摘要:
A manufacturing method of a thin film transistor array panel includes forming a gate line including a gate electrode on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming a data line including a data conductive layer pattern on the semiconductor layer and crossing the gate line; forming a planarization layer on the data conductive layer pattern; dry-etching the planarization layer to expose a portion of the data conductive layer pattern overlapping the gate electrode; wet-etching the exposed data conductive layer pattern; and exposing a portion of the semiconductor layer overlapping the gate electrode.
摘要:
A thin film transistor including a gate electrode, a semiconductor layer, a gate insulating layer, a source electrode, a drain electrode and a graphene pattern. The semiconductor layer overlaps with the gate electrode. The gate insulating layer is disposed between the gate electrode and the semiconductor layer. The source electrode overlaps with the semiconductor layer. The drain electrode overlaps with the semiconductor layer. The drain electrode is spaced apart from the source electrode. The graphene pattern is disposed between the semiconductor layer and at least one of the source electrode and the drain electrode.
摘要:
A display apparatus includes a thin film transistor substrate, a substrate facing the thin film transistor substrate, and a liquid crystal layer. The thin film transistor substrate includes an insulating substrate, a gate electrode disposed on a surface of the insulating substrate, a gate insulating layer covering the gate electrode, a semiconductor layer disposed on the gate insulating layer, a source electrode disposed on the semiconductor layer, and a drain electrode disposed on the semiconductor layer and spaced apart from the source electrode. One of the source electrode and the drain electrode is spaced apart from the gate electrode in a plan view. The gate electrode includes a side surface inclined with respect to the surface of the insulating substrate and is partially overlapped with a portion of the source electrode or the drain electrode in a direction perpendicular to the side surface of the gate electrode.
摘要:
A thin film transistor array panel and a manufacturing method capable of forming an insulating layer made of different materials for a portion contacting an oxide semiconductor and a second portion without an additional process. The thin film transistor array panel includes: a gate electrode; a source electrode and a drain electrode spaced apart from each other, each of the source and drain electrodes comprising a lower layer and an upper layer; an insulating layer disposed between the gate electrode and the source and drain electrodes; a semiconductor, the source electrode and the drain electrode being electrically connected to the semiconductor; a first passivation layer contacting the lower layer of the source and drain electrodes but not contacting the upper layer of the source and drain electrodes; and a second passivation layer disposed on the upper layer of the source and drain electrodes. The first passivation layer may be made of silicon oxide, and the second passivation may be made of silicon nitride.
摘要:
Provided is a thin film transistor array panel. A thin film transistor array panel according to an exemplary embodiment includes a gate wire having a first region where the gate line is disposed, and a second region where the gate electrode is disposed, and a thickness of the gate wire formed in the first region is greater than the thickness of the gate wire that is formed in the second region.
摘要:
A thin film transistor array panel is provided that includes: a gate electrode that is disposed on an insulating substrate; a gate insulating layer that is disposed on the gate electrode; an oxide semiconductor that is disposed on the gate insulating layer; a blocking layer that is disposed on the oxide semiconductor; a source electrode and a drain electrode that are disposed on the blocking layer; a passivation layer that is disposed on the source electrode and drain electrode; and a pixel electrode that is disposed on the passivation layer. The blocking layer includes a first portion that is covered by the source electrode and drain electrode and a second portion that is not covered by the source electrode and drain electrode, and the first portion and the second portion include different materials.
摘要:
A liquid crystal display capable of reducing the stray capacitance of a non-display region and a method of manufacturing the same. The liquid crystal display includes a first substrate, gate lines and data lines intersecting each other on the first substrate to define pixels, a second substrate arranged opposite to the first substrate, a common electrode formed in a display area of the second substrate in which an image is displayed, and a floating electrode formed in a non-display region of the second substrate in which no image is displayed.
摘要:
A thin film transistor array panel including a substrate; a display area signal line; a display area thin film transistor; a peripheral area signal line; a black matrix disposed on the display area signal line, the display area thin film transistor, and the peripheral area signal line, the black matrix including a first and a second contact holes exposing the peripheral area signal line; a protrusion member disposed on the peripheral area signal line, the protrusion member overlapping the peripheral area signal line; a transparent connector disposed on the black matrix and within the peripheral area, wherein the transparent connector contacts the peripheral area signal line through at least one of the first and the second contact holes and includes a protrusion within at least one of the first and the second contact holes which corresponds to the protrusion member; and a pixel electrode.