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公开(公告)号:US20070215976A1
公开(公告)日:2007-09-20
申请号:US11378106
申请日:2006-03-17
申请人: Yinon Degani , Yu Fan , Charley Gao , Maureen Lau , Kunquan Sun , Liguo Sun
发明人: Yinon Degani , Yu Fan , Charley Gao , Maureen Lau , Kunquan Sun , Liguo Sun
CPC分类号: H01L27/016 , H01L21/84 , H01L23/66 , H01L27/13 , H01L28/10 , H01L28/20 , H01L28/40 , H01L2224/05572 , H01L2224/05573 , H01L2224/16 , H01L2924/00014 , H01L2924/13091 , H01L2924/19011 , H01L2924/19103 , H01L2924/00 , H01L2224/05599
摘要: The specification describes an integrated passive device (IPD) that is formed on a silicon substrate covered with an oxide layer. Unwanted accumulated charge at the silicon/oxide interface are rendered immobile by creating trapping centers in the silicon surface. The trapping centers are produced by a polysilicon layer interposed between the silicon substrate and the oxide layer.
摘要翻译: 该说明书描述了形成在被氧化物层覆盖的硅衬底上的集成无源器件(IPD)。 在硅/氧化物界面处的不需要的积累电荷通过在硅表面中产生捕获中心而被固定。 捕获中心由介于硅衬底和氧化物层之间的多晶硅层制成。
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公开(公告)号:US20060217102A1
公开(公告)日:2006-09-28
申请号:US11085977
申请日:2005-03-22
申请人: Yinon Degani , Yu Fan , Charley Gao , Kunquan Sun , Liguo Sun , King Tai
发明人: Yinon Degani , Yu Fan , Charley Gao , Kunquan Sun , Liguo Sun , King Tai
IPC分类号: H04B1/28
CPC分类号: H01L27/016
摘要: The specification describes an integrated passive device (IPD) designed to allow implementation of cellular RF and Wi-Fi RF in a single hand held device. To address the problem of RF interference a thin film RF high rejection bandpass filter is formed in an IPD implementation. The IPD implementation preferably uses silicon as the substrate material. This allows the thin film RF high rejection bandpass filter to be made using silicon processing technology, and thus produce low cost filters that still meet stringent performance requirements demanded due to the co-existing RF units. In preferred embodiments of the invention, wafer level processing using silicon substrates adds to the cost effective manufacture of the highly functional IPDs.
摘要翻译: 该规范描述了一种集成无源设备(IPD),设计用于在单个手持设备中实现蜂窝RF和Wi-Fi RF。 为了解决RF干扰的问题,在IPD实现中形成了薄膜RF高阻抗带通滤波器。 IPD实施优选使用硅作为基底材料。 这允许使用硅处理技术制造薄膜RF高阻抗带通滤波器,并因此产生仍然满足由于共存的RF单元要求的严格性能要求的低成本滤波器。 在本发明的优选实施例中,使用硅衬底的晶片级处理增加了高性能IPD的成本有效的制造。
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公开(公告)号:US20080061405A1
公开(公告)日:2008-03-13
申请号:US11980062
申请日:2007-10-30
申请人: Yinon Degani , Yu Fan , Charley Gao , Kunguan Sun , Liguo Sun
发明人: Yinon Degani , Yu Fan , Charley Gao , Kunguan Sun , Liguo Sun
IPC分类号: H01L23/552
CPC分类号: H01L23/552 , H01L23/5225 , H01L23/66 , H01L2223/6622 , H01L2224/16 , H01L2924/00011 , H01L2924/00014 , H01L2924/01079 , H01L2924/1461 , H01L2924/19011 , H01L2924/19103 , H01L2924/3025 , H01L2924/00 , H01L2224/0401
摘要: The specification describes a thin film Integrated Passive Device (IPD) design that achieves isolation between conductive runners by shielding the top and bottom regions of a noisy runner with metal shield plates. The shield plates are derived from metal interconnect layers. The invention can be implemented by merely modifying the mask pattern for the metal interconnect layers. No added elements or steps are needed to fabricate the IPDs. The invention is suitable for use in Multi-Chip Modules (MCMs) or other arrangements where digital circuits and RF circuits are in close proximity.
摘要翻译: 该规范描述了一种薄膜集成无源器件(IPD)设计,通过屏蔽带有金属屏蔽板的噪声转轮的顶部和底部区域来实现导电流道之间的隔离。 屏蔽板衍生自金属互连层。 本发明可以通过仅修改金属互连层的掩模图案来实现。 不需要添加元素或步骤来制造IPD。 本发明适用于数字电路和RF电路非常接近的多芯片模块(MCM)或其他布置。
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公开(公告)号:US20060255434A1
公开(公告)日:2006-11-16
申请号:US11127889
申请日:2005-05-12
申请人: Yinon Degani , Yu Fan , Charley Gao , Kunguan Sun , Liguo Sun
发明人: Yinon Degani , Yu Fan , Charley Gao , Kunguan Sun , Liguo Sun
IPC分类号: H01L23/552
CPC分类号: H01L23/552 , H01L23/5225 , H01L23/66 , H01L2223/6622 , H01L2224/16 , H01L2924/00011 , H01L2924/00014 , H01L2924/01079 , H01L2924/1461 , H01L2924/19011 , H01L2924/19103 , H01L2924/3025 , H01L2924/00 , H01L2224/0401
摘要: The specification describes a thin film Integrated Passive Device (IPD) design that achieves isolation between conductive runners by shielding the top and bottom regions of a noisy runner with metal shielding plates. The shielding plates are derived from metal interconnect layers. The invention can be implemented by merely modifying the mask pattern for the metal interconnect layers. No added elements or steps are needed to fabricate the IPDs. The invention is suitable for use in Multi-Chip Modules (MCMs) or other arrangements where digital circuits and RF circuits are in close proximity.
摘要翻译: 该规范描述了薄膜集成无源器件(IPD)设计,通过屏蔽带有金属屏蔽板的噪声转轮的顶部和底部区域来实现导电流道之间的隔离。 屏蔽板衍生自金属互连层。 本发明可以通过仅修改金属互连层的掩模图案来实现。 不需要添加元素或步骤来制造IPD。 本发明适用于数字电路和RF电路非常接近的多芯片模块(MCM)或其他布置。
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公开(公告)号:US20050253257A1
公开(公告)日:2005-11-17
申请号:US11030754
申请日:2005-01-06
申请人: Anthony Chiu , Yinon Degani , Charley Gao , Kunquan Sun , Liquo Sun
发明人: Anthony Chiu , Yinon Degani , Charley Gao , Kunquan Sun , Liquo Sun
IPC分类号: H01L27/04 , H01L21/00 , H01L21/02 , H01L21/822 , H01L21/8242 , H01L23/34 , H01L27/01
CPC分类号: H01L25/16 , H01L23/49816 , H01L23/49822 , H01L23/49833 , H01L23/645 , H01L23/66 , H01L24/16 , H01L24/48 , H01L24/73 , H01L27/016 , H01L28/10 , H01L28/20 , H01L28/40 , H01L2224/16145 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/73204 , H01L2224/73265 , H01L2225/06513 , H01L2924/00014 , H01L2924/01078 , H01L2924/01079 , H01L2924/10253 , H01L2924/13091 , H01L2924/14 , H01L2924/1461 , H01L2924/15311 , H01L2924/19011 , H01L2924/19015 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19103 , H01L2924/30105 , H01L2924/30107 , H01L2924/00 , H01L2224/48237 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要: The specification describes a multi-chip module (MCM) that contains an integrated passive device (IPD) as the carrier substrate (IPD MCM). Parasitic electrical interactions are controlled at one or both interfaces of the IPD either by eliminating metal from the interfaces, or by selective use of metal in parts of the MCM that are remote from the sensitive device components. The sensitive device components are primarily analog circuit components, especially RF inductor elements. In the IPD layout, the sensitive components are segregated from other components. This allows implementation of the selective metal approach. It also allows parasitic interactions on top of the IPD substrate to be reduced by selective placement of IC semiconductor chips and IC chip ground planes. In preferred embodiments of the IPD MCM of the invention, the IPD substrate is polysilicon, to further minimize RF interactions. The various methods of assembling the module may be adapted to keep the overall thickness within 1.0 mm.
摘要翻译: 该规范描述了一种包含集成无源器件(IPD)作为载体衬底(IPD MCM)的多芯片模块(MCM)。 通过从接口中消除金属,或通过选择性地使用远离敏感器件部件的MCM部分中的金属,在IPD的一个或两个接口处控制寄生电学相互作用。 敏感器件组件主要是模拟电路组件,特别是RF电感元件。 在IPD布局中,敏感组件与其他组件隔离。 这允许实施选择性金属方法。 它还允许通过IC半导体芯片和IC芯片接地层的选择性放置来减少IPD衬底顶部的寄生相互作用。 在本发明的IPD MCM的优选实施方案中,IPD衬底是多晶硅,以进一步最小化RF相互作用。 组装模块的各种方法可以适于将总体厚度保持在1.0mm内。
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公开(公告)号:US20050088194A1
公开(公告)日:2005-04-28
申请号:US10997629
申请日:2004-11-24
申请人: Yinon Degani , Charley Gao , King Tai
发明人: Yinon Degani , Charley Gao , King Tai
CPC分类号: G01R1/0735
摘要: The specification describes a flexible membrane test apparatus and test method for high-speed IC chips. The method and apparatus rely on locating the reference components of the test circuit very close to the contact pads of the IC chip under test. This is achieved in one embodiment by locating those components adjacent to the flexible membrane. In another embodiment, the reference components may be attached to the membrane itself, so the length of the runners connecting the contact points of the tester and the critical reference components is optimally reduced. In yet a further embodiment, the entire test circuit, in the form of an IC test chip, is located on the membrane.
摘要翻译: 该说明书描述了用于高速IC芯片的柔性膜测试装置和测试方法。 该方法和装置依赖于将测试电路的参考部件定位得非常靠近被测IC芯片的接触焊盘。 这在一个实施例中通过将这些部件定位在与柔性膜相邻的位置来实现。 在另一个实施例中,参考部件可以附接到膜本身,因此连接测试器的接触点和关键参考部件的流道的长度被最佳地减小。 在又一个实施例中,以IC测试芯片的形式的整个测试电路位于膜上。
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公开(公告)号:US20060197182A1
公开(公告)日:2006-09-07
申请号:US11411307
申请日:2006-04-26
申请人: Yinon Degani , Charley Gao , Huainan Ma , King Tai
发明人: Yinon Degani , Charley Gao , Huainan Ma , King Tai
IPC分类号: H01L29/00
CPC分类号: H01L23/66 , H01L2224/16 , H01L2924/00014 , H01L2924/01078 , H01L2924/01087 , H01L2924/10253 , H01L2924/3011 , H01L2924/00 , H01L2224/0401
摘要: The specification describes a silicon-on-silicon interconnection arrangement to implement high performance RF impedance matching using off-chip passive components. The RF sections of the system are dis-integrated into separate RF functional chips, and the functional chips are flip-chip mounted on a high resistivity silicon intermediate interconnect substrate (SIIS). The passive devices for the impedance matching networks are built into the high resistivity SIIS using thin-film technology.
摘要翻译: 该规范描述了硅上硅互连装置,以使用片外无源部件实现高性能RF阻抗匹配。 系统的RF部分被分离成单独的RF功能芯片,并且将功能芯片倒装芯片安装在高电阻率硅中间互连基板(SIIS)上。 阻抗匹配网络的无源器件使用薄膜技术构建在高电阻率SIIS中。
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