公开(公告)号：US4874089A

公开(公告)日：1989-10-17

申请号：US266846

申请日：1988-11-03

申请人： Tsukasa Matsuda ,  Kazuo Ui ,  Hiroshi Maeda

发明人： Tsukasa Matsuda ,  Kazuo Ui ,  Hiroshi Maeda

IPC分类号： G03C3/00 ,  G03B27/58

CPC分类号： G03B27/588 ,  G03B2217/265

摘要： In a light-tight cassette for a roll of light-sensitive strip material comprising a body having a slot for extending the light-sensitive strip material and end panels closing both end openings of the body and supporting said roll, the improvement which comprises at least one of the end panels having a rotary core to which the core of the roll is fixed, a bearing means which rotatably supports the rotary core and a fixing means to fix the rotary core to the end panel releasably.In the light-tight cassette of the invention, since the core of the light-sensitive strip material is fixed to an end panel through the rotary core by the fixing means, loosening of the roll of the light-sensitive strip material does not occur by the shaking during transportation or the like. Therefore, the problems in quality such as the degradation of surface quality do not occur. Since the fixation is readily released by pulling the light-sensitive strip material, it may easily be extended at the time of use.

摘要翻译： 在用于一卷感光带材的不透光盒中，包括具有用于延伸感光条材料的槽的主体和封闭主体的两个端部开口并支撑所述辊的端板，该改进至少包括 所述端板中的一个具有固定所述辊的芯的旋转芯，可旋转地支撑所述旋转芯的轴承装置和用于将所述旋转芯可释放地固定到所述端面板的固定装置。 在本发明的不透光盒中，由于感光条材料的芯通过固定装置通过旋转芯固定到端板上，因此光敏材料卷的松动不会由 运输过程中的晃动等。 因此，不会发生质量问题，例如表面质量下降。 由于通过拉动感光带状材料容易地释放固定，所以在使用时可以容易地延长。

公开(公告)号：US08486845B2

公开(公告)日：2013-07-16

申请号：US11084024

申请日：2005-03-21

申请人： Tsukasa Matsuda

发明人： Tsukasa Matsuda

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： C23C16/45544 ,  C23C16/4554 ,  C23C16/515 ,  H01J37/32009 ,  H01J37/32532 ,  H01L21/28562

摘要： A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process, introducing a first process material within the process chamber and introducing a second process material within the process chamber. Also included is coupling electromagnetic power to the process chamber during introduction of the second process material in order to generate a plasma that facilitates a reduction reaction between the first and second process materials at a surface of the substrate. A reactive gas is introduced within the process chamber, the reactive gas chemically reacting with contaminants in the process chamber to release the contaminants from at least one of a process chamber component or the substrate.

摘要翻译： 使用等离子体增强原子层沉积（PEALD）工艺在衬底上沉积膜的方法包括将衬底布置在处理室中，该处理室被配置为便于PEALD工艺，在处理室内引入第一工艺材料并引入第二工艺材料 在处理室内。 还包括在引入第二工艺材料期间将电磁功率耦合到处理室，以便产生促进第一和第二工艺材料在衬底表面处的还原反应的等离子体。 反应性气体被引入处理室内，反应气体与处理室中的污染物质化学反应以从处理室组件或衬底中的至少一个释放污染物。

公开(公告)号：US08100147B2

公开(公告)日：2012-01-24

申请号：US11782090

申请日：2007-07-24

申请人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

发明人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

IPC分类号： B01F5/18

CPC分类号： G01N1/24 ,  C23C16/4405 ,  C23C16/4412 ,  G01N15/06 ,  G01N2015/0693 ,  H01L21/67069 ,  H01L21/67115 ,  H01L21/67253 ,  H01L21/68742 ,  Y10T137/8593 ,  Y10T137/87652 ,  Y10T137/8766

摘要： The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe 90 which connects an exhaust opening 86 of the processing chamber 48 with the vacuum pump 98, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.

摘要翻译： 本发明提供一种粒子测量系统，其设置在处理系统40中，该处理系统40产生通过真空泵98排出处理室48中的空气或气体而获得的气氛，并将与半导体制造有关的工艺应用于晶片W 附着在排气管90上，排气管90将处理室48的排气口86与真空泵98连接，并测量废气中的颗粒数量及其测量方法，该系统和方法提供处理 系统和清洁方法，其通过基于废气中的颗粒数量确定终点并执行不需要的膜的清洁来终止蚀刻工艺。

公开(公告)号：US07834739B2

公开(公告)日：2010-11-16

申请号：US12076337

申请日：2008-03-17

申请人： Shoji Yamaguchi ,  Mario Fuse ,  Yasunori Koda ,  Kunihiro Takahashi ,  Hiroyoshi Inoue ,  Tsukasa Matsuda

发明人： Shoji Yamaguchi ,  Mario Fuse ,  Yasunori Koda ,  Kunihiro Takahashi ,  Hiroyoshi Inoue ,  Tsukasa Matsuda

IPC分类号： B60R25/00 ,  G06F7/04 ,  G06F7/00

CPC分类号： G01R33/02

摘要： A baggage management gate includes a first reading device and a second reading device, a detecting device, a determining unit, a first opening and closing device and a second opening and closing device. The baggage management gate manages baggage that is restricted to be carried in or out from a predetermined region. And in order away from the region in which the baggage is managed, the first reading device, the second opening and closing device, the detecting device for both the first person and the second person, the first opening and closing device, and the second reading device are arranged in an entrance direction from the passage to the management region in which the baggage is managed.

摘要翻译： 行李管理门包括第一读取装置和第二读取装置，检测装置，确定装置，第一打开和关闭装置以及第二打开和关闭装置。 行李管理门管理被限制在预定区域内进出的行李。 并且为了远离管理行李的区域，第一读取装置，第二打开和关闭装置，用于第一人和第二人的检测装置，第一打开和关闭装置以及第二读取 设备沿着通道行进管理区域的入口方向排列。

公开(公告)号：US07667840B2

公开(公告)日：2010-02-23

申请号：US11965357

申请日：2007-12-27

申请人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

发明人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

IPC分类号： G01N21/00

CPC分类号： G01N1/24 ,  C23C16/4405 ,  C23C16/4412 ,  G01N15/06 ,  G01N2015/0693 ,  H01L21/67069 ,  H01L21/67115 ,  H01L21/67253 ,  H01L21/68742 ,  Y10T137/8593 ,  Y10T137/87652 ,  Y10T137/8766

摘要： The present invention provides a particle measuring system which is provided in a processing system that generates an atmosphere obtained by exhausting air or a gas in a processing chamber by a vacuum pump and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe which connects an exhaust opening of the processing chamber with the vacuum pump, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.

摘要翻译： 本发明提供一种粒子测量系统，其设置在处理系统中，该处理系统产生通过真空泵排出处理室中的空气或气体而获得的气氛，并将关于半导体制造的处理应用于大气中的晶片W，附着 涉及将处理室的排气口与真空泵连接并测量排气中的颗粒数的排气管及其测量方法，提供处理系统的系统和方法以及终止的处理室的清洁方法 通过基于排气中的颗粒数确定终点并执行不需要的膜的清洁来进行蚀刻处理。

公开(公告)号：US07351285B2

公开(公告)日：2008-04-01

申请号：US11092266

申请日：2005-03-29

申请人： Tsukasa Matsuda

发明人： Tsukasa Matsuda

IPC分类号： C30B23/00 ,  C23C16/00 ,  B05D3/00

CPC分类号： C23C16/18 ,  C23C16/16 ,  H01L21/28556 ,  H01L21/76868 ,  H01L21/76873

摘要： A method and system for forming a variable thickness seed layer on a substrate for a subsequent metal electrochemical plating process, where the seed layer thickness profile improves uniformity of the electroplated metal layer compared to when using a constant thickness seed layer. The method includes providing a substrate in a process chamber containing a showerhead, with the center of the substrate generally aligned with an inner gas delivery zone of the showerhead and the edge of the substrate generally aligned with an outer gas delivery zone of the showerhead. The method further includes depositing a seed layer on the substrate by exposing the substrate to a first gas containing a metal-containing precursor flowed through the inner gas delivery zone, and exposing the substrate to a second gas flowed through the outer gas delivery zone, whereby the seed layer is deposited with a thickness at the edge of the substrate that is less than the thickness at the center of the substrate.

摘要翻译： 一种用于在随后的金属电化学电镀工艺的衬底上形成可变厚度籽晶层的方法和系统，其中与使用恒定厚度的种子层相比，种子层厚度分布改善了电镀金属层的均匀性。 该方法包括在包含喷头的处理室中提供衬底，其中衬底的中心大致与喷头的内部气体输送区域对准，并且衬底的边缘与喷头的外部气体输送区域大致对准。 该方法还包括通过将衬底暴露于含有流过内部气体输送区的含金属前体的第一气体，并将衬底暴露于流过外部气体输送区的第二气体，从而将衬底层沉积在衬底上，由此 籽晶层在衬底的边缘处被沉积成小于衬底中心的厚度。

公开(公告)号：US07344816B2

公开(公告)日：2008-03-18

申请号：US10940926

申请日：2004-09-15

申请人： Yasuo Matsumura ,  Tsukasa Matsuda ,  Kazuhiko Arai ,  Tetsuo Yamada

发明人： Yasuo Matsumura ,  Tsukasa Matsuda ,  Kazuhiko Arai ,  Tetsuo Yamada

IPC分类号： G03G15/20

CPC分类号： G03G15/2064 ,  G03G2215/208

摘要： A method for forming an image contains steps of: transferring a toner having a volume average particle diameter of 5 μm or less to a recording medium as a toner image having a monochromatic maximum toner mass per area of 0.35 mg/cm2 or less; and fixing the toner image at a surface temperature of a fixing roll which is 130° C. or less. The toner preferably has 0.02 log(Pa)/° C. or less of a gradient of a storage, elasticity per temperature in a temperature range of from Tm+20° C. to Tm+50° C. Here, Tm represents a melting temperature of a crystalline resin contained in the crystalline toner.

摘要翻译： 形成图像的方法包括以下步骤：将具有5μm或更小的体积平均粒径的调色剂转印到记录介质上，作为每单位面积的单色最大调色剂质量为0.35mg / cm 2的调色剂图像， / SUP>以下; 并将调色剂图像定影在130℃或更低的定影辊的表面温度。 调色剂优选在Tm + 20℃至Tm + 50℃的温度范围内具有0.02log（℃）/℃或更低的存储梯度，每温度的弹性。这里，Tm表示熔融 包含在结晶调色剂中的结晶树脂的温度。

公开(公告)号：US20080013212A1

公开(公告)日：2008-01-17

申请号：US11730628

申请日：2007-04-03

申请人： Mario Fuse ,  Shoji Yamaguchi ,  Tsukasa Matsuda ,  Eizo Kurihara ,  Yasunori Koda ,  Kunihiro Takahashi

发明人： Mario Fuse ,  Shoji Yamaguchi ,  Tsukasa Matsuda ,  Eizo Kurihara ,  Yasunori Koda ,  Kunihiro Takahashi

IPC分类号： G11B5/62

CPC分类号： G11B5/642 ,  Y10T428/31993 ,  Y10T428/32

摘要： A magnetic wire includes a magnetic metal wire material having a surface coated with a layer of an insulating material. The magnetic wire has a magnetic coercive force of 30 A/m or less and has a Barkhausen effect.

摘要翻译： 磁线包括具有涂覆有绝缘材料层的表面的磁性金属线材料。 磁线具有30A / m以下的磁矫顽力，具有巴克豪森效应。

公开(公告)号：US20070281138A1

公开(公告)日：2007-12-06

申请号：US11599294

申请日：2006-11-15

申请人： Eizo Kurihara ,  Tsukasa Matsuda

发明人： Eizo Kurihara ,  Tsukasa Matsuda

IPC分类号： G03G15/20 ,  G03G13/20 ,  B41M5/00 ,  B32B7/12

CPC分类号： G03G7/002 ,  G03G7/0026 ,  G03G7/0046 ,  Y10T428/24802 ,  Y10T428/28 ,  Y10T428/31504 ,  Y10T428/31801 ,  Y10T428/31804

摘要： An electrophotographic recording medium including a substrate and formed on the substrate at least one image receiving layer has a thermoplastic resin, the image receiving layer containing at least one kind of unsaturated fatty acid or an unsaturated fatty acid derivative having a melting point of from about 40° C. to about 120° C.

摘要翻译： 一种电子照相记录媒体，包括基板，在基板上形成有至少一个图像接收层，具有热塑性树脂，图像接收层含有至少一种不饱和脂肪酸或不饱和脂肪酸衍生物，其熔点为约40 ℃至约120℃

公开(公告)号：US20070263217A1

公开(公告)日：2007-11-15

申请号：US11782031

申请日：2007-07-24

申请人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

发明人： Hayashi Otsuki ,  Tsukasa Matsuda ,  Kyoko Ikeda

IPC分类号： G01N21/00

CPC分类号： G01N1/24 ,  C23C16/4405 ,  C23C16/4412 ,  G01N15/06 ,  G01N2015/0693 ,  H01L21/67069 ,  H01L21/67115 ,  H01L21/67253 ,  H01L21/68742 ,  Y10T137/8593 ,  Y10T137/87652 ,  Y10T137/8766

摘要： The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe 90 which connects an exhaust opening 86 of the processing chamber 48 with the vacuum pump 98, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.

摘要翻译： 本发明提供一种粒子测量系统，其设置在处理系统40中，该处理系统40产生通过真空泵98排出处理室48中的空气或气体而获得的气氛，并将与半导体制造有关的工艺应用于晶片W 附着在排气管90上，排气管90将处理室48的排气口86与真空泵98连接，并测量废气中的颗粒数量及其测量方法，该系统和方法提供处理 系统和清洁方法，其通过基于废气中的颗粒数量确定终点并执行不需要的膜的清洁来终止蚀刻工艺。