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    POLYGLYCOLIC ACID-BASED FIBERS AND METHOD FOR PRODUCING SAME
    3.
    发明申请
    POLYGLYCOLIC ACID-BASED FIBERS AND METHOD FOR PRODUCING SAME 审中-公开
    基于聚甘油酸的纤维及其生产方法

    公开(公告)号：US20120130024A1

    公开(公告)日：2012-05-24

    申请号：US13388762

    申请日：2010-07-14

    申请人： Hiroyuki Sato ,  Masahiro Yamazaki ,  Ryo Kato ,  Kotaku Saigusa

    发明人： Hiroyuki Sato ,  Masahiro Yamazaki ,  Ryo Kato ,  Kotaku Saigusa

    IPC分类号： D01F6/92 ,  C08L67/04 ,  B29C47/00

    CPC分类号： D01F6/625 ,  D01F6/92 ,  D02J1/228

    摘要： A method for producing a polyglycolic acid-based fiber, includes a spinning process of obtaining undrawn yarns by melt spinning a polyglycolic acid-based resin composition, which comprises a polyglycolic acid resin and a polylactic acid resin having a weight average molecular weight of 10×104 to 30×104 in a mass ratio of the polyglycolic acid resin to the polylactic acid resin of 70/30 to 99/1. The method also includes a keeping process of keeping the undrawn yarns and a drawing process of obtaining drawn yarns by drawing the kept undrawn yarns.

    摘要翻译： 聚乙醇酸系纤维的制造方法包括使聚乙醇酸系树脂组合物熔融纺丝得到未拉伸丝的纺丝方法，所述聚乙醇酸系树脂组合物含有聚乙醇酸树脂和重均分子量为10×10的聚乳酸树脂 聚乙醇酸树脂与聚乳酸树脂的质量比为70〜30〜99/1的比例为104〜30×104。 该方法还包括保持未拉伸纱线的保持过程和通过拉伸保持的未拉伸纱线来获得拉伸纱线的拉伸过程。

    Chlorine Dioxide-Generating Product and Method for Generating Chlorine Dioxide
    8.
    发明申请
    Chlorine Dioxide-Generating Product and Method for Generating Chlorine Dioxide 有权
    二氧化氯生成产物和产生二氧化氯的方法

    公开(公告)号：US20140113007A1

    公开(公告)日：2014-04-24

    申请号：US14122554

    申请日：2012-05-30

    申请人： Ryo Kato ,  Kanefusa Hara ,  Masanori Yanagida

    发明人： Ryo Kato ,  Kanefusa Hara ,  Masanori Yanagida

    IPC分类号： A01N59/08 ,  C01B11/02

    CPC分类号： A01N59/08 ,  A01N59/00 ,  C01B11/024 ,  A01N25/08

    摘要： Provided is a chlorine dioxide-generating product comprising an inorganic porous carrier carrying a chlorite and an alkali agent. In the product, the alkali agent is carried in an amount of more than 0.7 molar equivalent and not more than 2 molar equivalents relative to the amount of the chlorite carried, and the product has a water content of 10% by weight or less. The chlorine dioxide-generating product can stably generate chlorine dioxide gas in an amount that sufficiently achieves deodorization, sterilization, virus removal, mold prevention, antisepsis, or the like of spatial environments, foods, or others but exerts no harmful effect on humans, over a long period of time.

    摘要翻译： 本发明提供了一种二氧化氯产生产物，其包含载有亚氯酸盐和碱剂的无机多孔载体。 在该产品中，相对于所携带的亚氯酸盐的量，碱剂的用量大于0.7摩尔当量且不大于2摩尔当量，并且该产品的含水量为10重量％以下。 产生二氧化氯的产品可以稳定地产生二氧化氯气体，其量足以实现空间环境，食品或其它物质的除臭，杀菌，病毒去除，防霉，防腐等，但不对人造成有害影响 很长一段时间。

    SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS
    9.
    发明申请
    SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS 有权
    基板保持装置，基板保持方法和基板处理装置

    公开(公告)号：US20120141246A1

    公开(公告)日：2012-06-07

    申请号：US13398216

    申请日：2012-02-16

    申请人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    发明人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    IPC分类号： H01L21/683

    CPC分类号： H01L21/67086 ,  H01L21/67051 ,  H01L21/687

    摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

    摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。