MEASUREMENT METHOD FOR CHARACTERIZATION OF A PHOTODETECTOR

    公开(公告)号:US20240247977A1

    公开(公告)日:2024-07-25

    申请号:US18564177

    申请日:2022-03-31

    Inventor: Gerd PLECHINGER

    CPC classification number: G01J1/08 G01J1/44 G01J2001/083 G01J2001/446

    Abstract: A measurement method for characterization of a photodetector includes illumination of the photodetector with a variable electromagnetic radiation. The variable electromagnetic radiation has a temporally oscillating radiation intensity with fixed period and amplitude. The method also includes illumination of the photodetector with a first electromagnetic radiation having a temporally constant first radiation intensity and measurement of a first output signal at the photodetector. The method further includes illumination of the photodetector with a second electromagnetic radiation having a temporally constant second radiation intensity different from the first radiation intensity and measurement of a second output signal at the photodetector. The method additionally includes determination of a non-linearity of the photodetector by comparing the measurements of the first and second output signals.

    Array of encoders for alignment measurement

    公开(公告)号:US10078269B2

    公开(公告)日:2018-09-18

    申请号:US15283669

    申请日:2016-10-03

    Abstract: System and method for accurately measuring alignment of every exposure field on a pre-patterned wafer without reducing wafer-exposure throughput. Diffraction grating disposed in scribe-lines of such wafer, used as alignment marks, and array of encoder-heads (each of which is configured to define positional phase(s) of at least one such alignment mark) are used. Determination of trajectory of a wafer-stage scanning during the wafer-exposure in the exposure tool employs determining in-plane coordinates of such spatially-periodic alignment marks by simultaneously measuring position-dependent phases of signals produced by these marks as a result of recombination of light corresponding to different diffraction orders produced by these marks. Measurements may be performed simultaneously at all areas corresponding to at least most of the exposure fields of the wafer, and/or with use of a homodyne light source, and/or in a wavelength-independent fashion, and/or with a pre-registration process allowing for accommodation of wafers with differently-dimensioned exposure fields.

    Method for Calibrating Absolute Responsivity of Terahertz Quantum Well Detector and Device thereof

    公开(公告)号:US20180216994A1

    公开(公告)日:2018-08-02

    申请号:US15121520

    申请日:2014-04-30

    CPC classification number: G01J1/4257 G01J1/08 G01J1/4228 G01J3/42 G01J2001/083

    Abstract: A calibration method for an absolute responsivity of a terahertz quantum well detector and a calibration device thereof, in which the device at least comprises: a driving power supply, a single frequency laser source, an optic, a terahertz array detector, a terahertz dynamometer, a current amplifier and an oscilloscope. The calibration method adopts a power detectable single frequency laser source as a calibration photosource, to obtain the absolute responsivity parameters of the detector at the laser frequency; a normalized photocurrent spectrum of the detector is used to further calculate the absolute responsivity parameters of the detector at any detectable frequency. the single frequency laser source with periodically output is adopted as a calibration photosource, the terahertz array detector and the dynamometer are adopted to directly measure and obtain the incident power of the calibrated detector.

    PHOTOSENSOR
    6.
    发明申请
    PHOTOSENSOR 审中-公开

    公开(公告)号:US20180209843A1

    公开(公告)日:2018-07-26

    申请号:US15726391

    申请日:2017-10-06

    Inventor: Jumpei NAKAMURA

    Abstract: A photosensor of the present invention includes a circuit portion (34), a collective cable support portion (42), a pressure-welding portion (36a˜36d) and a cable end support portion (46a˜46d). The circuit portion (34) is configured to control the light projecting element and the light receiving element. The collective cable support portion (42) is configured to support a collective cable (10) including a plurality of cables (12a˜12d). The pressure-welding portion (36a˜36d) is configured to perform conduction with the circuit portion (34) by pressure-welding and fixing each of the plurality of cables (12a˜12d). The cable end support portion (46a˜46d) is configured to support an end of each of the plurality of cables (12a˜12d). In each of the plurality of cables (12a˜12d), a length from the pressure-welding portion (36a˜36d) to the cable end support portion (46a˜46d) is longer than that from the collective cable support portion (42) to the pressure-welding portion (36a˜36d).

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