Pressure-sensitive adhesive sheet and method of processing articles
    1.
    发明申请
    Pressure-sensitive adhesive sheet and method of processing articles 审中-公开
    压敏粘合片和加工制品的方法

    公开(公告)号:US20070054469A1

    公开(公告)日:2007-03-08

    申请号:US11514454

    申请日:2006-09-01

    IPC分类号: H01L21/30

    摘要: To provide a pressure-sensitive adhesive sheet, which is used in processing an article such as a semiconductor wafer, the pressure-sensitive adhesive sheet has a base, an intermediate layer and a pressure-sensitive adhesive layer in this order, wherein the intermediate layer has an elastic modulus in tension at 23° C. of 10 MPa or more and 100 Mpa or less, the intermediate layer includes an acrylic-based polymer obtained by polymerization of a mixture containing 70 to 99 parts by weight of a (meth)acrylate monomer and 1 to 30 parts by weight of an unsaturated carboxylic acid based on 100 parts by weight of total monomers, and the base includes at least one film having an elastic modulus in tension at 23° C. of 0.6 GPa or more.

    摘要翻译: 为了提供用于加工诸如半导体晶片的物品的压敏粘合片,该压敏粘合片依次具有基底,中间层和压敏粘合剂层,其中中间层 在23℃下的拉伸弹性模量为10MPa以上至100Mpa以下,中间层包含通过聚合含有70〜99重量份的(甲基)丙烯酸酯的混合物而得到的丙烯酸系聚合物 单体和1〜30重量份的不饱和羧酸,基于100重量份的总单体,并且所述基材包括至少一种在23℃下的拉伸弹性模量为0.6GPa以上的膜。

    Pressure-sensitive adhesive sheet and method of processing articles
    5.
    发明申请
    Pressure-sensitive adhesive sheet and method of processing articles 审中-公开
    压敏粘合片和加工制品的方法

    公开(公告)号:US20070059903A1

    公开(公告)日:2007-03-15

    申请号:US11514504

    申请日:2006-09-01

    IPC分类号: H01L21/30

    摘要: To provide a pressure-sensitive adhesive that is used in processing an article such as a semiconductor wafer, the pressure-sensitive adhesive sheet is one that has a base, an intermediate layer and a pressure-sensitive adhesive layer in order, wherein the intermediate layer has an elastic modulus at elongation at 23° C. of 1 MPa or more and 100 MPa or less, the intermediate layer includes an acrylic polymer obtained by polymerization of a (meth) acrylic monomer mixture containing 1% by weight or more and 20% by weight or less of a nitrogen-containing acrylic monomer, the acrylic polymer containing 20% by weight or less of a polymer component having a molecular weight of 100,000 or less, and the base includes at least one film having an elastic modulus at in tension at 23° C. of 0.6 GPa or more.

    摘要翻译: 为了提供用于加工诸如半导体晶片的物品的压敏粘合剂,压敏粘合片是依次具有基底,中间层和压敏粘合剂层的粘合片,其中中间层 在23℃的伸长率下的弹性模量为1MPa以上至100MPa以下,中间层包含通过聚合含有1重量%以上且20重量%以上的(甲基)丙烯酸单体混合物而得到的丙烯酸类聚合物, 以下的含氮丙烯酸类单体,所述丙烯酸类聚合物含有20重量%以下的分子量为100,000以下的聚合物成分,所述基材包括至少一层在拉伸下具有弹性模量的膜 在23℃下为0.6GPa以上。

    METHOD OF EFFICIENTLY ESTABLISHING INDUCED PLURIPOTENT STEM CELLS
    8.
    发明申请
    METHOD OF EFFICIENTLY ESTABLISHING INDUCED PLURIPOTENT STEM CELLS 有权
    有效建立诱导型脑干细胞的方法

    公开(公告)号:US20130183759A1

    公开(公告)日:2013-07-18

    申请号:US13822906

    申请日:2011-09-14

    IPC分类号: C12N15/01

    摘要: The present invention provides a method of improving the efficiency of establishment of induced pluripotent stem (iPS) cells by inhibiting p38 function in the step of somatic cell nuclear reprogramming. The p38 function can be inhibited by bringing an inhibitor selected from the group consisting of (1) a chemical inhibitor of p38 (2) a dominant negative mutant of p38 or a nucleic acid that encodes the same, (3) a nucleic acid selected from the group consisting of siRNAs and shRNAs targeted to p38 and DNAs that encode the same and (4) an inhibitor of p38 pathway into contact with a somatic cell and the like. The present invention also provides an agent for improving the efficiency of establishment of induced pluripotent stem cells, which contains an inhibitor of p38 function, particularly an inhibitor selected from the group consisting of (1) a chemical inhibitor of p38 (2) a dominant negative mutant of p38 or a nucleic acid that encodes the same, (3) a nucleic acid selected from the group consisting of siRNAs and shRNAs targeted to p38 and DNAs that encode the same and (4) an inhibitor of p38 pathway. Moreover, the present invention provides a production method of iPS cells, which includes bringing a nuclear reprogramming substance and an inhibitor of p38 function into contact with a somatic cell.

    摘要翻译: 本发明提供了通过在体细胞核重编程步骤中抑制p38功能来提高诱导多能干细胞(iPS)细胞建立效率的方法。 可以通过使选自下述的抑制剂来抑制p38的功能:(1)p38的化学抑制剂(2)p38的显性失活突变体或其编码的核酸,(3)选自以下的核酸: 由针对p38的siRNA和shRNA组成的组和编码该p38的DNA和(4)p38途径的抑制剂与体细胞等接触的组。 本发明还提供了用于提高诱导多能干细胞的建立效率的试剂,其含有p38功能的抑制剂,特别是选自(1)p38(2)的显性阴性的化学抑制剂 p38的突变体或编码其的核酸,(3)选自靶向p38的siRNA和shRNA的核酸和编码其的DNA,以及(4)p38途径的抑制剂。 此外,本发明提供了iPS细胞的制备方法,其包括使核重编程物质和p38功能抑制剂与体细胞接触。

    Thermally strippable double faced adhesive sheet and method of working work piece
    9.
    发明申请
    Thermally strippable double faced adhesive sheet and method of working work piece 审中-公开
    可剥离双面胶粘剂片和加工工件的方法

    公开(公告)号:US20090288763A1

    公开(公告)日:2009-11-26

    申请号:US12311980

    申请日:2007-10-29

    IPC分类号: B32B38/10 B32B3/26

    摘要: A thermally strippable double faced adhesive sheet comprising a substrate, a thermally strippable pressure-sensitive adhesive layer (A) arranged on one side of the substrate, and a pressure-sensitive adhesive layer (B) arranged on the other side of the substrate, in which the substrate comprises a porous substrate. The porous substrate preferably has a density of 0.9 g/cm3 or less and a tensile elastic modulus of 20 MPa or less. The substrate may comprise a laminate of the porous substrate and a non-porous substrate. Exemplary usable adhesives for the pressure-sensitive adhesive layer (B) include pressure-sensitive adhesives, ultraviolet-curable pressure-sensitive adhesives, thermally strippable pressure-sensitive adhesives, thermoplastic pressure-sensitive adhesives, and thermosetting pressure-sensitive adhesives.

    摘要翻译: 一种可热剥离的双面粘合片,包括基材,布置在基材一侧的可热剥离的压敏粘合剂层(A)和布置在基材的另一侧上的压敏粘合剂层(B), 其中基底包括多孔基底。 多孔质基材的密度优选为0.9g / cm 3以下,拉伸弹性模量为20MPa以下。 基底可以包括多孔基底和非多孔基底的层压体。 用于粘合剂层(B)的示例性可用粘合剂包括压敏粘合剂,紫外线固化型压敏粘合剂,热剥离压敏粘合剂,热塑性压敏粘合剂和热固性压敏粘合剂。

    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    10.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20080099788A1

    公开(公告)日:2008-05-01

    申请号:US11933195

    申请日:2007-10-31

    IPC分类号: H01L29/737 H01L21/331

    摘要: The external base electrode has a two-layered structure where a p-type polysilicon film doped with a medium concentration of boron is laminated on a p-type polysilicon film doped with a high concentration of boron. Therefore, since the p-type polysilicon film doped with a high concentration of boron is in contact with an intrinsic base layer at a junction portion between the external base electrode and the intrinsic base layer, the resistance of the junction portion can be reduced. In addition, since the resistance of the external base electrode becomes a parallel resistance of the two layers of the p-type polysilicon films, the resistance of the p-type polysilicon film whose boron concentration is relatively lower is dominant.

    摘要翻译: 外部基极具有两层结构,其中掺杂有中等浓度硼的p型多晶硅膜层压在掺杂有高浓度硼的p型多晶硅膜上。 因此,由于掺杂高浓度的硼的p型多晶硅膜在外部基极和本征基极层之间的接合部与本征基极层接触,所以能够降低接合部的电阻。 此外,由于外部基极的电阻成为p型多晶硅膜的两层的并联电阻,所以其硼浓度相对较低的p型多晶硅膜的电阻是主要的。