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1.MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION 有权
标题翻译: HARDMASK组合物的单体,包括单体的HARDMASK组合物和使用HARDMASK组合物的图案形成方法公开(公告)号:US20150008212A1
公开(公告)日:2015-01-08
申请号:US14365751
申请日:2012-11-21
申请人: Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
发明人: Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
CPC分类号: C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
摘要翻译: 公开了由化学式1表示的硬掩模组合物的单体,包含单体的硬掩模组合物和形成图案的方法。
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2.Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition 有权
标题翻译: 用于硬掩模组合物的单体,包括单体的硬掩模组合,以及使用硬掩模组合物的图案形成方法公开(公告)号:US09359276B2
公开(公告)日:2016-06-07
申请号:US14365751
申请日:2012-11-21
申请人: Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
发明人: Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
IPC分类号: C07C39/14 , C07C39/12 , G03F7/11 , G03F7/09 , G03F7/004 , G03F7/075 , G03F7/30 , G03F7/36 , B05D1/00 , B05D3/00 , B05D3/02 , B05D3/06 , C09D173/00
CPC分类号: C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
摘要翻译: 公开了由化学式1表示的硬掩模组合物的单体,包含单体的硬掩模组合物和形成图案的方法。
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公开(公告)号:US10345706B2
公开(公告)日:2019-07-09
申请号:US14258489
申请日:2014-04-22
申请人: Hyun-Ji Song , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Yoo-Jeong Choi , Seung-Hee Hong
发明人: Hyun-Ji Song , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Yoo-Jeong Choi , Seung-Hee Hong
IPC分类号: G03F7/40 , G03F7/38 , G03F7/36 , G03F7/30 , G03F7/09 , G03F7/11 , C07C39/12 , C07C323/19 , C07C217/58 , C07C22/04 , C07C255/53 , C07C39/225 , C07D215/14 , C07D333/16 , C07D333/50 , C07D311/58
摘要: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
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公开(公告)号:US09665003B2
公开(公告)日:2017-05-30
申请号:US14263323
申请日:2014-04-28
申请人: Yoo-Jeong Choi , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Hyun-Ji Song , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Seung-Hee Hong
发明人: Yoo-Jeong Choi , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Hyun-Ji Song , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Seung-Hee Hong
摘要: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
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5.Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns 有权
标题翻译: 硬掩模组成和形成图案的方法和包括图案的半导体集成电路器件公开(公告)号:US08952373B2
公开(公告)日:2015-02-10
申请号:US14037722
申请日:2013-09-26
申请人: Yoo-Jeong Choi , Yun-Jun Kim , Joon-Young Moon , Bum-Jin Lee , Chung-Heon Lee , Youn-Jin Cho
发明人: Yoo-Jeong Choi , Yun-Jun Kim , Joon-Young Moon , Bum-Jin Lee , Chung-Heon Lee , Youn-Jin Cho
IPC分类号: H01L21/47 , H01L23/00 , G03F7/11 , H01L21/02 , H01L21/027 , H01L21/033
CPC分类号: H01L23/564 , H01L21/02118 , H01L21/02282 , H01L21/0271 , H01L21/0332 , H01L2924/0002 , H01L2924/00
摘要: A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer,
摘要翻译: 硬掩模组合物包括由以下化学式1表示的单体和含芳环的聚合物,
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6.Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern 有权
标题翻译: 硬掩模组成,使用其形成图案的方法,以及包括图案的半导体集成电路器件公开(公告)号:US08741539B2
公开(公告)日:2014-06-03
申请号:US13241332
申请日:2011-09-23
申请人: Seung-Bae Oh , Hwan-Sung Cheon , Sung-Wook Cho , Min-Soo Kim , Jee-Yun Song , Yoo-Jeong Choi
发明人: Seung-Bae Oh , Hwan-Sung Cheon , Sung-Wook Cho , Min-Soo Kim , Jee-Yun Song , Yoo-Jeong Choi
CPC分类号: H01L21/31144 , G03F7/094 , H01L21/02112 , H01L21/0332
摘要: A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1:
摘要翻译: 硬掩模组合物,形成图案的方法和半导体集成电路器件,所述硬掩模组合物包括溶剂; 和化合物,所述化合物包括由以下化学式1表示的结构单元:
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7.Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns 有权
标题翻译: 包含芳香族环化合物的硬掩模组合物,形成图案的方法,以及包括图案的半导体集成电路器件公开(公告)号:US09018776B2
公开(公告)日:2015-04-28
申请号:US13241479
申请日:2011-09-23
申请人: Jee-Yun Song , Min-Soo Kim , Hwan-Sung Cheon , Seung-Bae Oh , Yoo-Jeong Choi
发明人: Jee-Yun Song , Min-Soo Kim , Hwan-Sung Cheon , Seung-Bae Oh , Yoo-Jeong Choi
IPC分类号: H01L23/498 , H01L21/308 , C09D7/12 , H01L21/311 , H01L21/02 , H01L21/027 , G03F7/09
CPC分类号: H01L21/31144 , G03F7/094 , H01L21/02118 , H01L21/02282 , H01L21/0271
摘要: A hard mask composition includes a solvent and an aromatic ring-containing compound represented by the following Chemical Formula 1:
摘要翻译: 硬掩模组合物包括溶剂和由以下化学式1表示的含芳环的化合物:
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8.HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN 有权
标题翻译: HARDMASK组合物,使用其的图案的形成方法和包括图案的半导体集成电路装置公开(公告)号:US20120153424A1
公开(公告)日:2012-06-21
申请号:US13241332
申请日:2011-09-23
申请人: Seung-Bae OH , Hwan-Sung Cheon , Sung-Wook Cho , Min-Soo Kim , Jee-Yun Song , Yoo-Jeong Choi
发明人: Seung-Bae OH , Hwan-Sung Cheon , Sung-Wook Cho , Min-Soo Kim , Jee-Yun Song , Yoo-Jeong Choi
IPC分类号: H01L21/306 , H01L27/02 , C09D185/02
CPC分类号: H01L21/31144 , G03F7/094 , H01L21/02112 , H01L21/0332
摘要: A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1:
摘要翻译: 硬掩模组合物,形成图案的方法和半导体集成电路器件,所述硬掩模组合物包括溶剂; 和化合物,所述化合物包括由以下化学式1表示的结构单元:
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