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    ELECTRON BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING DEVICE
    3.
    发明申请
    ELECTRON BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING DEVICE 审中-公开
    电子束绘图装置和制造装置的方法

    公开(公告)号：US20120288800A1

    公开(公告)日：2012-11-15

    申请号：US13462088

    申请日：2012-05-02

    Applicant: Jun ITO

    Inventor： Jun ITO

    IPC: G03F7/20 ,  H01J3/02

    CPC classification number: H01J3/06 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/028 ,  H01J37/067 ,  H01J37/3174 ,  H01J2237/0206 ,  H01J2237/022

    Abstract: An electron beam drawing apparatus performs drawing on a substrate with an electron beam emitted by an electron gun. The apparatus includes a conditioning chamber configured to perform conditioning of a spare electrode that is a spare for an electrode which constitutes the electron gun, and a driving mechanism configured to remove a used electrode from the electron gun, and to install, into the electron gun, the spare electrode having been subjected to the conditioning, wherein the conditioning includes supplying of electric power to the spare electrode.

    Abstract translation: 电子束描绘装置利用电子枪发射的电子束对衬底进行绘图。 该装置包括：调节室，被配置为执行作为构成电子枪的电极备用的备用电极的调节;以及驱动机构，其构造成从电子枪中去除使用的电极，并将其安装到电子枪 所述备用电极已经进行了调节，其中所述调节包括向备用电极供电。

    Charged particle beam emitting device and method for operating a charged particle beam emitting device
    4.
    发明授权
    Charged particle beam emitting device and method for operating a charged particle beam emitting device 有权
    带电粒子束发射装置和用于操作带电粒子束发射装置的方法

    公开(公告)号：US07501638B1

    公开(公告)日：2009-03-10

    申请号：US11553160

    申请日：2006-10-26

    Applicant: Fang Zhou

    Inventor： Fang Zhou

    IPC: H01J37/10 ,  H01J37/147

    CPC classification number: H01J9/505 ,  H01J3/06 ,  H01J37/067 ,  Y02W30/828

    Abstract: A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.

    Abstract translation: 带电粒子束发射装置包括至少两个带电粒子束枪，所述至少两个带电粒子束枪中的每一个具有分离的带电粒子发射器，具有用于发射相应带电粒子束的发射表面。 带电粒子束发射装置还包括孔元件，该孔元件包括至少一个孔口和偏转器单元。 偏转器单元适于将至少两个带电粒子束枪的带电粒子束交替地引导到至少一个孔口上，使得同时，至少两个带电粒子束中的一个被引导到孔 所述至少两个带电粒子束的相应的其它带电粒子束由所述偏转器单元从所述开口偏转。 同时，仅使用两个带电粒子束枪中的一个，使得临时使用的带电粒子束枪可以进行清洁程序。 这确保了两个带电粒子束枪的发射表面可以以最小的带电粒子束装置的操作中断来交替地和频繁地清洁。

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