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公开(公告)号：US20120281196A1
公开(公告)日：2012-11-08
申请号：US13460973
申请日：2012-05-01
申请人： Ulrich Loering , Vladimir Kamenov , Dirk Heinrich Ehm , Stefan-Wolfgang Schmidt , Moritz Becker , Andreas Wurmbrand
发明人： Ulrich Loering , Vladimir Kamenov , Dirk Heinrich Ehm , Stefan-Wolfgang Schmidt , Moritz Becker , Andreas Wurmbrand
CPC分类号： G02B1/113 , G02B5/005 , G02B17/0663 , G02B27/0006 , G02B27/0018 , G03F7/70808 , G03F7/70941
摘要： A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure.
摘要翻译： 投影曝光装置的投影透镜，用于将可位于物平面中的掩模成像到可位于像平面中的感光层上的投影透镜包括其中布置有至少一个光学元件的外壳， 至少一个部分壳体布置在所述壳体内，并且至少在区域上围绕在投影透镜的操作期间从物体平面延伸至图像平面的光，以及反射结构，其减少到达 通过与没有所述反射结构的类似布置进行比较，在至少一个部分壳体上反射之后的图像平面。
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公开(公告)号：US08339576B2
公开(公告)日：2012-12-25
申请号：US13460973
申请日：2012-05-01
申请人： Ulrich Loering , Vladimir Kamenov , Dirk Heinrich Ehm , Stefan-Wolfgang Schmidt , Moritz Becker , Andreas Wurmbrand
发明人： Ulrich Loering , Vladimir Kamenov , Dirk Heinrich Ehm , Stefan-Wolfgang Schmidt , Moritz Becker , Andreas Wurmbrand
CPC分类号： G02B1/113 , G02B5/005 , G02B17/0663 , G02B27/0006 , G02B27/0018 , G03F7/70808 , G03F7/70941
摘要： A projection lens of a projection exposure apparatus, for imaging a mask which can be positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane, includes a housing, in which at least one optical element is arranged, at least one partial housing which is arranged within said housing and which at least regionally surrounds light passing from the object plane as far as the image plane during the operation of the projection lens, and a reflective structure, which reduces a light proportion which reaches the image plane after reflection at the at least one partial housing, by comparison with an analogous arrangement without said reflective structure.
摘要翻译： 投影曝光装置的投影透镜，用于将可位于物平面中的掩模成像到可位于像平面中的感光层上的投影透镜包括其中布置有至少一个光学元件的外壳， 至少一个部分壳体布置在所述壳体内，并且至少在区域上围绕在投影透镜的操作期间从物体平面延伸至图像平面的光，以及反射结构，其减少到达 通过与没有所述反射结构的类似布置进行比较，在至少一个部分壳体上反射之后的图像平面。
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公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。
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公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
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公开(公告)号：US08854602B2
公开(公告)日：2014-10-07
申请号：US10580179
申请日：2004-11-22
申请人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
发明人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.
摘要翻译： 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。
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公开(公告)号：US07768723B2
公开(公告)日：2010-08-03
申请号：US12400965
申请日：2009-03-10
IPC分类号： G02B7/02
CPC分类号： G03F7/70191 , G02B7/00 , G02B7/02 , G02B7/023 , G02B7/14 , G02B13/14 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.
摘要翻译： 安装在光刻物镜中的两个相邻光学元件之间的光学元件的替换装置具有用于待更换的光学元件的保持器，该保持器可以通过其外壳中的侧向开口移动到光刻物镜中。
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公开(公告)号：US20080002170A1
公开(公告)日：2008-01-03
申请号：US10580179
申请日：2004-11-22
申请人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
发明人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.
摘要翻译： 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。
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公开(公告)号：US08810771B2
公开(公告)日：2014-08-19
申请号：US13323404
申请日：2011-12-12
申请人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
发明人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
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9.发明授权公开(公告)号：US08582081B2
公开(公告)日：2013-11-12
申请号：US12274583
申请日：2008-11-20
申请人： Franz Sorg , Andreas Wurmbrand , Thomas Petasch , Dirk Schaffer , Siegfried Wahl
发明人： Franz Sorg , Andreas Wurmbrand , Thomas Petasch , Dirk Schaffer , Siegfried Wahl
IPC分类号： G03B27/42
CPC分类号： G02B7/00 , G02B7/025 , G02B7/026 , G03F7/70825
摘要： The invention relates to a device for the low-deformation replaceable mounting of an optical element, in particular a closure plate of an objective of a projection exposure system for microlithography for the production of semiconductor components, in a mount (12). The optical element is connected to the mount (12) at least partly via an adhesive connection. This is located between the adjacent circumferential walls of mount (12) and optical element. The mount (12) is provided with at least three support feet (14) distributed over the circumference, by means of which the optical element is mounted laterally and axially. The mount (12) is connected to the housing of the objective in an at least approximately deformation-decoupled manner via three mount bearing points (15).
摘要翻译： 本发明涉及一种用于光学元件的低变形可替换安装的装置，特别是用于在安装件（12）中生产半导体部件的用于微光刻的投影曝光系统的目标的封闭板。 光学元件至少部分地通过粘合剂连接连接到安装件（12）。 它位于安装件（12）的相邻圆周壁和光学元件之间。 安装件（12）设置有分布在圆周上的至少三个支撑脚（14），光学元件通过该支撑脚侧向和轴向安装。 安装件（12）经由三个安装支承点（15）以至少近似变形 - 解耦的方式连接到物镜的壳体。
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公开(公告)号：US08488261B2
公开(公告)日：2013-07-16
申请号：US13170951
申请日：2011-06-28
IPC分类号： G02B7/02
CPC分类号： G03F7/70191 , G02B7/00 , G02B7/02 , G02B7/023 , G02B7/14 , G02B13/14 , G03F7/7015 , G03F7/70258 , G03F7/70825
摘要： A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be moved into the lithography objective through a lateral opening in a housing of the same.
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