Rare Earth Sintered Magnet, Raw Material Alloy Powder For Rare Earth Sintered Magnet, And Process For Producing Rare Earth Sintered Magnet
    3.
    发明申请
    Rare Earth Sintered Magnet, Raw Material Alloy Powder For Rare Earth Sintered Magnet, And Process For Producing Rare Earth Sintered Magnet 审中-公开
    稀土烧结磁体,稀土烧结磁体原料合金粉末,稀土烧结磁铁生产工艺

    公开(公告)号:US20070221296A1

    公开(公告)日:2007-09-27

    申请号:US11568823

    申请日:2005-06-24

    IPC分类号: H01F1/00 B22F1/00

    摘要: Provided is a rare earth sintered magnet which can attain a high residual magnetic flux density without causing a drop in coercive force or mechanical strength. The above-described problems are resolved by a rare earth sintered magnet which includes a sintered body whose carbon amount as determined by mass spectrometry is between 500 and 1,500 ppm, wherein a cv-value of the carbon amount on a rupture plane thereof is no greater than 200. The production method for this rare earth sintered magnet includes the steps of: preparing a compacted body by compressing in a magnetic field a raw material alloy powder has a carbon amount of no greater than 1,200 ppm as determined by mass spectrometry, and a Cmax/Cmin value of 15 or less wherein Cmax and Cmin respectively represent a maximum value and a minimum value of X-ray intensity of characteristic X-rays of carbon as determined by EPMA (Electron Probe Micro Analyzer); and sintering the compacted body.

    摘要翻译: 提供一种可以获得高残留磁通密度而不会导致矫顽力或机械强度降低的稀土烧结磁体。 上述问题由包括通过质谱法测定的碳量为500〜1500ppm的烧结体的稀土类烧结磁体解决,其中其断裂面上碳量的cv值不大 该稀土类烧结磁体的制造方法包括以下步骤:通过在磁场中压缩制备压实体,通过质谱法测定碳原子数不超过1200ppm的原料合金粉末, Cmax / Cmin值为15以下,其中Cmax和Cmin分别表示由EPMA(Electron Probe Micro Analyzer)测定的碳的特征X射线的X射线强度的最大值和最小值; 并烧结压实体。

    Process for producing magnet
    4.
    发明授权
    Process for producing magnet 有权
    磁铁制造工艺

    公开(公告)号:US08394450B2

    公开(公告)日:2013-03-12

    申请号:US12473429

    申请日:2009-05-28

    IPC分类号: B05D7/14

    CPC分类号: H01F41/026 H01F41/0293

    摘要: The process for producing a magnet according to the invention is characterized by comprising a first step in which a heavy rare earth compound containing Dy or Tb as a heavy rare earth element is adhered onto a sintered compact of a rare earth magnet and a second step in which the heavy rare earth compound-adhered sintered compact is subjected to heat treatment, wherein the heavy rare earth compound is a Dy or Tb iron compound.

    摘要翻译: 根据本发明的制造磁体的方法的特征在于包括第一步骤,其中将包含Dy或Tb的重稀土元素的重稀土化合物粘附到稀土磁体的烧结体上,第二步骤 对重稀土类化合物附着的烧结体进行热处理,其中重稀土类化合物为Dy或Tb铁化合物。

    PROCESS FOR PRODUCING MAGNET
    5.
    发明申请
    PROCESS FOR PRODUCING MAGNET 有权
    生产磁铁的工艺

    公开(公告)号:US20090297699A1

    公开(公告)日:2009-12-03

    申请号:US12473429

    申请日:2009-05-28

    IPC分类号: B05D7/14

    CPC分类号: H01F41/026 H01F41/0293

    摘要: The process for producing a magnet according to the invention is characterized by comprising a first step in which a heavy rare earth compound containing Dy or Th as a heavy rare earth element is adhered onto a sintered compact of a rare earth magnet and a second step in which the heavy rare earth compound-adhered sintered compact is subjected to heat treatment, wherein the heavy rare earth compound is a Dy or Th iron compound.

    摘要翻译: 根据本发明的制造磁体的方法的特征在于包括第一步骤,其中将含有Dy或Th的重稀土化合物作为重稀土元素粘附到稀土磁体的烧结体上,第二步骤 重稀土类化合物的烧结体进行热处理,其中重稀土类化合物为Dy或Th铁化合物。

    Epitaxial growth apparatus and epitaxial growth method
    6.
    发明授权
    Epitaxial growth apparatus and epitaxial growth method 有权
    外延生长装置和外延生长法

    公开(公告)号:US09273414B2

    公开(公告)日:2016-03-01

    申请号:US12945299

    申请日:2010-11-12

    IPC分类号: C30B25/02 C30B29/06 C30B25/12

    CPC分类号: C30B29/06 C30B25/02 C30B25/12

    摘要: An object of the present invention is to provide an epitaxial growth apparatus and an epitaxial growth method that can suppress variation in in-face temperature of a semiconductor wafer caused by deflection of a susceptor and manufacture an epitaxial wafers of high quality. Specifically, the present invention provides an epitaxial growth apparatus for forming an epitaxial film on a semiconductor wafer placed in a chamber having a supply port and an exhaust port for a treatment gas, the apparatus comprising: a susceptor for placing the semiconductor wafer thereon within the chamber; and a susceptor support shaft for supporting the susceptor at an underneath portion of the susceptor, wherein the susceptor support shaft has a support column located substantially coaxial with the center of the susceptor, and at least four support arms extending radially from the top end of the support column with equal intervals therebetween.

    摘要翻译: 本发明的目的是提供一种能够抑制由于感受器的偏转引起的半导体晶片的面内温度变化的外延生长装置和外延生长方法,并且制造高质量的外延晶片。 具体地说,本发明提供了一种用于在放置在具有用于处理气体的供给口和排气口的室中的半导体晶片上形成外延膜的外延生长装置,该设备包括:用于将半导体晶片放置在其内的基座 房间 以及用于将基座支撑在基座的下部的基座支撑轴,其中,所述基座支撑轴具有与所述基座的中心基本同轴的支撑柱,以及从所述基座的顶端径向延伸的至少四个支撑臂 支撑柱之间具有相等的间隔。

    Illumination device and display device
    7.
    发明授权
    Illumination device and display device 有权
    照明装置和显示装置

    公开(公告)号:US09140848B2

    公开(公告)日:2015-09-22

    申请号:US14110764

    申请日:2012-04-12

    申请人: Takeshi Masuda

    发明人: Takeshi Masuda

    摘要: A backlight device (illumination device) 80 includes a plurality of LEDs 22 and entrance ends 30a that light from the LEDs 22 enters, and further includes a plurality of light guide bars 30 that guide the light from the LEDs 22 and a bar-shaped attachment member 55 to which the LEDs 22 and the light guide bars 30 are attached.

    摘要翻译: 背光装置(照明装置)80包括多个LED22和来自LED22的光的入射端30a,并且还包括引导来自LED22的光的多个导光杆30和条形附件 LED 22和导光杆30所附接的构件55。

    OPENING AND CLOSING APPARATUS WITH LOCK
    8.
    发明申请
    OPENING AND CLOSING APPARATUS WITH LOCK 有权
    打开和关闭装置与锁

    公开(公告)号:US20150054294A1

    公开(公告)日:2015-02-26

    申请号:US14343385

    申请日:2012-08-29

    IPC分类号: E05B65/08 E05F15/00 E05B47/00

    摘要: An opening and closing apparatus with a lock that is provided is capable of safely and promptly closing a sliding door, and also easily performing unlocking with a simple configuration. In an opening and closing apparatus with a lock for opening and closing sliding doors that are provided with elastic members at their door leading ends, output of an electric motor is transmitted to a rack-and-pinion mechanism or a lock mechanism. A control unit controls the electric motor such that a closing operation is performed, the closing operation operates the rack-and-pinion mechanism so as to move the sliding doors to a fully closed position and then displacing a link mechanism in a lock mechanism from an unlocking position to a locking position. Furthermore, the control unit controls the electric motor so as to reduce the output of the electric motor at a predetermined intermediate time point during the closing operation.

    摘要翻译: 具有锁定的开闭装置能够安全且及时地关闭滑动门,并且也可以以简单的结构容易地执行解锁。 在具有用于打开和关闭在其门前端设置有弹性构件的滑动门的锁的开闭装置中,电动机的输出被传递到齿条 - 小齿轮机构或锁定机构。 控制单元控制电动机,使得执行关闭操作,关闭操作操作齿条 - 小齿轮机构,以将滑动门移动到完全关闭位置,然后将锁定机构中的连杆机构从 解锁位置到锁定位置。 此外,控制单元控制电动机,以便在关闭操作期间将电动机的输出减小到预定的中间时间点。

    Light guide elements for display device
    9.
    发明授权
    Light guide elements for display device 有权
    显示装置导光元件

    公开(公告)号:US08684588B2

    公开(公告)日:2014-04-01

    申请号:US12990957

    申请日:2009-02-20

    IPC分类号: F21V7/04

    摘要: A light guide element includes a light-emitting section including a light-emitting surface, a light guide section, and a diffusing device provided in at least part of a region extending from a boundary surface between the light-emitting section and the light guide section, to point halfway between the boundary surface and an end of the light guide section closer to the light source. The light guide element might be used to form a backlight for a liquid crystal display device.

    摘要翻译: 导光元件包括发光部分,发光表面,导光部分和漫射装置,该发光部分设置在从发光部分和导光部分之间的边界面延伸的区域的至少一部分中 指向边界表面和更靠近光源的导光部分的端部之间的中途。 导光元件可以用于形成用于液晶显示装置的背光源。

    Apparatus for the preparation of film
    10.
    发明授权
    Apparatus for the preparation of film 有权
    薄膜制备装置

    公开(公告)号:US08591655B2

    公开(公告)日:2013-11-26

    申请号:US10612149

    申请日:2003-07-03

    摘要: A thin film-forming apparatus, for ensuring uniform plane distribution of properties of a film formed on a substrate surface, has a gas-supply port 24a supplying a gas mixture from a gas-mixing chamber 24 to a shower head 25. The port is arranged at the peripheral portion on the bottom face of the gas-mixing chamber so that the gas mixture flows from the upper peripheral region of the head towards the center thereof. An exhaust port 32 discharging the exhaust gas generated in the film-forming chamber 3 is arranged at a position lower than the level of a stage 31 during film-formation directing the exhaust gas towards the side wall of the chamber 3 and discharging the exhaust gas through the exhaust port. The stage 31 is designed to move freely up and down to adjust the distance between the shower head 25 and substrate S.

    摘要翻译: 用于确保形成在基板表面上的膜的性质的均匀平面分布的薄膜形成装置具有将气体混合物从气体混合室24供应到喷淋头25的气体供应口24a。该端口是 布置在气体混合室的底面的周边部分,使得气体混合物从头部的上周边区域朝向其中心流动。 将成膜室3内产生的废气排出的排气口32配置在低于气缸台31的高度的位置,在成膜期间将排气朝着室3的侧壁排出,排出废气 通过排气口。 舞台31被设计成上下移动以调节淋浴头25和基底S之间的距离。