Adhesive Substance, in Particular for Encapsulating an Electronic Assembly
    2.
    发明申请
    Adhesive Substance, in Particular for Encapsulating an Electronic Assembly 审中-公开
    胶粘剂,特别是封装电子组件

    公开(公告)号:US20140322526A1

    公开(公告)日:2014-10-30

    申请号:US14353179

    申请日:2012-10-19

    Applicant: tesa SE

    Abstract: The invention relates to an adhesive substance, in particular for encapsulating an electronic assembly against permeates, said substance comprising: (a) at least one copolymer containing at least isobutene or butene as comonomer types and at least one comonomer type which, when regarded as a hypothetical homopolymer, has a softening temperature greater than 40° C.; (b) at least one type of an at least partially hydrogenated adhesive resin; (c) at least one acrylate- or methacrylate-based type of reactive resin with a softening temperature less than 40° C., preferably less than 20° C.; and (d) at least one type of photoinitiator for initiating radical curing.

    Abstract translation: 本发明涉及一种粘合剂物质,特别是用于将电子组件封装在渗透物上,所述物质包括:(a)至少一种至少含有异丁烯或丁烯作为共聚单体类型的共聚物和至少一种共聚单体类型,当被认为是 假定的均聚物,其软化温度大于40℃。 (b)至少一种类型的至少部分氢化的粘合剂树脂; (c)至少一种丙烯酸酯或甲基丙烯酸酯类型的反应性树脂,其软化温度低于40℃,优选小于20℃。 和(d)至少一种用于引发自由基固化的光引发剂。

    COMPOSITE SYSTEM FOR ENCAPSULATING ELECTRONIC ARRANGEMENTS
    4.
    发明申请
    COMPOSITE SYSTEM FOR ENCAPSULATING ELECTRONIC ARRANGEMENTS 审中-公开
    用于封装电子装置的复合系统

    公开(公告)号:US20150099081A1

    公开(公告)日:2015-04-09

    申请号:US14382130

    申请日:2013-02-07

    Applicant: tesa SE

    Abstract: An adhesive strip, with improved barrier effect, encapsulates electronic arrangements against permeates, whereby the composite system comprises at least (a) an adhesive strip containing at least one pressure-sensitive adhesive substance for direct application on a substrate; and (b) at least one release liner which lies directly upon the pressure-sensitive adhesive substance, wherein the surface of the release liner, that faces the pressure-sensitive adhesive substance, has a surface roughness of less that 100 nm, measured as an arithmetic mean Sa as per ISO/FDIS 25178-2:2011 of the amounts of at least 10,000 height values of the profile of a partial surface of at least 200 μm×200 μm. A method produces a release liner with a smooth surface for equipping barrier adhesive strips by removing the liner in order to encapsulate electronic arrangements with the adhesive strip.

    Abstract translation: 具有改善的屏障作用的粘合剂条将电子装置封装在渗透物上,由此复合体系至少包括(a)含有至少一种直接施加在基底上的压敏粘合剂物质的粘合剂条; 和(b)直接位于压敏粘合剂物质上的至少一个剥离衬垫,其中剥离衬垫的面向压敏粘合剂物质的表面的表面粗糙度小于100nm,测量为 根据ISO / FDIS 25178-2:2011的至少200μm×200μm的局部表面轮廓的至少10,000个高度值的算术平均值Sa。 一种方法产生具有光滑表面的剥离衬垫,用于通过移除衬垫来装备阻挡粘合剂条,以便封装具有粘合剂条的电子装置。

    LINER FOR PROTECTION OF ADHESIVES
    7.
    发明申请
    LINER FOR PROTECTION OF ADHESIVES 有权
    衬垫保护胶粘剂

    公开(公告)号:US20130183471A1

    公开(公告)日:2013-07-18

    申请号:US13719277

    申请日:2012-12-19

    Applicant: tesa SE

    Abstract: In the case of a liner for the protection of adhesives, the protective effect is to be enhanced in respect of permeates originating from the environment and also permeates included during winding or stacking and other processing steps. This enhancement is accomplished through provision of a liner which comprises at least one adhesive release layer and at least one layer of a getter material capable of sorbing at least one permeable substance.

    Abstract translation: 在用于保护粘合剂的衬垫的情况下,在来自环境的渗透物以及卷绕或堆叠和其它加工步骤期间包括的渗透物方面,保护效果将得到提高。 这种增强是通过提供衬垫来实现的,所述衬垫包括至少一个粘合剂剥离层和至少一层能够吸附至少一种可渗透物质的吸气剂材料层。

    Linear for protection of adhesives
    10.
    发明授权

    公开(公告)号:US10386209B2

    公开(公告)日:2019-08-20

    申请号:US15626664

    申请日:2017-06-19

    Applicant: tesa SE

    Abstract: Release liners and methods protect one or more adhesives, wherein the release liners and/or methods comprise at least one abhesive release layer and at least one layer of a getter material capable of sorbing at least one permeable substance, wherein the getter material is at least one substance selected from the group consisting of lithium, beryllium, boron, sodium, magnesium, potassium, calcium, manganese, iron, nickel, zinc, gallium, germanium, cadmium, indium, caesium, barium, boron oxide, calcium oxide, chromium oxide, manganese oxide, iron oxide, copper oxide, silver oxide, indium oxide, barium oxide, lead oxide and mixtures of two or more of the above substances.

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