摘要:
A specimen or substrate cutting method of cutting or processing a predetermined portion of a specimen or substrate in a direction of depth thereof by generating a focused charged particle beam from a particle beam source and irradiating the predetermined portion of the specimen or substrate with the focused charged particle beam is disclosed in which a particle species of the charged particle beam is selected such that each of the melting point of the particle species itself and the melting point of an alloy or compound of the particle species and constituent atoms of the specimen or substrate is not lower than 3/2 times of the temperature of the specimen or substrate in units of absolute temperature. A secondary ion mass-spectroscopic analysis method is also disclosed in which the charged particle beam is used as a probe to mass-analyze secondary charged ion successively generated from the cut portion of the specimen or substrate.
摘要:
A treatment and observation apparatus using a scanning probe observes a desired area of a sample, forms a first image, magnifies a part of the area to be observed of the sample to observe it, forms a second image, and relates addresses of pixels constituting the first image and addresses of pixels constituting the second image to absolute addresses on the sample. The pixels constituting the images correspond to the addresses on the sample, respectively, and accordingly the second image can be used to designate the area to be treated with the resolution of the second image. In another embodiment, a desired area of the sample is observed with the maximum magnification and its image data are stored. The image data are compressed and displayed on a display screen of the observed area. The stored image data are read out freely with reference to the display picture to form a display picture for designating the area to be treated.
摘要:
In an ion-beam machining method and apparatus of effecting sputtering by deflecting a focused ion beam and scanning it on a material surface, the relationship between the diameter d of the beam on the material surface and the height h of a stepped portion formed by each beam scan is changed from h.gtoreq.d to h
摘要:
A method for device transplantation includes the conveyance of a microminiature device, which has been premanufactured, to a desired place located on a sample, observation and fabrication of the new device with a focused beam, and repair of passive elements or active elements located on the sample. Additionally, the new microminiature devices may be transplanted based on the observed results.
摘要:
A charged particle beam apparatus is provided with an aperture device which includes a plurality of slit plates. Each of the slit plates includes a plurality of slits having different widths. The slit plates are superimposed in a direction of the axis of a charged particle beam so that the corresponding slits in the slit plates overlap to define an aperture which controls a beam current.
摘要:
Provided is a gas field ionization ion source capable of emitting heavy ions with high brightness which are suitable for processing a sample. The gas field ionization ion source according to the present invention includes a temperature controller individually controlling the temperature of the tip end of an emitter electrode (1) and the temperature of a gas injection port part (3) of a gas supply unit.
摘要:
A functional sheet is brought into intimate contact with a front surface of a plasma display panel, and the functional sheet has a structure in which heat diffusion is superior to heat insulation between the plasma display panel and outside air. In addition, a display device includes a controller for controlling a drive voltage pulse train so that power consumption in a unit area in a light emission region within the screen is limited under a set value when one image is displayed.
摘要:
A display panel device includes a front sheet that is glued on a front face of a plasma display panel. The front sheet includes a mesh made of a light shield member that has a blackened front surface and a plane size larger than a screen. A length between diagonal lattice points of the mesh is shorter than a cell pitch that is longer one of the cell pitches in the vertical direction and the horizontal direction of the screen. An arrangement direction of the mesh is inclined with respect to an arrangement direction of the cells in the screen.
摘要:
A display panel module includes a display panel and a function film adhered onto the front surface of the display panel. The function film includes at least one transparent substrate and an adhesive layer which adheres the display panel and the function film together. A thickness of the at least one transparent substrate and a thickness of the adhesive layer have a predetermined relation so as to substantially prevent occurrence of a concave portion with a depth greater than 3 um on the front surface of the function film, wherein a scratch resistance of the function film is improved.
摘要:
A plasma display panel is provided in which discharge connection in the column direction is prevented without increasing the number of man-hours in a formation process of a partition and without deteriorating ventilation for an exhaust process. A pattern in a plan view of a partition is made a mesh pattern in which vertical patterns are included at inter-row positions in each column. Each of first vertical walls is positioned at a boundary between columns, each of second vertical walls is arranged at a position away from a boundary between columns for each boundary between rows and each of horizontal walls is positioned at a boundary between rows. In the partition, a height of portions where the first vertical wall crosses the horizontal wall and a height of portions where the second vertical wall crosses the horizontal wall are smaller than a height of the other portions of the partition.