公开(公告)号：US20150206712A1

公开(公告)日：2015-07-23

申请号：US14675873

申请日：2015-04-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naoki MATSUMOTO ,  Koji KOYAMA ,  Jun YOSHIKAWA

IPC: H01J37/32 ,  H01Q13/10

CPC classification number: H01J37/3222 ,  C23C16/511 ,  H01J37/32238 ,  H01J37/32715 ,  H01J2237/334 ,  H01L21/32137 ,  H01Q13/10 ,  H01Q21/064 ,  H01Q21/20 ,  H05H1/46 ,  H05H2001/4667

Abstract: An antenna includes a dielectric window and a slot plate provided at one surface of the dielectric window. The slot plate includes a plurality of slot pairs each being formed of two slots. The slot pairs are concentrically disposed about a centroid position of the slot plate and provided at positions where straight lines extending from the centroid position of the slot plate and passing through each slot pair are not overlapped with each other.

Abstract translation: 天线包括介电窗口和设置在电介质窗口的一个表面处的槽板。 槽板包括多个槽对，每个槽对由两个槽形成。 槽对围绕槽板的中心位置同心地设置，并且设置在从槽板的中心位置延伸并且穿过每个槽对的直线彼此不重叠的位置处。

公开(公告)号：US20150155139A1

公开(公告)日：2015-06-04

申请号：US14556596

申请日：2014-12-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Jun YOSHIKAWA ,  Naoki MATSUMOTO ,  Masayuki SHINTAKU ,  Koji KOYAMA ,  Naoki MIHARA ,  Yugo TOMITA

IPC: H01J37/32 ,  H01P1/08

CPC classification number: H01J37/3222 ,  H01J37/32192 ,  H01J37/32238 ,  H01P1/08

Abstract: A slot plate is provided at one surface of a dielectric window. The other surface of the dielectric window includes a flat surface surrounded by an annular first recess, and a plurality of second recesses formed at a bottom surface of the first recess. An antenna including the dielectric window and the slot plate provided at one surface of the dielectric window can be applied to the plasma processing apparatus.

Abstract translation: 在电介质窗口的一个表面设置槽板。 电介质窗口的另一表面包括由环形第一凹部包围的平坦表面和形成在第一凹部的底表面处的多个第二凹部。 包括介电窗口和设置在电介质窗口的一个表面处的槽板的天线可以被施加到等离子体处理装置。

公开(公告)号：US20140225504A1

公开(公告)日：2014-08-14

申请号：US14177421

申请日：2014-02-11

Applicant: Tokyo Electron Limited

Inventor： Kazushi Kaneko ,  Naoki Matsumoto ,  Koji KOYAMA ,  Kazunori Funazaki ,  Hideo Kato ,  Kiyotaka Ishibashi

IPC: H01J37/32 ,  H03L5/02 ,  H05H1/46

CPC classification number: H01J37/32935 ,  H01J37/32192 ,  H03L5/02 ,  H05H1/46 ,  H05H2001/463 ,  H05H2001/4682

Abstract: A plasma processing apparatus includes a plasma generating device configured to generate a plasma within a processing vessel by using a high frequency wave generated by a microwave generator 41 including a magnetron 42 configured to generate the high frequency wave; detectors 54a and 54b configured to measure a power of a traveling wave that propagates to a load side and a power of a reflected wave reflected from the load side, respectively; and a voltage control circuit 53a configured to control a voltage supplied to the magnetron 42 by a power supply 43. Further, the voltage control circuit 53a includes a load control device configured to supply, to the magnetron 42, a voltage corresponding to a power calculated by adding a power calculated based on the power of the reflected wave measured by the detector 54b to the power of the traveling wave measured by the detector 54a.

Abstract translation: 等离子体处理装置包括：等离子体产生装置，其被配置为通过使用由包括被配置为产生高频波的磁控管42的微波发生器41产生的高频波在处理容器内产生等离子体; 被配置为分别测量传播到负载侧的行波的功率和从负载侧反射的反射波的功率的检测器54a和54b; 以及电压控制电路53a，其被配置为通过电源43控制提供给磁控管42的电压。此外，电压控制电路53a包括负载控制装置，其被配置为向磁控管42提供与计算出的功率相对应的电压 通过将由检测器54b测量的反射波的功率计算出的功率与由检测器54a测量的行波的功率相加。

公开(公告)号：US20200058468A1

公开(公告)日：2020-02-20

申请号：US16478770

申请日：2018-01-04

Applicant: Tokyo Electron Limited

Inventor： Kazuki TAKAHASHI ,  Yuki KAWADA ,  Naoki MATSUMOTO ,  Takahiro SENDA ,  Koji KOYAMA ,  Shohei FUKANO ,  Jun YOSHIKAWA ,  Hiroyuki KONDO ,  Takashi MINAKAWA

IPC: H01J37/32

Abstract: An antenna according to an aspect includes: a dielectric window having a first surface and a second surface, the second surface having an annular recessed surface and a flat surface surrounded by the recessed surface; a slot plate; a dielectric plate; a heat transfer member made of metal and having an upper surface and a lower surface opposing each other; a cooling jacket; and a heater, in which the upper surface includes a plurality of first regions and a second region, the cooling jacket is mounted on the plurality of first regions, the second region is recessed further toward the lower surface side than the plurality of first regions, the heater is mounted on the second region, and each of the plurality of first regions is provided at a position at least partially overlapping with the flat surface when viewed in a direction parallel to a central axis.

公开(公告)号：US20180374678A1

公开(公告)日：2018-12-27

申请号：US16014628

申请日：2018-06-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yuki KAWADA ,  Koji KOYAMA

IPC: H01J37/32 ,  H01Q13/10 ,  H01Q21/06 ,  H05H1/46 ,  H01L21/3213 ,  C23C16/511

CPC classification number: H01J37/3222 ,  C23C16/511 ,  H01J37/32238 ,  H01L21/32137 ,  H01Q1/366 ,  H01Q1/42 ,  H01Q13/10 ,  H01Q15/08 ,  H01Q21/0056 ,  H01Q21/064 ,  H05H1/46

Abstract: In an antenna including a dielectric window and a slot plate provided on one surface of the dielectric window, in a case where a reference position g is a center position in a width direction of each slot S and a center position in a length direction in the slot plate, the reference position g of each slot is located on a virtual circle centered on a center of gravity G0, and line segments connecting the reference positions g of the slots S and virtual point G1 to which the slots belong are located radially from a virtual point G1, angles (β1 to β4) between adjacent line segments are equal to each other, and angles (θ1 to θ4) formed by the length directions of the slots S at the reference positions g and the line segments to which the slots belong are equal to each other.

公开(公告)号：US20200075292A1

公开(公告)日：2020-03-05

申请号：US16552372

申请日：2019-08-27

Applicant: Tokyo Electron Limited

Inventor： Ayako ITO ,  Koji KOYAMA ,  Yuki KAWADA ,  Takahiro SENDA ,  Naoki MATSUMOTO

IPC: H01J37/32 ,  H01P1/08 ,  H05H1/24

Abstract: In one exemplary embodiment, a second waveguide is connected to an upper wall of a first waveguide and communicates with the first waveguide, a dielectric window is in contact with a lower wall of the first waveguide, a first inner conductor penetrates an upper wall, is electrically connected with the upper wall, and extends along the direction of a tube axis from an inside of the first waveguide to an inside of a third waveguide, the third waveguide is connected to the lower wall on the dielectric window side and communicates with the first waveguide, a first opening end of the third waveguide is connected to the dielectric window, and a drive device is connected to the first inner conductor, and is configured to drive the first inner conductor in the direction of the tube axis.

公开(公告)号：US20190279845A1

公开(公告)日：2019-09-12

申请号：US16298307

申请日：2019-03-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Naoki MATSUMOTO ,  Yuki KAWADA ,  Ayako ITO ,  Koji KOYAMA ,  Takahiro SENDA ,  Takashi SUZUKI ,  Yoshikazu AZUMAYA

IPC: H01J37/32

Abstract: An antenna device according to an exemplary embodiment radiates electromagnetic waves. In the antenna device, a dielectric window is in contact with a lower wall of a first waveguide, the first waveguide is provided between the dielectric window and a second waveguide and extends in a direction crossing a tube axis of the second waveguide, a dispersion part in the first waveguide disperses the electromagnetic wave in the first waveguide, a coaxial conversion part causes propagation of the electromagnetic waves dispersed by the dispersion part to direct to a side of the dielectric window, and a front surface of the dielectric window does not have irregularities.

公开(公告)号：US20190333736A1

公开(公告)日：2019-10-31

申请号：US16394190

申请日：2019-04-25

Applicant: Tokyo Electron Limited

Inventor： Yuki KAWADA ,  Naoki MATSUMOTO ,  Koji KOYAMA ,  Ayako ITO ,  Takahiro SENDA

IPC: H01J37/32

Abstract: An antenna device according to an exemplary embodiment radiates electromagnetic waves. In the antenna device, a dielectric window is in contact with a lower wall of a first waveguide, the first waveguide is provided between the dielectric window and a second waveguide and extends in a direction crossing a tube axis of the second waveguide, a dispersion part in the first waveguide disperses the electromagnetic waves in the first waveguide, two inner conductors disposed at different distances from the tube axis and connected to the dielectric window include coaxial conversion parts which cause propagation of the electromagnetic waves dispersed by the dispersion part to direct to the dielectric window side, a body length of the inner conductor most distant from the tube axis, out of body lengths of the two inner conductors, is longer, and a front surface of the dielectric window does not have irregularities.

公开(公告)号：US20180151332A1

公开(公告)日：2018-05-31

申请号：US15821588

申请日：2017-11-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Takashi HASEGAWA ,  Koji KOYAMA ,  Naoki MATSUMOTO

IPC: H01J37/32

CPC classification number: H01J37/32229 ,  H01J37/32 ,  H01J37/3222 ,  H01J37/32275 ,  H01J37/32311 ,  H01J37/32449 ,  H01J37/32715 ,  H01J37/32834 ,  H01J2237/006 ,  H01J2237/1825 ,  H01J2237/186

Abstract: A plasma processing apparatus includes a microwave output unit, a wave guide tube, a tuner, a demodulation unit, and a calculation unit. The microwave output unit outputs a microwave having power corresponding to setting power while frequency-modulating the microwave in a setting frequency range. The wave guide tube guides the microwave to an antenna of a chamber main body. The tuner is provided in the wave guide tube and adjusts a position of a movable plate. The demodulation unit is provided in the wave guide tube, and acquires travelling wave power and reflected wave power for each frequency. The calculation unit calculates a frequency at which a reflection coefficient, which is calculated on the basis of the travelling wave power and the reflected wave power, for each frequency becomes a minimum point as an absorption frequency.

公开(公告)号：US20160118224A1

公开(公告)日：2016-04-28

申请号：US14868554

申请日：2015-09-29

Applicant: Tokyo Electron Limited

Inventor： Masayuki KOHNO ,  Ryou SON ,  Naoki MATSUMOTO ,  Jun YOSHIKAWA ,  Michitaka AITA ,  Ippei SHIMIZU ,  Yusuke YOSHIDA ,  Koji KOYAMA ,  Masami SUDAYAMA ,  Yukiyoshi ARAMAKI

IPC: H01J37/32

CPC classification number: H01J37/32192 ,  H01J37/32266 ,  H01J37/32944

Abstract: A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.

Abstract translation: 提供了一种等离子体处理装置，其被配置为将气体供应到室中，使用电磁波的功率从气体产生等离子体，并且在由安装台保持的基板上执行预定的等离子体处理。 等离子体处理装置包括电介质窗，从电磁波发生器输出的电磁波通过该介质传播并传递到室内;支撑构件，其支撑介电窗口;分隔构件，其将支撑构件的空间 从等离子体产生空间排列并且包括抵靠电介质窗口的突起，以及布置在分隔构件和电介质窗口之间的导电构件，并且被保护以通过突起而暴露于等离子体产生空间。