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    Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium
    1.
    发明申请
    Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium 失效
    浸渍曝光方法和浸渍曝光装置，其通过浸渍介质将形成在掩模上的图案的图像转印到基底上

    公开(公告)号：US20070008507A1

    公开(公告)日：2007-01-11

    申请号：US11474298

    申请日：2006-06-26

    申请人： Takuya Kono ,  Kazuya Fukuhara ,  Daisuke Kawamura

    发明人： Takuya Kono ,  Kazuya Fukuhara ,  Daisuke Kawamura

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70891 ,  G03F7/70341

    摘要： This invention discloses an immersion exposure method which executes immersion exposure for an exposure target film by transferring an image of a pattern formed on a mask onto the exposure target film through an immersion medium. A first vapor pressure as the target value in an immersion exposure atmosphere which surrounds the immersion medium is set. A second vapor pressure in the immersion exposure atmosphere is measured. The first vapor pressure is compared with the second vapor pressure. Whether to adjust the vapor pressure in the immersion exposure atmosphere is selected in accordance with the comparison result.

    摘要翻译： 本发明公开了一种浸渍曝光方法，其通过浸渍介质将曝光目标膜上形成的图案的图像转印到曝光目标膜上，对曝光目标膜进行浸没曝光。 设置围绕浸渍介质的浸没曝光气氛中作为目标值的第一蒸气压。 测量浸渍曝光气氛中的第二蒸气压。 将第一蒸气压与第二蒸气压进行比较。 根据比较结果选择是否调整浸入曝光气氛中的蒸气压。

    Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium
    2.
    发明授权
    Immersion exposure method and immersion exposure apparatus which transfer image of pattern formed on mask onto substrate through immersion medium 失效
    浸渍曝光方法和浸渍曝光装置，其通过浸渍介质将形成在掩模上的图案的图像转印到基底上

    公开(公告)号：US07652747B2

    公开(公告)日：2010-01-26

    申请号：US11474298

    申请日：2006-06-26

    申请人： Takuya Kono ,  Kazuya Fukuhara ,  Daisuke Kawamura

    发明人： Takuya Kono ,  Kazuya Fukuhara ,  Daisuke Kawamura

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70891 ,  G03F7/70341

    摘要： This invention discloses an immersion exposure method which executes immersion exposure for an exposure target film by transferring an image of a pattern formed on a mask onto the exposure target film through an immersion medium. A first vapor pressure as the target value in an immersion exposure atmosphere which surrounds the immersion medium is set. A second vapor pressure in the immersion exposure atmosphere is measured. The first vapor pressure is compared with the second vapor pressure. Whether to adjust the vapor pressure in the immersion exposure atmosphere is selected in accordance with the comparison result.

    摘要翻译： 本发明公开了一种浸渍曝光方法，其通过浸渍介质将曝光目标膜上形成的图案的图像转印到曝光目标膜上，对曝光目标膜进行浸没曝光。 设置围绕浸渍介质的浸没曝光气氛中作为目标值的第一蒸气压。 测量浸渍曝光气氛中的第二蒸气压。 将第一蒸气压与第二蒸气压进行比较。 根据比较结果选择是否调整浸入曝光气氛中的蒸气压。

    PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND COATING APPARATUS
    6.
    发明申请
    PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND COATING APPARATUS 有权
    图案形成方法，半导体器件制造方法和涂层装置

    公开(公告)号：US20130217217A1

    公开(公告)日：2013-08-22

    申请号：US13603902

    申请日：2012-09-05

    申请人： Katsutoshi Kobayashi ,  Daisuke Kawamura

    发明人： Katsutoshi Kobayashi ,  Daisuke Kawamura

    IPC分类号： H01L21/311 ,  H01L21/283 ,  H01L21/31 ,  B05C11/08

    CPC分类号： H01L21/32139 ,  H01L21/28123 ,  H01L21/31144 ,  H01L21/6715 ,  H01L21/76802

    摘要： According to one embodiment, a pattern forming method is disclosed. A resist pattern having a top surface is formed pattern on a substrate. A coating film having a first thickness distribution is formed on the substrate. The coating film covers the resist pattern. The coating film is thinned to expose the top surface of the resist pattern. The first thickness distribution is changed into a second thickness distribution which is more uniform than the first thickness distribution. The resist pattern is removed without removing the coating film. A pattern is formed in the substrate by processing the substrate by using the coating film as a mask.

    摘要翻译： 根据一个实施例，公开了一种图案形成方法。 在基板上形成具有顶面的抗蚀剂图案。 在基板上形成具有第一厚度分布的涂膜。 涂膜覆盖抗蚀剂图案。 使涂膜变薄以暴露抗蚀剂图案的顶表面。 第一厚度分布变为比第一厚度分布更均匀的第二厚度分布。 去除抗蚀剂图案而不去除涂膜。 通过使用涂膜作为掩模来处理基板，在基板中形成图案。

    Information processing apparatus, information processing method, program, information providing apparatus, information providing method, and information processing system
    8.
    发明授权
    Information processing apparatus, information processing method, program, information providing apparatus, information providing method, and information processing system 失效
    信息处理装置，信息处理方法，程序，信息提供装置，信息提供方法以及信息处理系统

    公开(公告)号：US08347332B2

    公开(公告)日：2013-01-01

    申请号：US12729757

    申请日：2010-03-23

    申请人： Kazuhiro Fukuda ,  Daisuke Kawamura

    发明人： Kazuhiro Fukuda ,  Daisuke Kawamura

    IPC分类号： H04H60/33 ,  H04N7/10 ,  H04N7/025 ,  H04N5/445 ,  G06F3/00 ,  G06F13/00

    CPC分类号： H04N7/173 ,  G06F3/0482 ,  H04N5/44543 ,  H04N7/163 ,  H04N21/4312 ,  H04N21/4314 ,  H04N21/44222 ,  H04N21/4532 ,  H04N21/4826 ,  H04N21/6582

    摘要： There is provided a TV set including a content-related information control section which transmits the one or plurality of pieces of viewed content identification information to an ECG server and receives, from the ECG server, content-related information related to content having a relationship with respect to viewed content identified by each of the transmitted one or plurality of pieces of viewed content identification information, and a display control section which causes the display section to display an image based on image data included in each of one or a plurality of pieces of content-related information corresponding to content tuning information the input of which is accepted by an input section from among respective pieces of content-related information that the content-related information control section have received.

    摘要翻译： 提供了一种电视机，包括内容相关信息控制部分，其将一个或多个观看内容识别信息发送到ECG服务器，并从ECG服务器接收与内容有关的内容相关信息 对于被发送的一个或多个观看内容识别信息中的每个所识别的内容的观看内容，以及显示控制部分，其使得显示部分基于包括在一个或多个 内容相关信息与内容相关信息控制部分已经接收到的各个内容相关信息中的输入部分接受的内容调谐信息相对应。

    Semiconductor device manufacturing method to form resist pattern
    9.
    发明授权
    Semiconductor device manufacturing method to form resist pattern 失效
    形成抗蚀剂图案的半导体器件制造方法

    公开(公告)号：US07968272B2

    公开(公告)日：2011-06-28

    申请号：US11600198

    申请日：2006-11-16

    申请人： Daisuke Kawamura ,  Eishi Shiobara ,  Tomoyuki Takeishi ,  Kei Hayasaki ,  Yasunobu Onishi ,  Shinichi Ito ,  Tatsuhiko Higashiki

    发明人： Daisuke Kawamura ,  Eishi Shiobara ,  Tomoyuki Takeishi ,  Kei Hayasaki ,  Yasunobu Onishi ,  Shinichi Ito ,  Tatsuhiko Higashiki

    IPC分类号： G03C5/04

    CPC分类号： G03F7/70925 ,  G03F7/70341

    摘要： This invention discloses a method to form a resist pattern on a to-be-processed substrate by immersion exposure. A resist film is formed on the central portion of the upper surface of the to-be-processed substrate, on a bevel portion of the upper surface, which is obtained by chamfering the peripheral portion of the to-be-processed substrate, and on the end portion of the to-be-processed substrate. Pattern exposure for forming the latent image of a desired pattern on the resist film is executed while a liquid whose refractive index is higher than that of air exists between the resist film and a constituent element of a projection optical system of an exposure apparatus, which is nearest to the to-be-processed substrate. The resist film formed on the end portion of the to-be-processed substrate is removed by supplying a rinse solution to the end portion of the to-be-processed substrate after executing pattern exposure.

    摘要翻译： 本发明公开了一种通过浸渍曝光在待处理衬底上形成抗蚀剂图案的方法。 在被处理基板的上表面的中央部，在上表面的斜面部分上形成抗蚀剂膜，该斜面部分是通过倒角被处理基板的周边部分而得到的， 待处理衬底的端部。 在抗蚀剂膜和曝光装置的投影光学系统的构成元素之间存在折射率高于空气的液体的情况下，在抗蚀剂膜上形成期望图案的潜像的图案曝光，其为 最接近被处理衬底。 在执行图案曝光之后，通过向被处理基板的端部供给冲洗液，除去形成在被处理基板的端部的抗蚀剂膜。

    Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device
    10.
    发明授权
    Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device 失效
    产生书写图案的方法，形成抗蚀剂图案的方法，控制曝光工具的方法以及制造半导体器件的方法

    公开(公告)号：US07749665B2

    公开(公告)日：2010-07-06

    申请号：US11108751

    申请日：2005-04-19

    申请人： Daisuke Kawamura ,  Shinichi Ito

    发明人： Daisuke Kawamura ,  Shinichi Ito

    IPC分类号： G03F9/00

    CPC分类号： G03F7/70616 ,  G03F7/70341 ,  G03F7/70433 ,  G03F7/70441

    摘要： A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.

    摘要翻译： 公开了一种生成写入图案的方法，其从图案数据生成写入图案数据以将掩模图案写入用于包括投影光学系统的曝光工具中的光掩模中，以将掩模图案转印到形成在 基板，在局部区域形成液膜的浸渍机构，以及相对于投影光学系统和浸渍机构移动基板的移动机构，所述方法包括获得抗蚀剂膜之间的接触历史值的典型分布 和单位曝光区域中的液膜，根据接触历史值的典型分布将与图案数据对应的图案分割成多个区域，并对包含在每个分割区域内的图案进行校正 根据联系历史值的规则。