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    HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER
    23.
    发明申请
    HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER 审中-公开
    高分辨率ETALON-GRATING MONOCHROMATOR SPECTROMETER

    公开(公告)号：WO02061388A2

    公开(公告)日：2002-08-08

    申请号：PCT/US0202453

    申请日：2002-01-28

    Applicant: CYMER INC ,  SANDSTROM RICHARD L ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  BROWN DANIEL J W ,  SMITH SCOTT T

    Inventor： SANDSTROM RICHARD L ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  BROWN DANIEL J W ,  SMITH SCOTT T

    IPC: G01J3/26 ,  G01J1/42 ,  G01J3/12 ,  G01J3/22 ,  G01J9/02 ,  G21K1/06 ,  H01S3/134 ,  H01S3/137 ,  G01N

    CPC classification number: G01J3/12 ,  G01J1/4257 ,  G01J3/22 ,  G01J3/26 ,  G01J9/02

    Abstract: A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.

    Abstract translation: 高分辨率标准光栅光谱仪或单色仪。 优选的实施例在紫外范围内呈现极窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光器的光聚焦成漫射器（D），离散扩散器的散射光照射标准具（ET）。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光被准直（L3），并且准直光照射位于大约Littrow配置中的光栅（GR1），其根据波长分散光。 表示对应于所选标准具条纹的波长的分散光的一部分通过第二狭缝（2）并由光检测器（PMT）监测。 当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，约0.034pm“FWHM”和约0.091μm“95％积分”。 标准具和光栅放置在充满气体（例如氮气或氦气）的密封密封（50）中。

    MULTI-PASS OPTICAL APPARATUS
    25.
    发明申请
    MULTI-PASS OPTICAL APPARATUS 审中-公开
    多通道光学设备

    公开(公告)号：WO2012091786A1

    公开(公告)日：2012-07-05

    申请号：PCT/US2011/057717

    申请日：2011-10-25

    Applicant: CYMER, INC. ,  SANDSTROM, Richard, L.

    Inventor： SANDSTROM, Richard, L.

    IPC: G02B5/08

    CPC classification number: G02B17/004 ,  G02B7/1815 ,  G02B7/1825 ,  H01S3/076 ,  H01S3/2325

    Abstract: An apparatus includes a first plurality of concave reflecting surfaces; a second plurality of reflecting surfaces facing the first plurality of concave reflecting surfaces such that a region is defined between the first and second pluralities; and an input for an optical beam to enter the region and an output for the optical beam to exit the region. The first and second pluralities of reflecting surfaces are arranged relative to each other so that the optical beam is re-imaged at a reflecting surface of one of the pluralities after only one reflection from a reflecting surface of the other of the pluralities and so that overlap of two or more optical beams on each of the reflecting surfaces is avoided.

    Abstract translation: 一种装置包括：第一多个凹面反射面; 面对所述第一多个凹反射表面的第二多个反射表面，使得在所述第一和第二多个之间限定区域; 以及用于进入该区域的光束的输入和用于使光束离开该区域的输出。 第一和第二多个反射表面相对于彼此布置，使得光束在仅一次反射之后的多个反射表面中从多个另一个的反射表面重新成像，并且重叠 避免了在每个反射表面上的两个或更多个光束。

    OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE
    26.
    发明申请
    OSCILLATOR-AMPLIFIER DRIVE LASER WITH SEED PROTECTION FOR AN EUV LIGHT SOURCE 审中-公开
    振荡放大器驱动激光器，具有针对EUV光源的保护

    公开(公告)号：WO2012054145A1

    公开(公告)日：2012-04-26

    申请号：PCT/US2011/050566

    申请日：2011-09-06

    Applicant: CYMER, INC. ,  HOU, Kai-chung ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Ifor, V.

    Inventor： HOU, Kai-chung ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Ifor, V.

    IPC: H01S3/00

    CPC classification number: H01S3/117 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0064 ,  H01S3/076 ,  H01S3/0812 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/005 ,  H05G2/008

    Abstract: As disclosed herein, in a first aspect, a device may comprise; an oscillator producing a light output on a beam path; a target material for interaction with Light on the beam path at an irradiation site; a beam delay on the beam path the beam delay haying a beam folding optical arrangement; and a switch positioned along the beam, path and Interposed between the oscillator and the beam delay; the switch closable to divert at. least a portion of light on the beam path from the beam path, the switch having close time, t 1 and the beam path having a Length, L 1 . along the path from the switch to the irradiation site; with t 1 1 , where e is the speed of light on the path, to protect the oscillator.

    Abstract translation: 如本文所公开的，在第一方面中，一种装置可以包括： 在光束路径上产生光输出的振荡器; 用于在照射部位的光束路径上与光相互作用的目标材料; 在光束路径上的波束延迟，波束延迟具有光束折叠光学布置; 和沿着光束路径定位的开关，并且介于振荡器和光束延迟之间; 开关可以转向。 来自光束路径的光束路径上的光的至少一部分，开关具有接近的时间t1，并且光束路径具有长度L1。 沿着从切换到照射场所的路径; 与t1 1，其中e是路径上的光速，以保护振荡器。

    LASER PRODUCED PLASMA EUV LIGHT SOURCE
    28.
    发明申请
    LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
    激光生产等离子体光源

    公开(公告)号：WO2011112235A1

    公开(公告)日：2011-09-15

    申请号：PCT/US2011/000374

    申请日：2011-03-01

    Applicant: CYMER, INC. ,  VASCHENKO, Georgiy, O. ,  ERSHOV, Alexander, I. ,  SANDSTROM, Richard, L.

    Inventor： VASCHENKO, Georgiy, O. ,  ERSHOV, Alexander, I. ,  SANDSTROM, Richard, L.

    IPC: A61N5/06

    CPC classification number: B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.

    Abstract translation: 本文公开了一种装置，其可以包括等离子体产生系统，其包括目标材料液滴源和产生在照射区域照射液滴的光束的激光器，等离子体产生EUV辐射，其中液滴源包括离开孔口的流体， 产生流体中的扰动的子系统产生具有不同初始速度的液滴，导致至少一些相邻液滴之间的间隔随着液滴行进到照射区域而减小。

    HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT
    30.
    发明申请
    HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT 审中-公开
    高功率高脉冲重复率气体放电激光系统带宽管理

    公开(公告)号：WO2006060359A2

    公开(公告)日：2006-06-08

    申请号：PCT/US2005/043055

    申请日：2005-11-28

    Applicant: CYMER, INC. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  ALGOTS, J., Martin ,  TRINTCHOUK, Fedor

    Inventor： SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  BROWN, Daniel, J., W. ,  ALGOTS, J., Martin ,  TRINTCHOUK, Fedor

    IPC: H01S3/22

    CPC classification number: H01S3/08009 ,  H01S3/08031 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055

    Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.

    Abstract translation: 公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可包括包含在线窄模块内的分散中心波长选择光学器件，选择 用于每个脉冲的至少一个中心波长至少部分地由在分散波长选择光学色散表面上包含各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且可操作以以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述分散表面的曲率。 第一种方式可以修改第一带宽测量，第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。 第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含频谱强度的某些选定百分比（EX％）的宽度。 第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致正交于第一维度。 激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。 第一分散光学弯曲机构可以改变分散表面在第一维度中的曲率，而第二分辨率曲线机构可以改变大体平行于第一尺寸的第二尺寸。 激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到色散中心波长选择光学器件。 弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

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