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公开(公告)号：US08144384B2
公开(公告)日：2012-03-27
申请号：US12734951
申请日：2008-12-04
IPC分类号： G02B26/00
CPC分类号： G02F1/05 , G02F1/0311 , G02F1/0516 , G02F2203/12 , G03H2210/22 , G03H2223/13 , G03H2225/55 , G11B7/0065 , G11B7/128
摘要： To provide a light controller allowing for an enhanced positional precision in assembly of a spatial light modulator and a random phase mask, and to provide a light controller adapted to prevent positional deviations between a spatial light modulator and a random phase mask against impacts or vibrations, allowing for an enhanced operational integrity, a light controller includes a substrate, a light modulation unit disposed on the substrate and configured for modulation of light, and a random phase mask stacked on the light modulation unit on an optical axis of the light modulation unit.
摘要翻译： 为了提供光控制器，其允许在空间光调制器和随机相位掩模的组装中提高位置精度，并且提供适于防止空间光调制器与随机相位掩模之间的位置偏差抵抗冲击或振动的光控制器， 允许增强的操作完整性，光控制器包括衬底，设置在衬底上并被配置用于调制光的调光单元和在光调制单元的光轴上堆叠在光调制单元上的随机相位掩模。
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公开(公告)号：US20110043890A1
公开(公告)日：2011-02-24
申请号：US12734951
申请日：2008-12-04
IPC分类号： G02B26/00
CPC分类号： G02F1/05 , G02F1/0311 , G02F1/0516 , G02F2203/12 , G03H2210/22 , G03H2223/13 , G03H2225/55 , G11B7/0065 , G11B7/128
摘要： To provide a light controller allowing for an enhanced positional precision in assembly of a spatial light modulator and a random phase mask, and to provide a light controller adapted to prevent positional deviations between a spatial light modulator and a random phase mask against impacts or vibrations, allowing for an enhanced operational integrity, a light controller includes a substrate, a light modulation unit disposed on the substrate and configured for modulation of light, and a random phase mask stacked on the light modulation unit on an optical axis of the light modulation unit.
摘要翻译： 为了提供光控制器，其允许在空间光调制器和随机相位掩模的组装中提高位置精度，并且提供适于防止空间光调制器与随机相位掩模之间的位置偏差抵抗冲击或振动的光控制器， 允许增强的操作完整性，光控制器包括衬底，设置在衬底上并被配置用于调制光的调光单元和在光调制单元的光轴上堆叠在光调制单元上的随机相位掩模。
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公开(公告)号：US10202924B2
公开(公告)日：2019-02-12
申请号：US14416355
申请日：2012-07-25
申请人： Shinichi Soejima , Akira Eiraku , Satoru Tanaka , Satoshi Yoshizaki , Kiyonori Takahashi , Yoshihiro Sakayanagi
发明人： Shinichi Soejima , Akira Eiraku , Satoru Tanaka , Satoshi Yoshizaki , Kiyonori Takahashi , Yoshihiro Sakayanagi
摘要： It is an object of the invention to enhance the possibility of realizing a required torque in a supercharging region where scavenging occurs in a control apparatus for a supercharged engine. In order to achieve this object, the control apparatus for the supercharged engine according to the invention determines an operation amount of an intake valve driving device from a target in-cylinder air amount that is calculated from a required torque, and determines an operation amount of a throttle from a target intake valve passing air amount that is obtained by adding an amount of air blowing through an interior of a cylinder to the target in-cylinder air amount.
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公开(公告)号：US10185903B2
公开(公告)日：2019-01-22
申请号：US15726339
申请日：2017-10-05
申请人： Hiroomi Motohashi , Satoru Tanaka
发明人： Hiroomi Motohashi , Satoru Tanaka
IPC分类号： G06K15/02
摘要： An image forming output control device includes a duplicate image information detector to receive instruction information from a processing execution control apparatus, compare image information included in a plurality of objects being unit images constituting the instruction information, and detect a plurality of duplicate image information objects, in which the image information is duplicate with each other, in the objects in which identification information for identifying the objects is different from each other; a drawing information generation controller to control a drawing information generator to generate drawing information according to the instruction information; and a drawing result storage unit to store drawing result information being a drawing result of the image information. The drawing information generation controller controls the drawing information generator to generate the drawing information with the drawing result information of the image information included in the duplicate image information objects detected with the duplicate image information detector.
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5.发明授权公开(公告)号：US09965707B2
公开(公告)日：2018-05-08
申请号：US15428119
申请日：2017-02-08
申请人： Satoru Tanaka
发明人： Satoru Tanaka
CPC分类号： G06K15/1868 , G06F3/1206 , G06F3/1242 , G06F3/1247 , G06F3/125
摘要： An image forming apparatus includes an engine including circuitry that expands first image data, converts the expanded first image data into second image data in a format printable by the image forming apparatus, adds a positioning element to the second image data, the positioning element to be used for correcting positions of a first image and a second image, and controls a mechanical system of the image forming apparatus to print the second image data.
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公开(公告)号：US08308870B2
公开(公告)日：2012-11-13
申请号：US12610599
申请日：2009-11-02
IPC分类号： B08B3/08
CPC分类号： H01L21/67051
摘要： Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a rinsing treatment, and a drying treatment with IPA, in order, on a wafer W while rotating wafer W, and includes a cleaning liquid supply device for supplying a cleaning liquid for cleaning the drain cup and the drain tube to the drain cup in a state where the cleaning liquid is not supplied to the wafer. Also, the apparatus further includes a control unit for controlling respective components of the cleaning apparatus. The control unit, after the cleaning treatment and then the rinsing treatment of wafer W, at the time when the drying treatment is performed by IPA, controls the cleaning liquid to be supplied to the drain cup.
摘要翻译： 公开了一种清洁装置和清洁方法，其可以在基板经受清洁处理之后收集化学液体而不降低生产量，并通过使用诸如IPA的干燥溶剂进行干燥。 所公开的清洁装置在旋转晶片W的同时在晶片W上进行化学液体清洗处理，漂洗处理和IPA干燥处理，并且包括用于提供用于清洁的清洁液的清洗液供给装置 排水杯和排水管排入排水杯，在清洗液未供给到晶片的状态下。 此外，该装置还包括用于控制清洁装置的各个部件的控制单元。 在通过IPA进行干燥处理之后，控制单元在进行清洁处理，然后进行晶片W的漂洗处理之后，控制向排水杯供给的清洗液。
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公开(公告)号：US08215944B2
公开(公告)日：2012-07-10
申请号：US12810557
申请日：2008-12-25
申请人： Yoshiaki Takaya , Yuji Hashima , Yoshihisa Hayashida , Hirosuke Kawaguchi , Satoru Tanaka , Akihiko Kanai , Kazuaki Uehara
发明人： Yoshiaki Takaya , Yuji Hashima , Yoshihisa Hayashida , Hirosuke Kawaguchi , Satoru Tanaka , Akihiko Kanai , Kazuaki Uehara
CPC分类号： B29C59/022 , B29C33/42 , B29C2035/0822 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.
摘要翻译： 本发明提供能够均匀地在模具和成型体之间施加压力并且可以以快速的速度增加和降低温度的压印装置和压印方法。 压印装置用于将模具上的图案转印到薄膜成型对象上，并且包括用于保持模具的台，与成型对象一起构成加压室的加压室壳体，密封装置将气密密封 所述加压室壳体和所述成型体，用于打开和关闭所述加压室壳体与所述成型体之间的空间的开闭装置，调节所述加压室内的大气压的加压单元， 或模具和模制对象两者以及脱气装置，其消除了存在于模具和模制对象之间的任何气体。
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公开(公告)号：US20120130070A1
公开(公告)日：2012-05-24
申请号：US13354881
申请日：2012-01-20
IPC分类号： C07D471/04
CPC分类号： C07D231/12 , C07D231/14 , C07D233/64 , C07D249/08 , C07D401/04 , C07D401/14 , C07D403/04 , C07D407/04 , C07D413/04 , C07D417/04 , C07D471/04 , C07D487/04
摘要： This invention provides a compound of the formula (I): a pharmaceutically acceptable salt or solvate thereof, wherein R1 is substituted or unsubstituted alkyl or the like, R2 is hydrogen or substituted or unsubstituted alkyl, Ring A is monocyclic or bicyclic aromatic heterocycle, R3 is substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl or substituted or unsubstituted heterocycle, R4 is halogen, cyano, substituted or unsubstituted alkyl, substituted or unsubstituted cycloalkyl or the like, m is an integer between 0 and 2, n is an integer between 0 and 5, R is halogen, oxo, cyano, nitro, substituted or unsubstituted alkyl or the like, and p is an integer between 0 and 2 as novel compounds having NPY Y5 antagonistic activity.
摘要翻译： 本发明提供式（I）化合物：其药学上可接受的盐或溶剂合物，其中R 1为取代或未取代的烷基等，R 2为氢或取代或未取代的烷基，环A为单环或双环芳族杂环，R 3 取代或未取代的芳基，取代或未取代的杂芳基或取代或未取代的杂环，R4为卤素，氰基，取代或未取代的烷基，取代或未取代的环烷基等，m为0至2之间的整数，n为0 和5，R是卤素，氧代，氰基，硝基，取代或未取代的烷基等，p是0和2之间的整数，作为具有NPY Y5拮抗活性的新化合物。
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公开(公告)号：US08164410B2
公开(公告)日：2012-04-24
申请号：US12596296
申请日：2008-04-16
申请人： Satoru Tanaka , Takeshi Tachibana
发明人： Satoru Tanaka , Takeshi Tachibana
CPC分类号： C04B35/265 , C04B2235/3208 , C04B2235/3239 , C04B2235/3263 , C04B2235/3275 , C04B2235/3279 , C04B2235/3281 , C04B2235/3284 , C04B2235/3293 , C04B2235/3298 , C04B2235/5409 , C04B2235/72 , C04B2235/724 , C04B2235/726 , C04B2235/727 , C04B2235/785 , C04B2235/786 , H01F1/344 , H01F17/0013 , H01F17/04 , H01F2017/0066
摘要： A low-loss ferrite comprising as main components 46.5-49.5% by mol of Fe2O3, 17-26% by mol of ZnO, 4-12% by mol of CuO, and 0.2% or more and less than 1.2% by mol of CoO, the balance being NiO, and 0.03-1.4% by mass (as SnO2) of Sn based on 100% by mass of the main components, and having an average crystal grain size of 0.7-2.5 μm, and an electronic device obtained by integrally sintering pluralities of layers of this low-loss ferrite and coil-shaped electrodes formed in the laminate.
摘要翻译： 一种低损耗铁氧体，其主要成分为Fe2O3为46.5〜49.5摩尔％，ZnO为17-26摩尔％，CuO为4-12摩尔％，CoO为0.2摩尔％以上且小于1.2摩尔％ ，余量为NiO，相对于主成分为100质量％，Sn为0.03〜1.4质量％（SnO 2），平均结晶粒径为0.7〜2.5μm，电子器件通过一体化 烧结层叠体中形成的这种低损耗铁氧体和线圈状电极的多层。
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公开(公告)号：US08137478B2
公开(公告)日：2012-03-20
申请号：US12857973
申请日：2010-08-17
申请人： Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
发明人： Kenji Sekiguchi , Noritaka Uchida , Satoru Tanaka , Hiroki Ohno
CPC分类号： H01L21/67051 , B08B3/02 , B08B3/024 , B08B3/04 , H01L21/6708 , Y10S134/902
摘要： A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next, a second fluid which is more volatile than the process liquid is supplied to the upper surface of the substrate (W) from the fluid nozzle (12), while the wafer (W) is being rotated. During this supply operation, a supply position (Sf) of the second fluid to the substrate (W) is moved radially outward from a rotational center (Po) of the substrate (W). As a result, it is possible to prevent the generation of particles on the substrate (W) after it is dried by using the first and second fluids.
摘要翻译： 使用诸如去离子水的工艺液体处理衬底（W）。 然后，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第一流体，形成液膜。 接下来，在晶片（W）旋转的同时，从流体喷嘴（12）向基板（W）的上表面供给比处理液更易挥发的第二流体。 在该供给动作中，第二流体与基板（W）的供给位置（Sf）从基板（W）的旋转中心（Po）向径向外侧移动。 结果，可以防止在通过使用第一和第二流体干燥基板（W）之后产生颗粒。
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