公开(公告)号：US5759739A

公开(公告)日：1998-06-02

申请号：US635856

申请日：1996-04-22

申请人： Katsuya Takemura ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Minoru Shigemitsu ,  Ken'ichi Itoh

发明人： Katsuya Takemura ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Minoru Shigemitsu ,  Ken'ichi Itoh

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03C1/73

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/111

摘要： A resist composition comprising an alkali-soluble resin, typically a partially t-butoxycarbonylated polyhydroxystyrene, a p-butoxystyrene/t-butylacrylate copolymer or p-butoxystyrene/maleic anhydride copolymer as a dissolution inhibitor, and a iodonium or sulfonium salt as a photoacid generator is effective for forming a resist film which can be precisely and finely patterned using high energy radiation such as a KrF excimer laser.

摘要翻译： 抗蚀剂组合物，其包含碱溶性树脂，通常为部分叔丁氧基羰基化的聚羟基苯乙烯，作为溶解抑制剂的对丁氧基苯乙烯/叔丁基丙烯酸酯共聚物或对丁氧基苯乙烯/马来酸酐共聚物，以及作为光酸产生剂的碘鎓盐或锍盐 对于形成可以使用高能辐射如KrF准分子激光器精确和精细地图案化的抗蚀剂膜是有效的。

公开(公告)号：US5352564A

公开(公告)日：1994-10-04

申请号：US184171

申请日：1994-01-19

申请人： Yoshihumi Takeda ,  Toshinobu Ishihara ,  Ken'ichi Itoh ,  Kazumasa Maruyama

发明人： Yoshihumi Takeda ,  Toshinobu Ishihara ,  Ken'ichi Itoh ,  Kazumasa Maruyama

IPC分类号： G03F7/039 ,  G03F7/075 ,  G03C1/492

CPC分类号： G03F7/0758 ,  G03F7/039 ,  Y10S430/11

摘要： A resist composition comprising a base resin, an acid release agent, and a dissolution inhibitor is improved in sensitivity and resolution when the base resin is typically selected from poly-t-butoxystyrene/poly-hydroxystyrene, poly-t-butoxystyrene/poly-p-methoxymethoxystyrene/polyhydroxystyrene, and poly-t-butoxystyrene/poly-p-methoxystyrene/polyhydroxystyrene copolymers. The composition forms a resist useful for the manufacture of LSI.

摘要翻译： 当基础树脂通常选自聚 - 丁氧基苯乙烯/聚 - 羟基苯乙烯，聚-t-丁氧基苯乙烯/多聚磷酸酯时，包含基础树脂，酸脱模剂和溶解抑制剂的抗蚀剂组合物的灵敏度和分辨率提高 聚甲氧基苯乙烯/聚羟基苯乙烯和聚-t-丁氧基苯乙烯/聚对甲氧基苯乙烯/聚羟基苯乙烯共聚物。 该组合物形成用于制造LSI的抗蚀剂。

公开(公告)号：US5691112A

公开(公告)日：1997-11-25

申请号：US762861

申请日：1996-12-10

申请人： Satoshi Watanabe ,  Youichi Ohsawa ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Junji Shimada ,  Fujio Yagihashi ,  Katsuya Takemura

发明人： Satoshi Watanabe ,  Youichi Ohsawa ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Junji Shimada ,  Fujio Yagihashi ,  Katsuya Takemura

IPC分类号： C07C317/22 ,  C07C381/12 ,  G03F7/004

CPC分类号： G03F7/0045 ,  C07C317/22 ,  C07C381/12

摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.

摘要翻译： 三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。 它们由双（对叔丁氧基苯基）亚砜制备，也是新的。 含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于 使用精细图案化技术。

公开(公告)号：US5633409A

公开(公告)日：1997-05-27

申请号：US379986

申请日：1995-01-27

申请人： Satoshi Watanabe ,  Youichi Ohsawa ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Junji Shimada ,  Fujio Yagihashi ,  Katsuya Takemura

发明人： Satoshi Watanabe ,  Youichi Ohsawa ,  Toshinobu Ishihara ,  Kazumasa Maruyama ,  Yoshihumi Takeda ,  Junji Shimada ,  Fujio Yagihashi ,  Katsuya Takemura

IPC分类号： C07C317/22 ,  C07C381/12 ,  G03F7/004 ,  C07C319/00

CPC分类号： G03F7/0045 ,  C07C317/22 ,  C07C381/12

摘要： Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.

摘要翻译： 三氟甲磺酸和对甲苯磺酸双或三（对叔丁氧基苯基）锍盐是新颖的。 它们由双（对叔丁氧基苯基）亚砜制备，也是新的。 含有锍盐作为光酸发生剂的化学增幅正性抗蚀剂组合物对深紫外线，电子束和X射线高度敏感，可以用碱性水溶液显影形成图案，因此适用于 使用精细图案化技术。

公开(公告)号：US06312869B1

公开(公告)日：2001-11-06

申请号：US09592419

申请日：2000-06-12

申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

IPC分类号： G03F7039

CPC分类号： G03F7/039 ,  C08F8/00 ,  C08F2810/20 ,  C08F2810/30 ,  G03F7/0045 ,  Y10S430/106 ,  C08F112/14

摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

摘要翻译： 化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。 该组合物具有高碱溶性对比度，高灵敏度和高分辨率。

公开(公告)号：US4657991A

公开(公告)日：1987-04-14

申请号：US787328

申请日：1985-10-15

申请人： Minoru Takamizawa ,  Taishi Kobayashi ,  Toshinobu Ishihara ,  Yoshihumi Takeda ,  Akira Hayashida

发明人： Minoru Takamizawa ,  Taishi Kobayashi ,  Toshinobu Ishihara ,  Yoshihumi Takeda ,  Akira Hayashida

IPC分类号： C08L83/00 ,  C04B35/571 ,  C08G79/00 ,  C08L83/02 ,  C08L83/16 ,  D01F9/10 ,  C08F283/00

CPC分类号： C08G79/00 ,  C04B35/571 ,  C08L83/16

摘要： The precursor composition of silicon carbide fibers provided by the invention has greatly improved spinnability and can be spun at a very high spinning velocity to give a green filament which has a much larger tensile strength than those of conventional precursor materials and is capable of giving silicon carbide fibers having increased tensile strength by the infusibilization and calcination of the green filament of the composition under tension. The composition comprises from 80 to 99.9 parts by weight of a polycarbosilane polymer and from 20 to 0.01 part by weight of a silmethylene polymer having a degree of polymerization larger than the specified lower limit.

摘要翻译： 由本发明提供的碳化硅纤维的前体组合物大大提高了可纺性，并且可以以非常高的纺丝速度纺丝，得到具有比常规前体材料高的拉伸强度的绿色长丝，并且能够提供碳化硅 纤维通过在张力下的组合物的绿色细丝的不熔化和煅烧而具有增加的拉伸强度。 该组合物包含80-99.9重量份的聚碳硅烷聚合物和20至0.01重量份具有大于规定下限的聚合度的硅亚甲基聚合物。

公开(公告)号：US5942367A

公开(公告)日：1999-08-24

申请号：US839107

申请日：1997-04-23

申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

IPC分类号： C08F8/00 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  C08F8/00 ,  G03F7/0045 ,  C08F2810/20 ,  C08F2810/30 ,  Y10S430/106

摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

公开(公告)号：US5529888A

公开(公告)日：1996-06-25

申请号：US531328

申请日：1995-09-20

申请人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Yoshihumi Takeda ,  Katsuyuki Oikawa

发明人： Satoshi Watanabe ,  Toshinobu Ishihara ,  Yoshihumi Takeda ,  Katsuyuki Oikawa

IPC分类号： G03F7/11 ,  G03F7/039 ,  G03F7/09 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/091

摘要： A water-soluble composition comprising a water-soluble N-vinylpyrrolidone copolymer and a fluorinated organic acid in a weight ratio of from 20:80 to 70:30 is useful in forming a water-soluble overlying film on a chemically amplified resist layer. The overlying film functions as both an anti-reflective film and a protective film during resist pattern formation by photolithography.

摘要翻译： 包含重量比为20:80至70:30的水溶性N-乙烯基吡咯烷酮共聚物和氟化有机酸的水溶性组合物可用于在化学放大抗蚀剂层上形成水溶性覆盖膜。 在通过光刻的抗蚀剂图案形成期间，上覆膜既用作抗反射膜，又用作保护膜。

公开(公告)号：US5210058A

公开(公告)日：1993-05-11

申请号：US726578

申请日：1991-07-08

申请人： Yoshihumi Takeda ,  Akira Hayashida ,  Toshinobu Ishihara

发明人： Yoshihumi Takeda ,  Akira Hayashida ,  Toshinobu Ishihara

IPC分类号： C04B35/584 ,  C04B35/589 ,  C08G77/48 ,  C08G77/62

CPC分类号： C08G77/62 ,  C04B35/589

摘要： An organic silazane polymer is prepared by reacting ammonia gas with a mixture of a trihalosilane and a monohalosilane, for example, methyltrichlorosilane and trimethylchlorosilane in an organic solvent to form a silazane compound, and heating the silazane compound at 200 to 350.degree. C. for polymerization. By melting, shaping, infusibilizing, and firing the silazane polymer, there is obtained a ceramic material.

公开(公告)号：US06335141B1

公开(公告)日：2002-01-01

申请号：US09592423

申请日：2000-06-12

申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

IPC分类号： G03F7039

CPC分类号： G03F7/039 ,  C08F8/00 ,  C08F2810/20 ,  C08F2810/30 ,  G03F7/0045 ,  Y10S430/106 ,  C08F112/14

摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C—O—C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group ≡C—COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

摘要翻译： 化学放大正性抗蚀剂组合物包含（A）有机溶剂，（B）具有至少一个酸不稳定基团的聚合物形式的基础树脂，并且在分子内和/或具有交联基团的分子之间具有COC 连接，重均分子量为1,000〜500,000的聚合物，（C）光酸产生剂，（D）碱性化合物和（E）分子中具有= C-COOH基团的芳族化合物。 该组合物具有高碱溶性对比度，高灵敏度和高分辨率。