Method for fabricating fine features by jet-printing and surface treatment
    8.
    发明授权
    Method for fabricating fine features by jet-printing and surface treatment 有权
    通过喷墨印刷和表面处理制造精细特征的方法

    公开(公告)号:US07223700B2

    公开(公告)日:2007-05-29

    申请号:US11251525

    申请日:2005-10-14

    IPC分类号: H01L21/302

    摘要: A method and system for masking a surface to be etched is described. The method includes the operation of heating a phase-change masking material and using a droplet source to eject droplets of a masking material for deposit on a thin-film or other substrate surface to be etched. The temperature of the thin-film or substrate surface is controlled such that the droplets rapidly freeze after upon contact with the thin-film or substrate surface. The thin-film or substrate is then treated to alter the surface characteristics, typically by depositing a self assembled monolayer on the surface. After deposition, the masking material is removed. A material of interest is then deposited over the substrate such that the material adheres only to regions not originally covered by the mask such that the mask acts as a negative resist. Using such techniques, feature sizes of devices smaller than the smallest droplet printed may be fabricated.

    摘要翻译: 描述用于掩蔽待蚀刻表面的方法和系统。 该方法包括加热相变掩模材料和使用液滴源来喷射掩模材料的液滴以沉积在待蚀刻的薄膜或其它基底表面上的操作。 控制薄膜或基板表面的温度,使得在与薄膜或基板表面接触之后液滴快速冷冻。 然后通常通过在表面上沉积自组装的单层来处理薄膜或基底以改变表面特性。 沉积后,去除掩模材料。 然后将感兴趣的材料沉积在衬底上,使得材料仅粘附到最初不被掩模覆盖的区域,使得掩模用作负抗蚀剂。 使用这样的技术,可以制造小于最小液滴印刷的装置的特征尺寸。

    MULTI-LAYER MONOLITHIC FLUID EJECTORS USING PIEZOELECTRIC ACTUATION
    9.
    发明申请
    MULTI-LAYER MONOLITHIC FLUID EJECTORS USING PIEZOELECTRIC ACTUATION 有权
    使用压电致动器的多层单相流体喷射器

    公开(公告)号:US20090073242A1

    公开(公告)日:2009-03-19

    申请号:US12273575

    申请日:2008-11-19

    IPC分类号: B41J2/045

    摘要: A fluid ejector including a silicon wafer having a first side and a second side. A multi-layer monolithic structure is formed on the first side of the silicon wafer. The multi-layer monolithic structure includes a first structure layer formed on the first side of the silicon wafer, and the first structure layer has an aperture. A second structure layer has a horizontal portion and closed, filled trenches or vertical sidewalls. The first structure layer, horizontal portion and the closed, filled trenches or vertical sidewalls of the second structure layer define a fluid cavity. An actuator is associated with the horizontal portion of the second structure layer, and an etched portion of the silicon wafer defines an open area which exposes the aperture in the first structure layer.

    摘要翻译: 一种流体喷射器,包括具有第一侧和第二侧的硅晶片。 在硅晶片的第一侧上形成多层整体结构。 多层单片结构包括形成在硅晶片的第一侧上的第一结构层,第一结构层具有孔。 第二结构层具有水平部分和闭合的填充沟槽或垂直侧壁。 第二结构层的第一结构层,水平部分和闭合填充的沟槽或垂直侧壁限定流体腔。 致动器与第二结构层的水平部分相关联,并且硅晶片的蚀刻部分限定露出第一结构层中的孔的开放区域。

    Counter electrode for an electrostatic recorder
    10.
    发明授权
    Counter electrode for an electrostatic recorder 失效
    静电记录仪的计数器电极

    公开(公告)号:US5150134A

    公开(公告)日:1992-09-22

    申请号:US706708

    申请日:1991-05-29

    IPC分类号: G01D15/06 B41J2/395

    CPC分类号: B41J2/395

    摘要: An electrostatic recorder for applying electrical charges, in image configuration, upon a movable image recording member, the recorder including a stylus electrode array and a counter electrode array which electrode arrays are aligned with one another on opposite surfaces of the image recording member and are positioned so as to extend across the direction of movement of the image recording member. The counter electrode array comprises a base member supporting a plurality of electrically conductive traces thereon, each extending substantially in the direction of movement of the recording member. The conductive traces are interconnected by a layer of resistive material, and contact pads are connected to periodically spaced conductive traces so as to apply electrical potentials to spaced regions of the counter electrode array. Those conductive traces located intermediate the periodically spaced conductive traces are electrically floating when electrical potentials are applied to the spaced conductive traces.