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    Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
    4.
    发明授权
    Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins 失效
    含碱性的光致抗蚀剂剥离组合物通过交联或硬化的抗蚀剂树脂产生金属腐蚀

    公开(公告)号：US5308745A

    公开(公告)日：1994-05-03

    申请号：US972511

    申请日：1992-11-06

    申请人： George Schwartzkopf

    发明人： George Schwartzkopf

    IPC分类号： G03F7/42 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

    CPC分类号： G03F7/425

    摘要： Addition of non-nitrogen containing weak acids to amine-containing alkaline strippers for photoresists produce stripper compositions able to strip highly cross-linked or hardened photoresist films without producing any substantial metal corrosion. Weak acids useful in the stripping compositions include those having a pK in aqueous solution of 2.0 or higher and an equivalent weight of less than about 140 and are employed in an amount to neutralize from about 19% to about 75% of the amine present in the stripper composition.

    摘要翻译： 将含有不含氮的弱酸添加到用于光致抗蚀剂的含胺碱性剥离剂中产生能够剥离高度交联或硬化的光致抗蚀剂膜的汽提组合物，而不产生任何显着的金属腐蚀。 可用于汽提组合物中的弱酸包括在水溶液中的pK为2.0或更高且当量重量小于约140的那些，并且其用量中和约19％至约75％的存在于 脱模剂组成。

    Process of deep ultra-violet imaging lithographic resist compositions
    5.
    发明授权
    Process of deep ultra-violet imaging lithographic resist compositions 失效
    深紫外成像平版印刷抗蚀剂组合物的工艺

    公开(公告)号：US4808512A

    公开(公告)日：1989-02-28

    申请号：US170430

    申请日：1988-03-18

    申请人： George Schwartzkopf

    发明人： George Schwartzkopf

    IPC分类号： C07F7/08 ,  G03F7/016 ,  G03F7/26

    CPC分类号： G03F7/0163 ,  C07F7/0818

    摘要： Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, andR is a radical selected from the group consisting of the residue of a mono-, di-, tri- or polyfunctional alkanol or silicon-containing alkanol and is attached to the oxy atom of the carboxyl group through a carbon atom.Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and the photosensitive solubilization inhibition agents. Lithographic resist images are formed with the deep ultra-violet photoresists upon exposure to deep ultra-violet light.

    摘要翻译： 式（1）的光敏增溶抑制剂化合物，其中：x是等于基团R的化合价或官能度的整数，R是选自单 - ，二 - ，三 - 或多官能链烷醇或含硅链烷醇，并且通过碳原子连接到羧基的氧原子上。 基础可显影的正深紫外光致抗蚀剂包括碱溶性聚合物和光敏增溶抑制剂。 深紫外线光刻胶在深紫外光下形成平版印刷抗蚀剂图像。

    Liquid-solid extraction apparatus and method of using same
    6.
    发明授权
    Liquid-solid extraction apparatus and method of using same 失效
    液固提取装置及其使用方法

    公开(公告)号：US5217619A

    公开(公告)日：1993-06-08

    申请号：US846895

    申请日：1992-03-06

    申请人： Melvin W. Redmond, Jr. ,  Thomas J. Good

    发明人： Melvin W. Redmond, Jr. ,  Thomas J. Good

    IPC分类号： G01N1/10 ,  B01D11/02 ,  B01D29/05 ,  B01D61/18 ,  B01D63/08 ,  G01N1/34 ,  G01N33/18

    CPC分类号： G01N1/405 ,  B01D11/0219 ,  B01D29/05 ,  B01D61/18 ,  B01D63/087 ,  G01N33/18

    摘要： System, apparatus and method for efficiently and effectively isolating analytes from a liquid sample by solid phase extraction comprises a workstation platform with a plurality of suction providing stations for receiving either or both a detachably mounted collection chamber housing a removable collection vessel and membrane holder with removable, screen supported disc membrane, the holder having an inlet opening for receiving a liquid and a passageway through the screen supported disc membrane to an exit port for flow and collection, at the appropriate time, of analytes, extraction solvent, or liquid sample. The membrane holder is adapted to be releasably mounted into either the suction stations or the collection chamber. The removable collection vessel in the collection chamber enables prompt, timely, safe and effective removal of solvent, analyte or liquid from the system. The workstation platform is preferably rotatable for ease of access to the plurality of suction providing stations.

    N-acylated derivatives of polyethyleneimine bonded phase silica products
    7.
    发明授权
    N-acylated derivatives of polyethyleneimine bonded phase silica products 失效
    聚乙烯亚胺键合相二氧化硅产品的N-酰化衍生物

    公开(公告)号：US5066395A

    公开(公告)日：1991-11-19

    申请号：US492219

    申请日：1990-03-13

    申请人： Hugh E. Ramsden ,  David R. Nau

    发明人： Hugh E. Ramsden ,  David R. Nau

    IPC分类号： B01D15/08 ,  B01J20/32

    CPC分类号： B01D15/361 ,  B01D15/362 ,  B01J20/3204 ,  B01J20/3272 ,  B01J20/328

    摘要： Sulfonic derivatives of N-acylated covalently bound, non-crosslinked polyethyleneimine bonded phase silicas of the formula: ##STR1## wherein ##STR2## is the backbone of a silica gel or glass, n is an integer such that the polyethyleneiminopropyl silane group has an average molecular weight of from about 400 to about 1800; q is an integer of zero or one; R is selected from the group consisting of hydrogen, --CH.sub.2).sub.x H or --CH.sub.2).sub.m COOH where X is an integer of 1 or 2 and m is an integer of zero or 1; when R is hydrogen or --CH.sub.2).sub.x H then R.sup.1 is --CH.sub.2).sub.p COOH where p is an integer of zero or 1, and when R is --CH.sub.2).sub.m COOH then R.sup.1 is selected from the group consisting of hydrogen or --CH.sub.2).sub.y H where y is an integer of zero or 1, are especially useful as solid phases for the purification and separation of proteins having isoelectric points of below about 5.

    摘要翻译： N-酰化共价结合的非交联聚乙烯亚胺键合相二氧化硅的磺酸衍生物，其结构式如下：其中是硅胶或玻璃的主链，n是整数，使得聚乙烯亚胺基丙基 硅烷基的平均分子量为约400至约1800; q是0或1的整数; R选自氢，-CH 2）x H或-CH 2）m COOH，其中X为1或2的整数，m为0或1的整数; 当R是氢或-CH 2）x H时，R 1是-CH 2）p COOH，其中p是0或1的整数，当R是-CH 2时，mCOOH，则R 1选自氢或-CH 2）y H，其中 y为零或1的整数，特别适用于纯化和分离等电点低于约5的蛋白质​​的固相。

    Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
    9.
    发明授权
    Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents 失效
    具有2-重氮基-1-烷基的深UV光致抗蚀剂作为溶解度改性剂

    公开(公告)号：US4959293A

    公开(公告)日：1990-09-25

    申请号：US264335

    申请日：1988-10-28

    申请人： George Schwartzkopf ,  John B. Covington ,  Kathleen B. Gabriel

    发明人： George Schwartzkopf ,  John B. Covington ,  Kathleen B. Gabriel

    IPC分类号： G03F7/016 ,  G03F7/075

    CPC分类号： G03F7/0755 ,  G03F7/0163

    摘要： 2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction as with prior art solubility modification agents. The 2-diazo-1-one solubility modification agents when used as photoactive solubility modification components in photoresist compositions permit the photoresist compositions to act as either positive or negative photoresist compositions depending upon the developer employed, namely, as a positive resist when a metal ion containing developer is employed and as a negative resist when a metal ion free developer is employed.

    摘要翻译： 2-重氮-1-酮是有用的深UV光致抗蚀剂溶解度改进剂，其具有改善的光敏性，允许较短的深紫外线曝光时间，以达到与现有技术的溶解度改性剂相同程度的光反应。 当用作光致抗蚀剂组合物中的光活性溶解度改性组分时，2-重氮-1-一种溶解度改性剂允许光致抗蚀剂组合物作为正性或负性光致抗蚀剂组合物，取决于所用的显影剂，即当金属离子 当使用含金属离子的显影剂时，使用含氮显影剂和作为负性抗蚀剂。

    Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions
    10.
    发明授权
    Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions 失效
    光敏增溶抑制剂和深紫外光刻抗蚀剂组合物

    公开(公告)号：US4752551A

    公开(公告)日：1988-06-21

    申请号：US914473

    申请日：1986-10-02

    申请人： George Schwartzkopf

    发明人： George Schwartzkopf

    IPC分类号： G03C1/72 ,  C07F7/08 ,  G03F7/016 ,  G03C1/54 ,  G03C1/60 ,  C07C113/00

    CPC分类号： C07F7/0818 ,  G03F7/0163

    摘要： Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, andR is a radical selected from the group consisting of the residue of a mono-, di-, tri- or polyfunctional alkanol or silicon-containing alkanol and is attached to the oxy atom of the carboxyl group through a carbon atom.Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and the photosensitive solubilization inhibition agents. Lithographic resist images are formed with the deep ultra-violet photoresists upon exposure to deep ultra-violet light.