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110 条记录 (耗时 0.049 秒)

    Plasma reactor with dynamic RF inductive and capacitive coupling control
    1.
    发明授权
    Plasma reactor with dynamic RF inductive and capacitive coupling control 失效
    具有动态RF感应和电容耦合控制的等离子体电抗器

    公开(公告)号：US06447636B1

    公开(公告)日：2002-09-10

    申请号：US09505578

    申请日：2000-02-16

    申请人： Xue-Yu Qian ,  Zhi-Wen Sun ,  Maocheng Li ,  John Holland ,  Arthur H. Sato ,  Valentin N. Todorov ,  Patrick L. Leahey ,  Robert E. Ryan

    发明人： Xue-Yu Qian ,  Zhi-Wen Sun ,  Maocheng Li ,  John Holland ,  Arthur H. Sato ,  Valentin N. Todorov ,  Patrick L. Leahey ,  Robert E. Ryan

    IPC分类号： H05H100

    CPC分类号： H01J37/32009 ,  H01J37/32082 ,  H01J37/3299 ,  H05H1/46

    摘要： The invention provides a system and a method for dynamic RF inductive and capacitive coupling control to improve plasma substrate processing, as well as for achieving contamination and defect reduction. A plasma reactor includes a substrate support disposed in a chamber. An RF coil is disposed adjacent the chamber for inductively coupling RF energy into the chamber. An electrode is disposed adjacent the chamber and has a voltage for capacitively coupling energy into the chamber. The electrode is spaced from the substrate support and the RF coil. An electrode adjusting member is coupled with the electrode for dynamically adjusting the voltage in the electrode to vary the capacitive coupling for improved plasma ignition and plasma stability. A Faraday shield may be placed between the RF coil and the plasma process region in the chamber to suppress capacitive coupling of the RF coil. Sensors may be provided to monitor the amounts of inductive coupling and capacitive coupling to provide feedback to a controller which is used to adjust the inductive coupling and capacitive coupling in real time to stabilize the plasma and achieve improved processing.

    摘要翻译： 本发明提供了用于动态RF感应和电容耦合控制以改善等离子体基板处理以及实现污染和缺陷减少的系统和方法。 等离子体反应器包括设置在室中的基板支撑件。 射频线圈邻近该腔室设置，用于将射频能量感应耦合到腔室中。 电极邻近该腔室设置并且具有用于将能量电容耦合到腔室中的电压。 电极与衬底支架和RF线圈间隔开。 电极调节构件与电极耦合以动态地调节电极中的电压，以改变电容耦合以改善等离子体点火和等离子体稳定性。 法拉第屏蔽可以放置在RF线圈和腔室中的等离子体处理区域之间，以抑制RF线圈的电容耦合。 可以提供传感器来监测电感耦合和电容耦合的量以向控制器提供反馈，该控制器用于实时调整电感耦合和电容耦合以稳定等离子体并实现改进的处理。

    Bonded multi-layer RF window
    2.
    发明申请
    Bonded multi-layer RF window 审中-公开
    保税多层射频窗口

    公开(公告)号：US20070079936A1

    公开(公告)日：2007-04-12

    申请号：US11445559

    申请日：2006-06-02

    申请人： Maocheng Li ,  John Holland ,  Patrick Leahey ,  Xueyu Qian ,  Michael Barnes ,  Jon Clinton ,  You Wang ,  Nianci Han

    发明人： Maocheng Li ,  John Holland ,  Patrick Leahey ,  Xueyu Qian ,  Michael Barnes ,  Jon Clinton ,  You Wang ,  Nianci Han

    IPC分类号： B31B1/60 ,  C23F1/00 ,  C23C16/00

    CPC分类号： H01P1/08 ,  B32B2315/02 ,  C04B35/63452 ,  C04B37/003 ,  C04B37/005 ,  C04B37/008 ,  C04B2237/10 ,  C04B2237/34 ,  C04B2237/341 ,  C04B2237/343 ,  C04B2237/708 ,  H01J37/32082 ,  Y10T156/10

    摘要： A bonded multi-layer RF window may include an external layer of dielectric material having desired thermal properties, an internal layer of dielectric material exposed to plasma inside a reaction chamber, and an intermediate layer of bonding material between the external layer and the internal layer. Heat produced by the chemical reaction inside the chamber and by the transmission of RF energy through the window may be conducted from the internal layer to the external layer, which may be cooled during a semiconductor wafer manufacturing process. A bonded multi-layer RF window may include cooling conduits for circulating coolant to facilitate cooling of the internal layer; additionally or alternatively, gas distribution conduits and gas injection apertures may be included for delivering one or more process gases into a reaction chamber. A system including a plasma reaction chamber may employ the inventive bonded multi-layer RF window.

    摘要翻译： 键合的多层RF窗可以包括具有期望的热性质的外部介电材料层，暴露于反应室内的等离子体的介电材料的内部层，以及外层和内层之间的接合材料的中间层。 通过室内的化学反应和通过窗口的RF能量传递产生的热量可以从内层传导到外层，其可在半导体晶片制造过程中被冷却。 粘合的多层RF窗可以包括用于循环冷却剂以便于冷却内层的冷却管道; 另外或替代地，可以包括气体分配管道和气体注入孔，用于将一个或多个处理气体输送到反应室中。 包括等离子体反应室的系统可以采用本发明的结合的多层RF窗口。

    Hockey stick rack
    5.
    发明授权
    Hockey stick rack 失效
    曲棍球架

    公开(公告)号：US07422122B2

    公开(公告)日：2008-09-09

    申请号：US11334298

    申请日：2006-01-19

    申请人： John Holland

    发明人： John Holland

    IPC分类号： A47F7/00

    CPC分类号： A63B71/0036 ,  A63B71/0045 ,  A63B2102/22 ,  A63B2102/24

    摘要： The invention is a rack holding hockey sticks and other sporting equipment. The base is comprised of a member to which is attached at right angles another two members on opposite sides and a post rising vertically from the point of attachment. A second vertical member slides over the first vertical member. Near the top of the second vertical member are attached two members. Attached to these two members are two additional members at right angles. To each of those members are attached a plurality of other members at right angles projecting outwards. There are two additional members attached lower on the second vertical member. Each of these members have an additional member attached at right angles and a plurality of members attached to such member at right angles, which members extend inwards towards the vertical member.

    摘要翻译： 本发明是一种搁置曲棍球棒和其他运动器材的机架。 底座由一个构件组成，在该构件上以直角连接两个相对侧的两个构件，以及从安装点垂直上升的柱。 第二垂直构件在第一垂直构件上滑动。 靠近第二垂直构件的顶部附有两个构件。 这两名成员的附属成员是两个成员。 对于这些构件中的每一个，以向外突出的直角附接多个其它构件。 在第二垂直构件上附加有两个附加构件。 这些构件中的每一个具有直角连接的附加构件，并且多个构件以直角附接到该构件，该构件向着垂直构件向内延伸。

    SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE ZONES
    6.
    发明申请
    SUBSTRATE SUPPORT WITH ELECTROSTATIC CHUCK HAVING DUAL TEMPERATURE ZONES 有权
    基座支撑带有双温度带的静电卡盘

    公开(公告)号：US20070258186A1

    公开(公告)日：2007-11-08

    申请号：US11740869

    申请日：2007-04-26

    申请人： Alexander Matyushkin ,  Dennis Koosau ,  Theodoros Panagopoulos ,  John Holland

    发明人： Alexander Matyushkin ,  Dennis Koosau ,  Theodoros Panagopoulos ,  John Holland

    IPC分类号： H01T23/00

    CPC分类号： H01L21/6831 ,  H01L21/67109 ,  H01L21/6875 ,  Y10T279/23

    摘要： An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. The chuck and base can also have an overlying edge ring and clamp ring.

    摘要翻译： 用于在衬底处理室中接收衬底的静电吸盘包括具有衬底接收表面的陶瓷圆盘和具有多个间隔开的台面的相对的背面。 将电极嵌入陶瓷盘中以产生静电力以保持基板。 位于陶瓷圆盘的周边部分和中心部分的加热线圈允许独立地控制陶瓷盘的中心部分和周边部分的温度。 卡盘由具有保留空气的凹槽的基座支撑。 卡盘和底座也可以有一个上覆边缘环和夹环。

    Wound dressing consisting of a biodegradable biopolymer
    8.
    发明申请
    Wound dressing consisting of a biodegradable biopolymer 审中-公开
    伤口敷料由可生物降解的生物聚合物组成

    公开(公告)号：US20060204560A1

    公开(公告)日：2006-09-14

    申请号：US11433607

    申请日：2006-05-15

    申请人： Alexander Walacavage ,  John Holland

    发明人： Alexander Walacavage ,  John Holland

    IPC分类号： A61K31/718 ,  A61L15/00

    CPC分类号： A61K31/00 ,  A61K31/717 ,  A61L15/28 ,  C08L3/02

    摘要： A hydrophilic pliable wound dressing consisting of biopolymers creates a new approach to wound dressing by providing a self-assembling hydrophilic gel type moisture permeable barrier applicable to a wide range of wound sizes and depths. Biodegradability and water solubility enable rapid and safe disposal, obviating a significant problem that occurs with conventional type dressings. The initial sheet form of the dressing provides an ideal carrier for delivery of nutrients, debriders, antibiotics, analgesics and physiological regulators.

    摘要翻译： 由生物聚合物组成的亲水性韧性伤口敷料通过提供适用于各种伤口尺寸和深度的自组装亲水性凝胶型透湿屏障，创造了一种新的伤口敷料方法。 生物降解性和水溶性使得能够快速和安全地处理，消除常规类型敷料发生的重大问题。 敷料的初始片剂形式为营养物，脱盐剂，抗生素，止痛剂和生理调节剂的输送提供了理想的载体。

    Method and apparatus for controlling temperature of a substrate
    9.
    发明申请
    Method and apparatus for controlling temperature of a substrate 失效
    用于控制基板温度的方法和装置

    公开(公告)号：US20060076109A1

    公开(公告)日：2006-04-13

    申请号：US11246012

    申请日：2005-10-07

    申请人： John Holland ,  Theodoros Panagopoulos

    发明人： John Holland ,  Theodoros Panagopoulos

    IPC分类号： C23F1/00 ,  H01L21/306 ,  C23C16/00 ,  H01L21/00

    CPC分类号： H01L21/67248 ,  H01L21/67103 ,  H01L21/6831 ,  Y10T279/23

    摘要： A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes an electrostatic chuck coupled to a metallic base. The electrostatic chuck includes at least one chucking electrode and metallic base includes at least two fluidly isolated conduit loops disposed therein. In another embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions having different coefficients of thermal conductivity. In another embodiment, the support member is an electrostatic chuck. In further embodiments, a pedestal assembly has channels formed between the base and support member for providing cooling gas in proximity to the material layer to further control heat transfer between the support member and the base, thereby controlling the temperature profile of a substrate disposed on the support member.

    摘要翻译： 提供了一种用于在处理期间控制基板的温度的基座组件和方法。 在一个实施例中，基座组件包括联接到金属基座的静电卡盘。 静电吸盘包括至少一个夹紧电极和金属底座，其包括设置在其中的至少两个流体隔离的导管环。 在另一个实施例中，基座组件包括通过材料层联接到基座的支撑构件。 材料层具有至少两个具有不同导热系数的区域。 在另一个实施例中，支撑构件是静电卡盘。 在另外的实施例中，基座组件具有形成在基部和支撑构件之间的通道，用于在材料层附近提供冷却气体，以进一步控制支撑构件和基座之间的热传递，由此控制设置在基座上的基板的温度分布 支持会员