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1.发明申请公开(公告)号：US20150179486A1
公开(公告)日：2015-06-25
申请号：US14642475
申请日：2015-03-09
IPC分类号： H01L21/67
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。
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2.发明申请公开(公告)号：US20120097093A1
公开(公告)日：2012-04-26
申请号：US12912272
申请日：2010-10-26
CPC分类号： H01L21/67201 , Y10T137/0379
摘要： A lock chamber for a substrate processing system is provided which includes at least a first conduit adapted to provide an inner portion of the lock chamber in fluid communication with atmospheric pressure or overpressure. Additionally, the lock chamber includes at least a first control valve for controlling a flow rate of the fluid communication of the inner portion of the chamber with the atmospheric pressure or the overpressure, wherein the control valve is adapted to continuously control the flow rate. Furthermore, an according method, a computer program and a computer readable medium adapted for performing the method is provided.
摘要翻译： 提供了一种用于基板处理系统的锁定室，其包括至少第一导管，其适于提供与大气压力或超压力流体连通的锁定室的内部。 此外，锁定室至少包括第一控制阀，用于控制室内部与大气压或超压力的流体连通的流量，其中控制阀适于连续地控制流量。 此外，提供了一种适用于执行该方法的依据方法，计算机程序和计算机可读介质。
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公开(公告)号：US20110120862A1
公开(公告)日：2011-05-26
申请号：US12627159
申请日：2009-11-30
IPC分类号： C23C14/34
CPC分类号： C23C14/35 , H01J37/32541 , H01J37/3405
摘要： The present disclosure relates to an anode rod for a sputtering system comprising a target, a lateral surface area of the anode rod is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume. Further, the present disclosure relates to a sputtering system comprising at least one anode rod, wherein the anode rod having a lateral surface area that is at least 2 times greater than the lateral surface area of the a circular cylinder having the same volume, and at least one sputtering cathode assembly comprising a backing device selected of the group consisting of a backing plate for a planar target, and a target backing tube for a rotatable cylindrical target.
摘要翻译： 本公开涉及一种用于溅射系统的阳极棒，其包括靶，阳极杆的横向表面积比具有相同体积的圆柱体的侧表面积至少大2倍。 此外，本公开涉及一种包括至少一个阳极棒的溅射系统，其中阳极杆的侧表面积比具有相同体积的圆柱体的侧表面积至少大2倍，并且在 至少一个溅射阴极组件包括选自由用于平面靶的背板和用于可旋转圆柱形靶的目标背衬管组的背衬装置。
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公开(公告)号：US20150303090A1
公开(公告)日：2015-10-22
申请号：US14426110
申请日：2012-09-10
申请人： Ralph LINDENBERG
发明人： Ralph LINDENBERG
IPC分类号： H01L21/677 , B65G47/52 , B65G13/00 , B65G49/06
CPC分类号： H01L21/67748 , B65G13/00 , B65G47/52 , B65G49/063 , B65G49/067 , B65G2201/02 , C23C14/50 , C23C14/568 , H01L21/67173 , H01L21/677 , H01L21/67751 , H01L21/6776
摘要： A transfer device is provided for substrate transfer along a transport direction and for change between a first transport path and a second transport path extending along the transport direction. The first transport path is displaced with respect to the second transport path in a switch direction perpendicular to the transport direction. The transfer device includes a first substrate support assembly defining a first track to support a substrate or substrate carrier in a chamber. The transfer device further includes a second substrate support assembly defining a second track to support a substrate or substrate carrier in the chamber. The first substrate support assembly and the second substrate support assembly are moveable relative to each other at least in the switch direction.
摘要翻译： 提供转移装置用于沿输送方向的基板转移，并且用于沿着输送方向延伸的第一输送路径和第二输送路径之间的变化。 第一输送路径在垂直于输送方向的开关方向上相对于第二输送路径移位。 转移装置包括限定用于支撑腔室中的基底或基底载体的第一轨道的第一基底支撑组件。 传送装置还包括限定第二轨道以支撑腔室中的衬底或衬底载体的第二衬底支撑组件。 第一基板支撑组件和第二基板支撑组件至少在开关方向上可相对于彼此移动。
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5.发明申请REPLACEABLE SUBSTRATE MASKING ON CARRIER AND METHOD FOR PROCESSING A SUBSTRATE 失效载体上的可替换的基板掩蔽和用于处理基板的方法公开(公告)号：US20120070999A1
公开(公告)日：2012-03-22
申请号：US12890194
申请日：2010-09-24
申请人： Ralph LINDENBERG
发明人： Ralph LINDENBERG
CPC分类号： H01J37/20 , C23C14/042 , H01J2237/022 , H01L21/67346
摘要： A holding device adapted for holding a mask and a substrate during processing is described. The holding device includes a substrate carrier adapted for carrying the substrate; and a mask for masking the substrate, wherein the mask is releasably connected to the substrate carrier; wherein the substrate carrier or the mask has at least one recess adapted for receiving a cover for covering the substrate carrier during deposition.
摘要翻译： 描述了在处理期间适于保持掩模和基板的保持装置。 保持装置包括适于承载基板的基板载体; 以及用于掩蔽所述衬底的掩模，其中所述掩模可释放地连接到所述衬底载体; 其中所述衬底载体或所述掩模具有适于在沉积期间接收用于覆盖所述衬底载体的盖的至少一个凹部。
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公开(公告)号：US20150303041A1
公开(公告)日：2015-10-22
申请号：US14440943
申请日：2012-11-15
申请人： Ralph LINDENBERG , Erkan KOPARAL
发明人： Ralph LINDENBERG , Erkan KOPARAL
IPC分类号： H01J37/34
CPC分类号： H01J37/3441 , C23C14/042 , C23C14/50 , C23C14/564 , C23C14/568 , C23C16/042 , C23C16/4401 , H01J2237/3323 , H01L21/67173 , H01L21/67751 , H01L21/6776
摘要： A method for extracting a shielding element from a processing chamber of a substrate processing system or inserting the shielding element into the processing chamber is provided. The substrate processing system includes the processing chamber, a first shielding element for excluding application of material onto parts of a substrate, and a substrate transportation system for transporting substrates or substrate carriers into and out of the processing chamber. The method includes transporting the first shielding element by the substrate transportation system.
摘要翻译： 提供了一种从基板处理系统的处理室中提取屏蔽元件或将屏蔽元件插入处理室的方法。 基板处理系统包括处理室，用于排除将材料施加到基板的部件上的第一屏蔽元件和用于将基板或基板载体输入和移出处理室的基板输送系统。 该方法包括通过基板输送系统输送第一屏蔽元件。
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