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    RADIATION SOURCE WITH CLEANING APPARATUS
    1.
    发明申请
    RADIATION SOURCE WITH CLEANING APPARATUS 失效
    具有清洁装置的辐射源

    公开(公告)号：US20130161542A1

    公开(公告)日：2013-06-27

    申请号：US13774612

    申请日：2013-02-22

    申请人： Vadim Yevgenyevich BANINE ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

    发明人： Vadim Yevgenyevich BANINE ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Martin Jacobus Johan Jak

    IPC分类号： B08B7/00

    CPC分类号： G03F7/70925

    摘要： A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.

    摘要翻译： 辐射源包括未加盖的Mo / Si多层反射镜，以及被配置为去除未开盖的Mo / Si多层反射镜上的包含Sn的沉积物的清洁装置。 清洁装置被配置为在至少部分辐射源中提供包含H2，D2和HD中的一种或多种的气体和一种或多种选自烃化合物和/或硅烷化合物的其它化合物，以产生氢和/或氘 来自气体的一种或多种另外的化合物的自由基和基团，并且将一种或多种另外的化合物的氢和/或氘自由基和自由基供应到未开孔的Mo / Si多层反射镜，以去除至少一部分沉积物 。

    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    2.
    发明申请
    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    辐射源，光刻设备和器件制造方法

    公开(公告)号：US20100039632A1

    公开(公告)日：2010-02-18

    申请号：US12540611

    申请日：2009-08-13

    申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Derk Jan Wilfred KLUNDER ,  Wouter Anthon SOER

    发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Derk Jan Wilfred KLUNDER ,  Wouter Anthon SOER

    IPC分类号： G03F7/20 ,  G03B27/54 ,  G21K5/00 ,  B08B3/00

    CPC分类号： G21K1/062 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70925 ,  G21K2201/064 ,  H05G2/005

    摘要： A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation. The source includes a chamber in which a plasma is generated, and a mirror configured to reflect radiation emitted by the plasma. The mirror includes a multi-layer structure that includes alternating Mo/Si layers. A boundary Mo layer or a boundary Si layer or a boundary diffusion barrier layer of the alternating layers forms a top layer of the mirror, the top layer facing inwardly with respect to the chamber. A hydrogen radical generator is configured to generate hydrogen radicals in the chamber. The radicals are configured to remove debris generated by the plasma from the mirror. A support is constructed and arranged to support a patterning device configured to pattern the radiation to form a patterned beam of radiation. A projection system is constructed and arranged to project the patterned beam of radiation onto a substrate.

    摘要翻译： 光刻设备包括被配置为产生极紫外辐射的辐射源。 源包括其中产生等离子体的室和被配置为反射由等离子​​体发射的辐射的反射镜。 反射镜包括包含交替的Mo / Si层的多层结构。 交替层的边界Mo层或边界Si层或边界扩散阻挡层形成反射镜的顶层，顶层相对于室面向内。 氢游离基发生器构造成在腔室中产生氢自由基。 基团被配置成从反射镜去除由等离子体产生的碎屑。 支撑件被构造和布置成支撑配置成图案化辐射以形成图案化的辐射束的图案形成装置。 投影系统被构造和布置成将图案化的辐射束投射到衬底上。

    RADIATION SOURCE
    7.
    发明申请
    RADIATION SOURCE 有权
    辐射源

    公开(公告)号：US20100253928A1

    公开(公告)日：2010-10-07

    申请号：US12818621

    申请日：2010-06-18

    申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich Ivanov

    发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich Ivanov

    IPC分类号： G03B27/54 ,  G21K5/04

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/008

    摘要： A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with he substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.

    摘要翻译： 辐射源包括腔室，构造和布置成在物体通过腔室内的相互作用点的位置处将物质供应到腔室的供应源，构造和布置成将激光束提供到相互作用点的激光器 使得当激光束与相互作用点处的物质相互作用时，产生辐射发射等离子体，以及构造和布置成将未加热的缓冲气体以相对于相互作用点的位置的速率递送到腔室中的导管，其速率除去加热的缓冲液 在相互作用点之前的激光束和物质之间的后续相互作用之前的相互作用点周围的区域中的气体。