

    公开(公告)号:US20090030163A1

    公开(公告)日:2009-01-29

    申请号:US11993999

    申请日:2006-06-30

    IPC分类号: C07D301/12 C08L63/00

    CPC分类号: C07D301/12 C07D303/16

    摘要: An efficient process for producing glycidyl 2-hydroxyisobutyrate useful as a reactive diluent is provided. When glycidyl 2-hydroxyisobutyrate is produced by reacting allyl 2-hydroxyisobutyrate with hydrogen peroxide, a solution in which allyl 2-hydroxyisobutyrate is dissolved in an aliphatic ester as a solvent is reacted with hydrogen peroxide in the presence of a crystalline titanosilicate catalyst. Thus, a production process of glycidyl 2-hydroxyisobutyrate, which is small in degradation of purity and yield due to generation of peroxides or the like, and products thereof are provided.

    摘要翻译: 提供了一种生产用作反应性稀释剂的2-羟基异丁酸缩水甘油酯的有效方法。 当2-羟基异丁酸缩水甘油酯是通过使2-羟基异丁酸烯丙酯与过氧化氢反应来制备的,其中将2-羟基异丁酸烯丙酯溶解在作为溶剂的脂肪族酯中的溶液与过氧化氢在结晶钛硅酸盐催化剂存在下反应。 因此,提供了由于产生过氧化物等而导致的纯度和产率降低小的2-羟基异丁酸缩水甘油酯的制备方法及其产物。

    Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device
    10.
    发明授权
    Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device 失效
    半导体装置用清洗剂及半导体装置的制造方法

    公开(公告)号:US06462005B1

    公开(公告)日:2002-10-08

    申请号:US08369215

    申请日:1995-01-05

    IPC分类号: C11D162

    摘要: A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well as an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. In the semiconductor device manufacturing process, after forming a mask with a photoresist, a wiring structure is formed by dry etching of a conductive layer, wherein a protecting deposition film has been formed on side walls of the conductive layer. Use of the cleaning agent enables the protecting deposition film to be removed in a highly reliable manner with the surface of the conductive layer being decontaminated and cleaned such that no corrosion of the conductive layer occurs.

    摘要翻译: 一种用于制造半导体器件的清洁剂,其包含含有季铵盐和氟化合物的水溶液,或含有季铵盐和氟化合物的水溶液,以及选自下组的有机溶剂 由酰胺,内酯,腈,醇和酯组成。 在半导体器件制造方法中,在用光致抗蚀剂形成掩模之后,通过干蚀刻导电层形成布线结构,其中在导电层的侧壁上形成保护沉积膜。 使用清洁剂能够以高度可靠的方式去除保护性沉积膜,同时导电层的表面被净化和清洁,使得不会发生导电层的腐蚀。