公开(公告)号：US20230066086A1

公开(公告)日：2023-03-02

申请号：US17412242

申请日：2021-08-25

申请人： KLA Corporation

发明人： Xinrong Jiang

IPC分类号： H01J37/12 ,  H01J37/14

摘要： For an electron beam system, a Wien filter is in the path of the electron beam between a transfer lens and a stage. The system includes a ground electrode between the Wien filter and the stage, a charge control plate between the ground electrode and the stage, and an acceleration electrode between the ground electrode and the charge control plate. The system can be magnetic or electrostatic.

公开(公告)号：US20230037583A1

公开(公告)日：2023-02-09

申请号：US17961247

申请日：2022-10-06

申请人： ASML Netherlands B.V.

发明人： Marco Jan-Jaco WIELAND

IPC分类号： H01J37/09 ,  H01J37/153 ,  H01J37/12

摘要： The disclosure relates to apparatus and methods for manipulating charged particle beams. In one arrangement, an aperture assembly is provided that comprises a first aperture body and a second aperture body. Apertures in the first aperture body are aligned with apertures in the second aperture body. The alignment allows charged particle beams to pass through the aperture assembly. The first aperture body comprises a first electrode system for applying an electrical potential to an aperture perimeter surface of each aperture in the first aperture body. The first electrode system comprises a plurality of electrodes. Each electrode is electrically isolated from each other electrode and electrically connected simultaneously to the aperture perimeter surfaces of a different one of a plurality of groups of the apertures in the first aperture body.

公开(公告)号：US11367589B2

公开(公告)日：2022-06-21

申请号：US16705159

申请日：2019-12-05

申请人： Applied Materials, Inc.

发明人： Joseph C. Olson ,  Morgan Evans ,  Rutger Meyer Timmerman Thijssen

IPC分类号： H01J37/12 ,  H01J37/305 ,  G02B6/136 ,  H01J37/147 ,  H01J37/20 ,  G02B6/12

摘要： Embodiments described herein relate to methods and apparatus for forming gratings having a plurality of fins with different slant angles on a substrate and forming fins with different slant angles on successive substrates using angled etch systems and/or an optical device. The methods include positioning portions of substrates retained on a platen in a path of an ion beam. The substrates have a grating material disposed thereon. The ion beam is configured to contact the grating material at an ion beam angle ϑ relative to a surface normal of the substrates and form gratings in the grating material.

公开(公告)号：US11302511B2

公开(公告)日：2022-04-12

申请号：US15173144

申请日：2016-06-03

申请人： KLA-Tencor Corporation

发明人： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC分类号： H01J37/12 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

摘要： Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US20220084778A1

公开(公告)日：2022-03-17

申请号：US17021553

申请日：2020-09-15

申请人： NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

发明人： Victor KATSAP

IPC分类号： H01J37/12 ,  H01J37/317 ,  H01J29/51 ,  H01J37/30

摘要： An electrostatic beam transfer lens for a multi-beam apparatus that includes a series of multiple, successive electrodes, such that an aperture bore of each electrode is aligned along an electron gun axis and is configured to allow multiple beams to pass therethrough. The first electrode in the series is a cylindrical electrode configured to receive the multiple beams at an entrance plane. The first electrode has a bore length and a bore diameter such that a ratio of bore diameter/bore length

公开(公告)号：US11211224B2

公开(公告)日：2021-12-28

申请号：US17049353

申请日：2018-04-26

申请人： HITACHI HIGH-TECH CORPORATION

发明人： Nobuhiro Okai ,  Daisuke Bizen ,  Tomoyasu Shojo ,  Naomasa Suzuki ,  Muneyuki Fukuda

IPC分类号： H01J37/244 ,  H01J37/147 ,  H01J37/28 ,  H01J37/12

摘要： To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam.

公开(公告)号：US11177114B1

公开(公告)日：2021-11-16

申请号：US17022078

申请日：2020-09-15

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： Matthias Firnkes ,  Florian Lampersberger ,  Carlo Salvesen

IPC分类号： H01J37/00 ,  H01J37/317 ,  H01J37/09 ,  H01J37/244 ,  H01J37/12

摘要： An electrode arrangement for acting on a charged particle beam in a charged particle beam apparatus is described. The electrode arrangement includes a first electrode with a first opening for the charged particle beam; a first spacer element positioned in a first recess provided in the first electrode on a first electrode side for aligning the first electrode relative to a second electrode, the first spacer element having a first blind hole; a first conductive shield provided in the first blind hole; and a contact assembly protruding from the first electrode into the first blind hole for ensuring an electrical contact between the first electrode and the first conductive shield. Further, a contact assembly for such an electrode arrangement, a charged particle beam device with such an electrode arrangement, as well as a method of reducing an electrical field strength in an electrode arrangement are described.

公开(公告)号：US20210272770A1

公开(公告)日：2021-09-02

申请号：US17255724

申请日：2018-07-02

申请人： Hitachi High-Tech Corporation

发明人： Yasunari SOHDA ,  Kaori BIZEN ,  Yusuke ABE ,  Kenji TANIMOTO

IPC分类号： H01J37/28 ,  H01J37/12 ,  H01J37/244 ,  H01J37/153 ,  H01J37/21 ,  H01J37/26 ,  H01J37/147

摘要： Provided is a scanning electron microscope which can perform high-speed focus correction even when an electron beam having high energy is used. The scanning electron microscope includes an electron optical system including an electron source 100 that emits an electron beam and an objective lens 113, a sample stage 1025 which is disposed on a stage 115 and on which a sample 114 is placed, a backscattered electron detector 1023 which is disposed between the objective lens and the sample stage and is configured to detect backscattered electrons 1017 emitted due to interaction between the electron beam and the sample, a backscattered electron detection system control unit 138 which is provided corresponding to the backscattered electron detector and is configured to apply a voltage to the backscattered electron detector, and a device control calculation device 146. The objective lens has an opening in a stage direction, and the device control calculation device performs focus correction of the electron beam by controlling the voltage applied to the backscattered electron detector from the backscattered electron detection system control unit.

公开(公告)号：US11094426B2

公开(公告)日：2021-08-17

申请号：US16796849

申请日：2020-02-20

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC分类号： H01J37/30 ,  G21K5/04 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

摘要： The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US20210118642A1

公开(公告)日：2021-04-22

申请号：US17072691

申请日：2020-10-16

申请人： HITACHI HIGH-TECH SCIENCE CORPORATION

发明人： Yasuhiko SUGIYAMA ,  Naoko HIROSE

IPC分类号： H01J37/12 ,  H01J37/147 ,  H01J37/08 ,  H01J37/153 ,  H01J37/28

摘要： The focused ion beam apparatus includes: an ion source configured to generate ions; a first electrostatic lens configured to accelerate and focus the ions to form an ion beam; a beam booster electrode configured to accelerate the ion beam to a higher level; one or a plurality of electrodes, which are placed in the beam booster electrode, and are configured to electrostatically deflect the ion beam; a second electrostatic lens, which is provided between the one or plurality of electrodes and a sample table, and is configured to focus the ion beam applied with a voltage; and a processing unit configured to obtain a measurement condition, and set at least one of voltages to be applied to the one or plurality of electrodes or a voltage to be applied to each of the first electrostatic lens and the second electrostatic lens, based on the obtained measurement condition.