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    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    1.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号：US20100075249A1

    公开(公告)日：2010-03-25

    申请号：US12447432

    申请日：2007-10-15

    申请人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    发明人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/2041 ,  H01L21/0276 ,  Y10S430/108 ,  Y10S430/111

    摘要： A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).

    摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含含有结构 由通式（II）表示的单元（a1）或由通式（II）表示的结构单元（a1）组成的聚合物（A2）（其中R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上，并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构）。

    Positive resist composition and method of forming resist pattern
    2.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08105747B2

    公开(公告)日：2012-01-31

    申请号：US12447432

    申请日：2007-10-15

    申请人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    发明人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/2041 ,  H01L21/0276 ,  Y10S430/108 ,  Y10S430/111

    摘要： A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).

    摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含含有结构 由通式（II）表示的单元（a1）或由通式（II）表示的结构单元（a1）组成的聚合物（A2）（其中R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上，并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构）。

    Compound and polymeric compound
    8.
    发明授权
    Compound and polymeric compound 有权
    化合物和高分子化合物

    公开(公告)号：US08519073B2

    公开(公告)日：2013-08-27

    申请号：US12447433

    申请日：2007-10-15

    申请人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Toshiharu Shimamaki ,  Kenshin Niwa ,  Seihin Shu

    发明人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Toshiharu Shimamaki ,  Kenshin Niwa ,  Seihin Shu

    IPC分类号： C08F18/20

    CPC分类号： G03F7/0046 ,  C07C69/653 ,  C08F220/24 ,  C08F220/28 ,  C08F220/68 ,  G03F7/0397

    摘要： A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.

    摘要翻译： 由通式（I）表示的化合物; 和包含由通式（II）表示的结构单元（a1））的高分子化合物。 其中R表示氢原子，卤素原子，低级烷基或卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合在与R1〜R3键合的叔碳原子相邻的碳原子上，R1〜 R3表示氟化烷基; R2和R3可以形成环结构。

    POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
    9.
    发明申请
    POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
    聚合物化合物，阳离子组合物和形成耐蚀图案的方法

    公开(公告)号：US20090068590A1

    公开(公告)日：2009-03-12

    申请号：US12204460

    申请日：2008-09-04

    申请人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

    发明人： Takahiro Dazai ,  Takayoshi Mori ,  Hiroaki Shimizu ,  Kyoko Ohshita

    IPC分类号： G03F7/004 ,  G03F7/20 ,  C08F28/06

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  Y10S430/111

    摘要： There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

    摘要翻译： 提供一种正性抗蚀剂组合物，其包含在酸作用下在碱性显影液中显示增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中树脂组分（A） 包括含有下述通式（a0-1）表示的结构单元（a0）的高分子化合物（A1）和来自具有酸解离性，溶解抑制基团的丙烯酸酯的结构单元（a1）（ 在式（a0-1）中，R表示氢原子，低级烷基或卤代低级烷基; R'两个各自独立地表示氢原子，低级烷基或烷氧基， 5个碳原子; X表示1至5个碳原子的亚烷基，氧原子或硫原子）。