公开(公告)号：US4720085A

公开(公告)日：1988-01-19

申请号：US904782

申请日：1986-09-04

申请人： Takeyoshi Shinbori ,  Takeo Fukumura ,  Yoshio Kimura

发明人： Takeyoshi Shinbori ,  Takeo Fukumura ,  Yoshio Kimura

IPC分类号： B60G3/01 ,  B60G13/00 ,  B60G15/12 ,  B60G17/015 ,  F16F9/46 ,  B60G17/00 ,  B60G11/26 ,  F16F5/00

CPC分类号： F16F9/46 ,  B60G13/008 ,  B60G15/12 ,  B60G17/0152 ,  B60G3/01 ,  B60G2204/418 ,  B60G2204/4232 ,  B60G2400/106 ,  B60G2400/204 ,  B60G2400/252 ,  B60G2400/412 ,  B60G2500/10 ,  B60G2500/22 ,  B60G2500/30 ,  B60G2600/18 ,  B60G2600/20 ,  B60G2600/26 ,  B60G2800/014 ,  B60G2800/20

摘要： A vehicle suspension apparatus comprising a body with an internal space and capable of contraction and expansion within which a gas chamber and an oil chamber are formed, an auxiliary container having therein a gas chamber, a channel with a valve connecting the gas chamber in the body and gas chamber defined in the auxiliary container, and a restriction member mounted in the oil chamber having a contrable orifice which allow passage for the working oil occupied with the orifice therebetween.

摘要翻译： 一种车辆悬架装置，包括具有内部空间且能够收缩和膨胀的主体，其中形成有气体室和油室，辅助容器，其中具有气体室，具有阀门的通道，其连接气体室中的气体 以及限定在所述辅助容器中的气室，以及安装在所述油室中的限制构件，所述限制构件具有允许通过其间的所述孔的工作油的可调孔。

公开(公告)号：US4452435A

公开(公告)日：1984-06-05

申请号：US379470

申请日：1982-05-18

申请人： Takeyoshi Shinbori ,  Yoshio Kimura

发明人： Takeyoshi Shinbori ,  Yoshio Kimura

IPC分类号： B60G17/027 ,  B60G17/06 ,  B61F5/30 ,  F16F1/22 ,  B60G11/02

CPC分类号： B61F5/308 ,  B60G17/0275 ,  B60G17/06 ,  B61F5/302 ,  F16F1/22 ,  B60G2202/112 ,  B60G2500/20

摘要： An apparatus for controlling friction between the leaf springs of a laminated leaf spring assembly comprises a clamp mounted on the laminated leaf spring assembly for clamping the assembly in the direction of its thickness, and a hydraulic cylinder urging the laminated leaf spring assembly against a supporting member of the clamp. A return spring having a number of initially coned disc springs is disposed in a rod chamber of the hydraulic cylinder. The pressure of a pressurized fluid supplied into a head chamber of the hydraulic cylinder is controlled by a control valve. The operating pressure of the control valve is controlled by detecting the variations in predetermined factors of a body to be supported and supplying signals to the control valve in accordance with the variations.

摘要翻译： 用于控制层压板簧组件的板簧之间的摩擦力的装置包括安装在层压板簧组件上的夹具，用于沿着其厚度方向夹紧组件;以及液压缸，其将层压板簧组件推压到支撑构件上 的夹具。 具有多个初始盘形弹簧的复位弹簧设置在液压缸的杆室中。 供应到液压缸的头部腔室中的加压流体的压力由控制阀控制。 控制阀的工作压力是通过检测要被支撑的物体的预定因子的变化并根据变化量向控制阀提供信号来控制的。

公开(公告)号：US20100326353A1

公开(公告)日：2010-12-30

申请号：US12855524

申请日：2010-08-12

申请人： Masami AKIMOTO ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami AKIMOTO ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B05C9/12

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745

摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

公开(公告)号：US20100277755A1

公开(公告)日：2010-11-04

申请号：US12836395

申请日：2010-07-14

申请人： Yoshio Kimura ,  Yushi Matsukubo ,  Fumio Mikami ,  Yoshinobu Umeda ,  Tadashi Kawaguchi ,  Hiroshi Uchikawa ,  Yasuhiko Hirano ,  Hitoshi Imai ,  Hiroyasu Morita

发明人： Yoshio Kimura ,  Yushi Matsukubo ,  Fumio Mikami ,  Yoshinobu Umeda ,  Tadashi Kawaguchi ,  Hiroshi Uchikawa ,  Yasuhiko Hirano ,  Hitoshi Imai ,  Hiroyasu Morita

IPC分类号： G06K15/02 ,  H04L9/28

CPC分类号： H04N1/44 ,  H04L9/0822 ,  H04N1/00236 ,  H04N2201/0039 ,  H04N2201/0094

摘要： An information processing apparatus connected to a printing apparatus via a network encrypts print data if identification information is input, and does not encrypt print data if identification information is not input. If identification information is input and the print data has been encrypted, the information processing apparatus sends a print job including the encrypted print data to the printing apparatus via the network; otherwise, the information processing apparatus sends unencrypted print data to the printing apparatus via the network.

摘要翻译： 经由网络连接到打印装置的信息处理装置如果输入了识别信息则对打印数据进行加密，如果未输入识别信息，则不对打印数据进行加密。 如果输入了识别信息并且打印数据已被加密，则信息处理设备经由网络将包含加密的打印数据的打印作业发送到打印设备; 否则，信息处理装置经由网络向打印装置发送未加密的打印数据。

公开(公告)号：US07797855B2

公开(公告)日：2010-09-21

申请号：US11505810

申请日：2006-08-18

申请人： Tetsuo Fukuoka ,  Masami Akimoto ,  Takahiro Kitano ,  Yoshio Kimura ,  Shinichi Hayashi ,  Hikaru Ito

发明人： Tetsuo Fukuoka ,  Masami Akimoto ,  Takahiro Kitano ,  Yoshio Kimura ,  Shinichi Hayashi ,  Hikaru Ito

IPC分类号： F26B21/06

CPC分类号： C30B33/02 ,  C30B35/00 ,  H01L21/67098 ,  H01L21/67748

摘要： A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.

摘要翻译： 加热装置2包括壳体20; 平面加热室4，其设置在壳体2中并且适于加热用作基板的晶片W，加热室4的一侧开口用于承载和执行晶片; 以及设置在加热室4中的加热板44,45，使得晶片W能够从上下两者加热。 冷却板3设置在位于加热室4的开口附近的壳体20中，用于在被加热板44,45加热之后冷却晶片W.此外，在壳体20中设置有承载装置 用于在冷却板3的上部位置和加热室4的内部之间承载晶片W，使得可以在将晶片W保持在加热室4中的情况下进行晶片W的热处理。

公开(公告)号：US07793609B2

公开(公告)日：2010-09-14

申请号：US11342616

申请日：2006-01-31

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B05C5/02

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745

摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

摘要翻译： 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

公开(公告)号：US07782477B2

公开(公告)日：2010-08-24

申请号：US11041067

申请日：2005-01-21

申请人： Yoshio Kimura ,  Yushi Matsukubo ,  Fumio Mikami ,  Yoshinobu Umeda ,  Tadashi Kawaguchi ,  Hiroshi Uchikawa ,  Yasuhiko Hirano ,  Hitoshi Imai ,  Hiroyasu Morita

发明人： Yoshio Kimura ,  Yushi Matsukubo ,  Fumio Mikami ,  Yoshinobu Umeda ,  Tadashi Kawaguchi ,  Hiroshi Uchikawa ,  Yasuhiko Hirano ,  Hitoshi Imai ,  Hiroyasu Morita

IPC分类号： G06F15/00 ,  B41J1/00

CPC分类号： H04N1/44 ,  H04L9/0822 ,  H04N1/00236 ,  H04N2201/0039 ,  H04N2201/0094

摘要： An information processing apparatus connected to a printing apparatus via a network encrypts print data if identification information is input, and does not encrypt print data if identification information is not input. If identification information is input and the print data has been encrypted, the information processing apparatus sends a print job including the encrypted print data to the printing apparatus via the network; otherwise, the information processing apparatus sends unencrypted print data to the printing apparatus via the network.

摘要翻译： 经由网络连接到打印装置的信息处理装置如果输入了识别信息则对打印数据进行加密，如果未输入识别信息，则不对打印数据进行加密。 如果输入了识别信息并且打印数据已被加密，则信息处理设备经由网络将包含加密的打印数据的打印作业发送到打印设备; 否则，信息处理装置经由网络向打印装置发送未加密的打印数据。

公开(公告)号：US20100047702A1

公开(公告)日：2010-02-25

申请号：US12610907

申请日：2009-11-02

申请人： Kunie OGATA ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

发明人： Kunie OGATA ,  Koki Nishimuko ,  Hiroshi Tomita ,  Yoshio Kimura ,  Ryouichi Uemura ,  Michio Tanaka

IPC分类号： G03F7/20 ,  G03B27/32

CPC分类号： H01L21/67253 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/6715

摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

摘要翻译： 使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个 选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。 基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。 这导致操作者的工作量减少，并且可以执行适当的修改。

公开(公告)号：US07281869B2

公开(公告)日：2007-10-16

申请号：US11335635

申请日：2006-01-20

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03B5/00

CPC分类号： H01L21/67184 ,  H01L21/00 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.

摘要翻译： 涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂覆和显影系统可以应对形成防反射膜的情况以及没有形成任何抗反射膜的情况。 成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块中层叠。 在形成防反射膜并且不形成抗反射膜的情况下，TCT层，COT层和BCT层被选择性地使用。 涂层和显影系统由简单的携带程序控制。

公开(公告)号：US20060164613A1

公开(公告)日：2006-07-27

申请号：US11117566

申请日：2005-04-29

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03B27/32

CPC分类号： H01L21/67184 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.