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    Optical stress generator and detector
    5.
    发明授权
    Optical stress generator and detector 有权

    公开(公告)号：US06271921B1

    公开(公告)日：2001-08-07

    申请号：US09511719

    申请日：2000-02-23

    申请人： Humphrey J. Maris ,  Robert J Stoner

    发明人： Humphrey J. Maris ,  Robert J Stoner

    IPC分类号： G01B1106

    CPC分类号： G01N21/1702 ,  G01N29/0681 ,  G01N29/2418 ,  G01N2291/02827 ,  G01N2291/02881 ,  G01N2291/0426 ,  G01N2291/0427 ,  Y10S977/834 ,  Y10S977/90 ,  Y10S977/901 ,  Y10S977/955 ,  Y10S977/956

    摘要： Disclosed is a system for the characterization of thin films and interfaces between thin films through measurements of their mechanical and thermal properties. In the system light is absorbed in a thin film or in a structure made up of several thin films, and the change in optical transmission or reflection is measured and analyzed. The change in reflection or transmission is used to give information about the ultrasonic waves that are produced in the structure. The information that is obtained from the use of the measurement methods and apparatus of this invention can include: (a) a determination of the thickness of thin films with a speed and accuracy that is improved compared to earlier methods; (b) a determination of the thermal, elastic, and optical properties of thin films; (c) a determination of the stress in thin films; and (d) a characterization of the properties of interfaces, including the presence of roughness and defects.

    NANOSTRUCTURES FOR PROCESS MONITORING AND FEEDBACK CONTROL
    6.
    发明申请
    NANOSTRUCTURES FOR PROCESS MONITORING AND FEEDBACK CONTROL 审中-公开

    公开(公告)号：US20180304549A1

    公开(公告)日：2018-10-25

    申请号：US15495925

    申请日：2017-04-24

    申请人： The Boeing Company

    发明人： Morteza Safai ,  Gary E. Georgeson

    IPC分类号： B29C67/00

    CPC分类号： B29C67/0088 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/00 ,  B33Y80/00 ,  B82Y35/00 ,  B82Y40/00 ,  Y10S977/774 ,  Y10S977/892 ,  Y10S977/955 ,  Y10S977/956

    摘要： Various techniques are provided to utilize nanostructures for process monitoring and feedback control. In one example, a method includes forming a layer of material including nanostructures distributed therein. Each nanostructure includes a quantum dot and a shell encompassing the quantum dot. The shells and quantum dots are configured to emit a first and second wavelength, respectively, in response to an excitation signal. The method further includes applying the excitation signal to at least a portion of the layer of material. The method further includes detecting an emitted signal from the portion of the layer of material, where the emitted signal is provided by at least a subset of the nanostructures in response to the excitation signal. The method further includes determining whether a manufacturing characteristic has been satisfied based at least on a wavelength of the emitted signal. Related systems and products are also provided.