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    Barrier film for electronic devices and substrates
    2.
    发明授权
    Barrier film for electronic devices and substrates 有权

    公开(公告)号：US10862073B2

    公开(公告)日：2020-12-08

    申请号：US14018449

    申请日：2013-09-05

    申请人： Universal Display Corporation ,  The Trustees of Princeton University

    发明人： Prashant Mandlik ,  Ruiqing Ma ,  Sigurd Wagner ,  Bhadrinarayana Lalgudi Visweswaran

    IPC分类号： H01L51/56 ,  H01L51/52 ,  H01L51/00

    摘要： Methods for forming a coating over a surface are disclosed. A method includes directing a first source of barrier film material toward a substrate in a first direction at an angle θ relative to the substrate, wherein θ is greater than about 0° and less than about 85°. Additionally, a method of depositing a barrier film over a substrate includes directing a plurality of N sources of barrier film material toward a substrate, each source being directed at an angle θN relative to the substrate, wherein for each θN, θ is greater than about 0° and less than about 180°. For at least a first of the θN, θN is greater than about 0° and less than about 85°, and for at least a second of the θN, θN is greater than about 95° and less than about 180°.

    BARRIER FILM FOR ELECTRONIC DEVICES AND SUBSTRATES
    6.
    发明申请
    BARRIER FILM FOR ELECTRONIC DEVICES AND SUBSTRATES 审中-公开
    用于电子设备和基板的遮蔽膜

    公开(公告)号：US20140087497A1

    公开(公告)日：2014-03-27

    申请号：US14018449

    申请日：2013-09-05

    申请人： The Trustees of Princeton University ,  Universal Display Corporation

    发明人： Prashant Mandlik ,  Ruiqing Ma ,  Sigurd Wagner ,  Bhadrinarayana Lalgudi Visweswaran

    IPC分类号： H01L51/56

    CPC分类号： H01L51/56 ,  H01L51/0097 ,  H01L51/5253

    摘要： Methods for forming a coating over a surface are disclosed. A method includes directing a first source of barrier film material toward a substrate in a first direction at an angle θ relative to the substrate, wherein θ is greater than about 0° and less than about 85°. Additionally, a method of depositing a barrier film over a substrate includes directing a plurality of N sources of barrier film material toward a substrate, each source being directed at an angle θN relative to the substrate, wherein for each θN, θ is greater than about 0° and less than about 180°. For at least a first of the θN, θN is greater than about 0° and less than about 85°, and for at least a second of the θN, θN is greater than about 95° and less than about 180°.

    摘要翻译： 公开了在表面上形成涂层的方法。 一种方法包括以第一方向以角度将第一阻挡膜材料源朝向衬底引导; 相对于基底，其中＆amp; 大于约0°且小于约85°。 另外，在衬底上沉积阻挡膜的方法包括将多个N源的阻挡膜材料引导向衬底，每个源相对于衬底以一定角度N指向;其中对于每个衬底，N， ; 大于约0°且小于约180°。 对于至少第一个“N”和“N”，N大于约0°且小于约85°，并且对于至少一秒的“N”和“N”，N大于约95°或更小 比约180°。

    BARRIER FILM FOR ELECTRONIC DEVICES AND SUBSTRATES
    8.
    发明申请
    BARRIER FILM FOR ELECTRONIC DEVICES AND SUBSTRATES 有权

    公开(公告)号：US20210066675A1

    公开(公告)日：2021-03-04

    申请号：US17090930

    申请日：2020-11-06

    申请人： Universal Display Corporation ,  The Trustees of Princeton University

    发明人： Prashant Mandlik ,  Ruiqing Ma ,  Sigurd Wagner ,  Bhadrinarayana Lalgudi Visweswaran

    IPC分类号： H01L51/56 ,  H01L51/52

    摘要： Methods for forming a coating over a surface are disclosed. A method includes directing a first source of barrier film material toward a substrate in a first direction at an angle θ relative to the substrate, wherein θ is greater than about 0° and less than about 85°. Additionally, a method of depositing a barrier film over a substrate includes directing a plurality of N sources of barrier film material toward a substrate, each source being directed at an angle θN relative to the substrate, wherein for each θN, θ is greater than about 0° and less than about 180°. For at least a first of the θN, θN is greater than about 0° and less than about 85°, and for at least a second of the θN, θN is greater than about 95° and less than about 180°.

    Impact resistant OLED devices
    10.
    发明授权
    Impact resistant OLED devices 有权

    公开(公告)号：US10749123B2

    公开(公告)日：2020-08-18

    申请号：US14661355

    申请日：2015-03-18

    申请人： Universal Display Corporation

    发明人： Mauro Premutico ,  Ruiqing Ma

    IPC分类号： H01L51/00 ,  H01L51/52

    摘要： A system and method for the fabrication of high efficiency OLED devices and more specifically, the fabrication of OLED panels optically coupled with impact resistant, transparent structures which permit operation of the OLED panel while providing impact resistance. The OLED device can be built directly on an impact resistant transparent structure, or attached to an impact resistant transparent structure after it is built on other types of substrate. The impact resistant transparent structure can be a toughened layer, such as a glass layer, an energy absorption layer, such as Polycarbonate (PC), or a combination of both. The OLED device is configured to transmit light through the impact resistant transparent structure to the viewer, and the impact resistant transparent structure provides impact resistance for the OLED from the force of any impacting object.