公开(公告)号：US20120196977A1

公开(公告)日：2012-08-02

申请号：US13500428

申请日：2010-04-13

申请人： Takeo Tomiyama ,  Kenji Suzuki ,  Makoto Mizutani ,  Shouko Tanaka ,  Akihiro Yoshida ,  Shingo Kobayashi ,  Hayato Kotani ,  Norihiro Fukuta ,  Isao Tada

发明人： Takeo Tomiyama ,  Kenji Suzuki ,  Makoto Mizutani ,  Shouko Tanaka ,  Akihiro Yoshida ,  Shingo Kobayashi ,  Hayato Kotani ,  Norihiro Fukuta ,  Isao Tada

IPC分类号： C08L75/04 ,  C08G18/75 ,  C08L83/10 ,  C08G18/73

CPC分类号： C08G18/4277 ,  C08G18/289 ,  C08G18/3876 ,  C08G18/664 ,  C08G18/758 ,  C08G18/792 ,  C08G18/8022 ,  C08G2120/00 ,  H01L23/293 ,  H01L23/3107 ,  H01L33/56 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2924/00014

摘要： A urethane resin composition obtained by a method comprising the steps of: melt mixing an isocyanate (B), an antioxidant (C), a release agent (D) and a dispersing agent (E) to obtain a molten mixture, and mixing the molten mixture and a polyol (A): wherein the release agent (D) is a compound represented by the following formula (1): [Chemical Formula 1] R1—COOH  (1) the dispersing agent (E) is a compound represented by the following formula (2) having a weight-average molecular weight Mw of no greater than 16000: and the content of the dispersing agent (E) in the urethane resin composition is 0.1 to 5.0 wt %.

摘要翻译： 一种聚氨酯树脂组合物，该方法包括以下步骤：将异氰酸酯（B），抗氧化剂（C），脱模剂（D）和分散剂（E）熔融混合，得到熔融混合物， 混合物和多元醇（A）：其中脱模剂（D）是由下式（1）表示的化合物：[化学式1] R 1 -COOH（1）分散剂（E）是由 重均分子量Mw为16000以下的下述式（2）：聚氨酯树脂组合物中的分散剂（E）的含量为0.1〜5.0重量％。

公开(公告)号：US20110091661A1

公开(公告)日：2011-04-21

申请号：US12903455

申请日：2010-10-13

申请人： Kaoru Ito ,  Masumi Noguchi ,  Hideaki Tanaka ,  Hiroyuki Ikeda ,  Makoto Shimomura ,  Isao Tada ,  Nobuhiro Hayashi ,  Hagane Irikura

发明人： Kaoru Ito ,  Masumi Noguchi ,  Hideaki Tanaka ,  Hiroyuki Ikeda ,  Makoto Shimomura ,  Isao Tada ,  Nobuhiro Hayashi ,  Hagane Irikura

IPC分类号： H05H1/24 ,  C23C14/14

CPC分类号： C23C14/20 ,  B05D1/60 ,  B05D7/52 ,  C23C14/562 ,  H01G4/008 ,  H01G4/145 ,  H01G4/33 ,  H01G13/00

摘要： An apparatus for producing a multilayer sheet including a resin film, a vapor-deposited metal film and a vapor-deposited polymer film at a low cost and with excellent productivity is provided which comprises: a vacuum chamber which is made to be in a vacuum state by exhaust means; a feeding roller; a take up roller; a first to third rollers, first metal vapor deposition means for forming a first vapor-deposited metal film on one surface of a resin film at a periphery of the first roller; vapor deposition polymerization means for forming a vapor-deposited polymer film on the first vapor-deposited metal film by vapor deposition polymerization at a periphery of the second roller; and second metal vapor deposition means for forming the second vapor-deposited metal film on the other surface of the resin film at a periphery of the third roller.

摘要翻译： 提供一种以低成本和优异的生产率制造包括树脂膜，气相沉积金属膜和气相沉积聚合物膜的多层片材的设备，其包括：真空室，其被制成真空状态 用排气装置 喂料辊; 卷取辊; 第一至第三辊，第一金属蒸镀装置，用于在第一辊的周围在树脂膜的一个表面上形成第一蒸镀金属膜; 气相沉积聚合装置，用于在第二辊的周围通过气相沉积聚合在第一气相沉积金属膜上形成气相沉积聚合物膜; 以及第二金属蒸镀装置，用于在第三辊的周围在树脂膜的另一个表面上形成第二蒸镀金属膜。

公开(公告)号：US20090320747A1

公开(公告)日：2009-12-31

申请号：US12374675

申请日：2007-07-26

申请人： Nobuhiro Hayashi ,  Tomoharu Fujii ,  Isao Tada ,  Atsushi Nakatsuka

发明人： Nobuhiro Hayashi ,  Tomoharu Fujii ,  Isao Tada ,  Atsushi Nakatsuka

IPC分类号： C23C14/56

CPC分类号： C23C14/042 ,  B05C1/0821 ,  B05C1/083 ,  B05C1/0834 ,  C23C14/562 ,  H01G13/00 ,  H01G13/006

摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.

摘要翻译： 本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。 解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对 印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

公开(公告)号：US4395657A

公开(公告)日：1983-07-26

申请号：US216677

申请日：1980-12-15

申请人： Isao Tada ,  Toshio Okamura ,  Akira Kousaka ,  Kaichiro Nakai

发明人： Isao Tada ,  Toshio Okamura ,  Akira Kousaka ,  Kaichiro Nakai

IPC分类号： H01J23/10 ,  H01J25/50

CPC分类号： H01J23/10

摘要： A magnetron unit has a magnetic flux path for magnetic flux supplied from a permanent magnet to the interaction space. A magnetic member is disposed outside the anode cylinder for providing a by-path for the magnetic flux supplied from the permanent magnet. This magnetic member is made of a magnetic compensating alloy whose magnetic permeability decreases with an increase in temperature.

摘要翻译： 磁控管单元具有用于从永久磁铁供应到相互作用空间的磁通量的磁通量。 磁性构件设置在阳极筒的外侧，用于为从永磁体供给的磁通提供旁路。 该磁性部件由磁性补偿合金制成，其磁导率随着温度的升高而降低。

公开(公告)号：USD689534S1

公开(公告)日：2013-09-10

申请号：US29373100

申请日：2011-02-28

申请人： Shinya Fujimoto ,  Nobuhiro Hayashi ,  Takayoshi Hirono ,  Isao Tada ,  Shuji Saito

设计人： Shinya Fujimoto ,  Nobuhiro Hayashi ,  Takayoshi Hirono ,  Isao Tada ,  Shuji Saito

公开(公告)号：US20130168243A1

公开(公告)日：2013-07-04

申请号：US13823192

申请日：2011-09-07

申请人： Takayoshi Hirono ,  Isao Tada

发明人： Takayoshi Hirono ,  Isao Tada

IPC分类号： C23C14/34

CPC分类号： C23C14/34 ,  C23C14/50 ,  C23C14/562

摘要： Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.

摘要翻译： 提供一种低成本的真空处理装置，其能够使装置小型化并且实现良好的生产率。 细长的片材基材通过真空处理室输送，在该真空处理室中对片材基材进行规定的处理。 真空处理室设置有单个处理单元，并且具有与真空处理室连续设置的辅助真空室。 辅助真空室设有进料辊和卷取辊。 真空处理装置包括一对第一辊单元，设置在真空处理室中的处理单元的相对侧。 每个第一辊单元具有以规则距离布置的多个辊。 辊在轴向上彼此偏离并且以这样的交错方式布置，使得片状基材被螺旋缠绕在辊上。

公开(公告)号：US20100055311A1

公开(公告)日：2010-03-04

申请号：US12597916

申请日：2008-04-18

申请人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka

发明人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka

IPC分类号： C23C16/44 ,  C23C16/00 ,  B65G13/00

CPC分类号： C23C14/562 ,  B65H27/00 ,  B65H2701/1315

摘要： [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance.[Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including a guide roller and an auxiliary roller, the guide roller including a pair of annular guide portions that support side edge portions of a base film, the auxiliary roller being opposed to the guide roller and pressing the side edge portions of the base film against the pair of guide portions. As a result, a deposition area of the base film and roll surfaces of the guide roller and auxiliary roller of the guide unit can be prevented from being brought into contact with each other, and the deposition area) can thus be protected.

摘要翻译： 为了使基膜的沉积区域得到保护并且实现稳定的膜行进性能。 本发明的卷绕式真空蒸镀装置具备：引导部，其具有引导辊和辅助辊，所述引导辊包括一对环状的引导部，所述导向部支承基膜的侧缘部 辅助辊与引导辊相对并将基膜的侧边缘部分压靠在一对引导部上。 结果，可以防止基膜的沉积区域和引导单元的引导辊和辅助辊的辊表面彼此接触，从而可以保护沉积区域）。

公开(公告)号：US5759958A

公开(公告)日：1998-06-02

申请号：US817916

申请日：1997-04-25

申请人： Yoshinori Endo ,  Hirofumi Nakagawa ,  Hiroshi Fujishima ,  Isao Tada ,  Minoru Motoki ,  Daisuke Yanase ,  Mitsuyuki Murakami ,  Tatsuya Akasaka

发明人： Yoshinori Endo ,  Hirofumi Nakagawa ,  Hiroshi Fujishima ,  Isao Tada ,  Minoru Motoki ,  Daisuke Yanase ,  Mitsuyuki Murakami ,  Tatsuya Akasaka

IPC分类号： A01N43/653 ,  C07D405/04

CPC分类号： C07D405/04 ,  A01N43/653

摘要： An object of the present invention is to provide a 1,2,4-triazole derivative which in a small amount exhibits high herbicidal activity against weeds in paddy fields, lawns or farmlands, the derivative being without injury to rice, turf grasses and crops. The 1,2,4-triazole derivative is represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and independently represent hydrogen or methyl, R.sup.3 and R.sup.4 are the same or different and independently represent halogen, lower alkyl, lower alkoxy, lower haloalkyl, lower haloalkoxy or cyano, R.sup.5 represents methyl or ethyl and X represents oxygen or sulfur.

摘要翻译： PCT No.PCT / JP96 / 00003 Sec。 371日期1997年04月25日 102（e）日期1997年4月25日PCT提交1996年1月4日PCT公布。 出版物WO97 / 09326 日本特开1997年3月13日本发明的目的是提供一种1,2,4-三唑衍生物，其在水田，草坪或农田中对杂草具有较高的除草活性，该衍生物不受大米伤害， 草坪草和作物。 1,2,4-三唑衍生物由下式表示：其中R 1和R 2相同或不同并且独立地表示氢或甲基，R 3和R 4相同或不同并且独立地表示卤素，低级烷基，低级 烷氧基，低级卤代烷基，低级卤代烷氧基或氰基，R5代表甲基或乙基，X代表氧或硫。

公开(公告)号：US07896968B2

公开(公告)日：2011-03-01

申请号：US11792810

申请日：2006-05-10

申请人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

发明人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/3277 ,  B08B7/00 ,  C23C16/4405 ,  C23C16/46 ,  C23C16/5096 ,  C23C16/545 ,  H01J37/32009

摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.

摘要翻译： 本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理 在沉积到膜上的路径。 相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22） 使其在沉积位置大致线性地移动。 因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。 薄膜通过金属带（40）加热，同时在薄膜背面行进。 可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。 通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

公开(公告)号：US20080006206A1

公开(公告)日：2008-01-10

申请号：US11792810

申请日：2006-05-10

申请人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

发明人： Takayoshi Hirono ,  Isao Tada ,  Atsushi Nakatsuka ,  Masashi Kikuchi ,  Hideyuki Ogata ,  Hiroaki Kawamura ,  Kazuya Saito ,  Masatoshi Sato

IPC分类号： C23C16/505 ,  C23C16/44 ,  H01L21/205

CPC分类号： H01J37/3277 ,  B08B7/00 ,  C23C16/4405 ,  C23C16/46 ,  C23C16/5096 ,  C23C16/545 ,  H01J37/32009

摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.

摘要翻译： 本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理 在沉积到膜上的路径。 相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22） 使其在沉积位置基本线性地行进。 因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。 薄膜通过金属带（40）加热，同时在薄膜背面行进。 可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。 通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。