MICROREACTOR
    1.
    发明申请
    MICROREACTOR 审中-公开

    公开(公告)号:US20110236269A1

    公开(公告)日:2011-09-29

    申请号:US13119143

    申请日:2009-09-14

    IPC分类号: B01J19/00

    摘要: A microreactor having a reaction mixture inlet, a reaction mixture channel, and a reaction mixture outlet is provided, in which a piezoelectric material that generates surface acoustic waves and has, formed on the surface thereof, a thin film having catalytic activity is disposed in the reaction mixture channel so that the inner surface of the reaction mixture channel is configured from the thin film. The thin film having catalytic activity can be constituted of a material selected from a group consisting of metals, metal oxides, and complexes of organic compounds. The microreactor attains remarkable improvements in the effect of stirring a reaction mixture and catalysis, whereby a chemical reaction can be evenly and efficiently accelerated. The microreactor is free from channel clogging and pressure loss and hence renders a stable and precise chemical reaction possible.

    摘要翻译: 提供了具有反应混合物入口,反应混合物通道和反应混合物出口的微反应器,其中产生表面声波并且在其表面上形成具有催化活性的薄膜的压电材料设置在 反应混合物通道,使得反应混合物通道的内表面由薄膜构成。 具有催化活性的薄膜可以由选自金属,金属氧化物和有机化合物的复合物的材料构成。 微反应器在搅拌反应混合物和催化作用方面得到显着改善,从而可以均匀有效地加速化学反应。 微反应器没有通道堵塞和压力损失,因此可以实现稳定和精确的化学反应。

    Substrate processing method
    5.
    发明授权
    Substrate processing method 失效
    基板加工方法

    公开(公告)号:US08574676B2

    公开(公告)日:2013-11-05

    申请号:US13130066

    申请日:2009-11-19

    IPC分类号: C23C16/40

    摘要: A substrate processing method includes steps of: arranging a substrate in a chamber; introducing H2 gas at a first flow rate and O2 gas at a second flow rate independently from the H2 gas into a catalyst reaction portion in which catalyst is accommodated, wherein H2O gas produced from the H2 gas and the O2 gas that contact the catalyst is ejected from the catalyst reaction portion toward the substrate; and reducing a flow rate of the O2 gas introduced to the catalyst reaction portion to a third flow rate that is lower than the second flow rate, wherein the steps of introducing the H2 gas and the O2 gas and reducing the flow rate of the O2 gas are repeated in this order at a predetermined repetition frequency, thereby processing the substrate.

    摘要翻译: 基板处理方法包括以下步骤:将基板布置在室中; 将第一流量的H 2气体和独立于H 2气体的第二流量的O 2气体引入到其中容纳催化剂的催化剂反应部分,其中喷出由H 2气体产生的H 2 O气体和与催化剂接触的O 2气体 从催化剂反应部分向基板; 并且将引入到催化剂反应部的O 2气体的流量减少到低于第二流量的第三流量,其中引入H 2气体和O 2气体并降低O 2气体的流量的步骤 以预定的重复频率以该顺序重复,从而处理基板。

    DEPOSITION APPARATUS AND DEPOSITION METHOD
    7.
    发明申请
    DEPOSITION APPARATUS AND DEPOSITION METHOD 审中-公开
    沉积装置和沉积方法

    公开(公告)号:US20100323108A1

    公开(公告)日:2010-12-23

    申请号:US12864904

    申请日:2008-11-21

    IPC分类号: C23C16/448 C23C16/00

    摘要: A disclosed deposition apparatus includes a catalyst reaction apparatus including an introduction part that introduces a first source gas, a catalyst container that contains a catalyst that produces reactive gas from the first source gas introduced from the introduction part, and a reactive gas ejection part that ejects the reactive gas from the catalyst container; a reactive gas separator that allows the reactive gas ejected from the reactive gas ejection part to go therethrough; a substrate supporting part that supports a substrate; and a supplying part that supplies a second source gas that reacts with the reactive gas that passes through the reactive gas separator, thereby depositing a film on the substrate.

    摘要翻译: 所公开的沉积装置包括:催化剂反应装置,其包括引入第一源气体的引入部分,包含从引入部分引入的第一源气体产生反应性气体的催化剂的催化剂容器;以及反应性气体喷出部件, 来自催化剂容器的反应气体; 反应性气体分离器,其允许从反应性气体喷射部分喷射的反应气体通过; 支撑基板的基板支撑部; 以及供给部,其供给与通过反应性气体分离器的反应性气体反应的第二源气体,从而在基板上沉积膜。

    HYDROGENATION CATALYST FOR CARBONYL GROUP, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING UNSATURATED ALCOHOL BY USING SUCH CATALYST
    8.
    发明申请
    HYDROGENATION CATALYST FOR CARBONYL GROUP, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING UNSATURATED ALCOHOL BY USING SUCH CATALYST 审中-公开
    碳氢化合物的加氢催化剂,其生产方法和使用这种催化剂生产不饱和醇的方法

    公开(公告)号:US20090299105A1

    公开(公告)日:2009-12-03

    申请号:US12066062

    申请日:2006-09-05

    摘要: Provided are a hydrogenation catalyst for carbonyl groups which can produce an unsaturated alcohol by hydrogenating an unsaturated carbonyl compound with high selectivity by a simple process at low cost, a method of efficiently producing the hydrogenation catalyst, and a practical method of producing an unsaturated alcohol by using the hydrogenation catalyst. In the present invention, the hydrogenation catalyst is obtained by carrying a noble metal such as ruthenium as a catalyst component onto a carrier which is composed of an oxygen-containing gallium compound. Gallium oxyhydroxide, gallium oxide, gallium phosphate or the like can be used as the gallium compound, and a hydrogenation catalyst including the gallium compound carrier carrying 0.1 to 10% by weight of ruthenium is used suitably.

    摘要翻译: 提供了一种用于羰基的加氢催化剂,其可以通过以低成本的简单方法以高选择性氢化不饱和羰基化合物来生产不饱和醇,有效生产氢化催化剂的方法和通过以下方法制备不饱和醇的实际方法: 使用氢化催化剂。 在本发明中,通过将诸如钌的贵金属作为催化剂组分携带在由含氧镓化合物构成的载体上而获得。 可以使用氢氧化镓,氧化镓,磷酸镓等作为镓化合物,适当地使用含有载体​​重量为0.1〜10%的镓化合物载体的氢化催化剂。

    DRUG FOR INHIBITING VASCULAR INTIMAL HYPERPLASIA
    9.
    发明申请
    DRUG FOR INHIBITING VASCULAR INTIMAL HYPERPLASIA 审中-公开
    用于抑制血管紧张素血症的药物

    公开(公告)号:US20090155187A1

    公开(公告)日:2009-06-18

    申请号:US12353646

    申请日:2009-01-14

    IPC分类号: A61K9/12 A61K31/501

    CPC分类号: A61K31/501 C07D237/14

    摘要: To provide an intimal hyperplasia inhibitor useful for prevention of restenosis after percutaneous transluminal coronary angioplasty (PTCA) or vascular stent placement or treatment of its progress.An intimal hyperplasia inhibitor containing a 3(2H)-pyridazinone compound represented by the formula (I): [wherein each of R1, R2 and R3 is independently a hydrogen atom or a C1-6 alkyl group, X is a halogen atom, cyano or a hydrogen atom, Y is a halogen atom, trifluoromethyl or a hydrogen atom, and A is a C1-8 alkylene which may be substituted with a hydroxyl group] or a pharmacologically acceptable salt thereof.

    摘要翻译: 提供内皮增生抑制剂,可用于预防经皮腔内冠状动脉成形术(PTCA)或血管支架置入或治疗其进展后的再狭窄。 含有由式(I)表示的3(2H) - 哒嗪酮化合物的内膜增生抑制剂:其中R 1,R 2和R 3各自独立地为氢原子或C 1-6烷基,X为卤素原子,氰基 或氢原子,Y为卤素原子,三氟甲基或氢原子,A为可被羟基取代的C 1-8亚烷基]或其​​药理学上可接受的盐。