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    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    1.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号：US20100075249A1

    公开(公告)日：2010-03-25

    申请号：US12447432

    申请日：2007-10-15

    申请人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    发明人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/2041 ,  H01L21/0276 ,  Y10S430/108 ,  Y10S430/111

    摘要： A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).

    摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含含有结构 由通式（II）表示的单元（a1）或由通式（II）表示的结构单元（a1）组成的聚合物（A2）（其中R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上，并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构）。

    Positive resist composition and method of forming resist pattern
    5.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08105747B2

    公开(公告)日：2012-01-31

    申请号：US12447432

    申请日：2007-10-15

    申请人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    发明人： Yoshiyuki Utsumi ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Yasuhiro Yoshii

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/2041 ,  H01L21/0276 ,  Y10S430/108 ,  Y10S430/111

    摘要： A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).

    摘要翻译： 一种正型抗蚀剂组合物，其包含在酸作用下表现出碱溶性变化的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），所述树脂组分（A）包含含有结构 由通式（II）表示的单元（a1）或由通式（II）表示的结构单元（a1）组成的聚合物（A2）（其中R表示氢原子，卤素原子，低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基，条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上，并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构）。

    Resist composition for immersion exposure and method of forming resist pattern
    7.
    发明授权
    Resist composition for immersion exposure and method of forming resist pattern 有权
    用于浸渍曝光的抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08900788B2

    公开(公告)日：2014-12-02

    申请号：US12445192

    申请日：2007-10-12

    申请人： Yoshiyuki Utsumi ,  Yasuhiro Yoshii

    发明人： Yoshiyuki Utsumi ,  Yasuhiro Yoshii

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition for immersion exposure, including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and contains no structural unit (c1) represented by the general formula (c1-1) shown below; an acid generator component (B) which generates an acid upon exposure; and a fluorine-containing resin component (C) which contains the structural unit (c1) (in the formula (c1-1), R represents a hydrogen atom, a lower alkyl group, a halogen atom, or a halogenated lower alkyl group; Rf represents a fluorinated alkyl group; and Y0 represents an alkylene group).

    摘要翻译： 一种用于浸渍曝光的抗蚀剂组合物，包括：在酸的作用下在碱性显影液中表现出改变的溶解性的基础组分（A），并且不含以下所示的通式（c1-1）表示的结构单元（c1） ; 酸性发生剂组分（B），其在暴露时产生酸; 含有结构单元（c1）的含氟树脂成分（C）（式（c1-1）中，R表示氢原子，低级烷基，卤素原子或卤代低级烷基） Rf表示氟化烷基，Y 0表示亚烷基。