Abstract:
The present invention provides a BiCMOS integrated circuit (100) with bipolar (110), NMOS (112) and PMOS (114) transistors. In a bipolar transistor, an emitter buffer (164) is provided to minimize a hot carrier effect. The emitter buffer is implanted using the same mask used for a base link (146). However, the n-type dopant is implanted using a large angle, while the p-type dopant is implanted using a normal implant. A "base" oxide (170) is grown over the implant region. This oxide ultimate isolates the emitter buffer from the polysilicon emitter contact section (160). Local interconnects (180) are formed using a "split-poly" technique, in which a tungsten silicide cap layer (184) is formed over polysilicon to short pn junctions in the interconnect.
Abstract:
A computer system (10) having a multiplex address/data bus with a multiplex system controller (18) and method therefor is disclosed which provides in a computer system (10) having time shared use of a multiplex address/data bus to reduced the number of required pins for devices within the computer system (10), a CPU (12) having at least one address bus, at least one data bus, at least one memory input/output, and at least one CPU control bus coupled thereto for sending and receiving information. In addition, this system (10) includes at least one memory input/output device (14) coupled to a first portion of the address bus for sending and receiving at least one of address information and data information, at least one input/output only device (16) coupled to a second portion of the address bus for sending and receiving at least one of address information and data information, and a multiplex system controller (18) coupled to the CPU (12) and the address bus and having a multiplex control bus coupled to both the memory input/output device (14) and to the input/output only device (16) for taking control of the address bus from the CPU (12).
Abstract:
An integrated circuit device including a substrate (12), a gate structure (10) formed over the substrate, a channel (C) formed in the substrate under the gate, a lightly-doped drain-side LDD region (22) formed in the substrate adjacent to a drain-side of the channel (preferably by a LATID process), a drain region (30) formed in the substrate near to the drain-side LDD region, and a drain-side DDD region (34) substantially separating the drain-side LDD region from the drain region. Preferably, the integrated circuit device is symmetrically formed such that a lightly-doped source-side LDD region (20) is formed in the substrate adjacent to a source-side of the channel (again preferably by a LATID process), a source region (28) is formed in the substrate near to the source-side LDD region, and a source-side DDD region (32) is formed in the substrate to substantially separate the source-side LDD region from the source region. Further preferably, the DDD regions substantially isolate the source and drain from a bulk portion of the substrate. A method of the present invention includes the steps of providing a semiconductor substrate (12), forming a gate (10) over the substrate to define a channel (C), doping the substrate to form a pair of LDD regions (20/22) in the substrate, doping the substrate to form a drain region (30) and a source region (28), and doping the substrate to form a drain-side DDD region (34) in the substrate which substantially separates the drain region from the drain-side LDD region (22) and which substantially isolates the drain region from a bulk portion of the substrate, and to form a source-side DDD region (32) in the substrate which substantially separates the source region from the source-side LDD region (20) and substantially isolates the source region from a bulk portion of the substrate.
Abstract:
Using a Z-axis material (12'), a bare die (36) can be burn-in tested without first packaging the die. Burn-in testing of the bare die has the benefit of saving packaging efforts. For multiple die packages, burn-in testing of the bare die has the benefit that each individual die can be burn-in tested separately from the package.
Abstract:
A molded plastic package (40) for an integrated-circuit die (26) includes a lead frame having a central die-attach paddle (12). One side of the die-attach paddle has an integrated-circuit die fixed thereto. A heat sink member (20) is resiliently fixed to the other side of the die-attach paddle using a layer of viscous thermal grease (24) between the heat sink member and the other side of the die-attach paddle. One or more holes which are formed in the lead frame are engaged by corresponding studs (24C, 24D) on the heat sink. The stud has a shoulder portion (74) which engages the lead frame to prevent the stud from further passing through the hole in the lead frame.
Abstract:
A method for planarization of a semiconductor process material that contains exposed surfaces of an oxide of silicon and a spin-on-glass (SOG). The oxide of silicon is chosen to be oxygen-deficient and thus silicon-rich, with a spectroscopically-defined silicon richness coefficient CSR that is greater than 0, and preferably at least equal to 0.005. A fluorine-containing, oxygen-free process gas, such as CHF3 with CF4 or C2F6 or SF6 added, may be used for the etchant or process gas.
Abstract:
A digital signal phase adjustment circuit adjusts the phase of a data signal in relation to a first local clock signal having a frequency of f. Also provided is a second local clock signal with a frequency of Nf, where N is a positive integer greater than 1. An N-bit shift register (120), clocked by the second local clock signal, generates N phase signals that are enabled in rotating sequential order during non-overlapping time intervals. One of the N phase signals is selected by a multiplexer (130) and used as the enable control signal for a data sampling circuit that is clocked by the second local clock signal. The data sampling circuit samples and outputs the data signal only when the selected phase signal is enabled, thereby outputting the data signal with a selected phase relative to the first clock signal.
Abstract:
A device and method for converting 18-bit RGB data to 5-bit gray scale data is disclosed. This device and method comprise a barrel shifter (12), an adder (14), a palette storage register (16), and control logic (18). The red data is loaded first into the barrel shifter (12), and is shifted, added and stored in the palette storage register (16). The green data is then loaded into the barrel shifter (12) and is shifted and added to the value stored in the palette storage register (16). The blue data is then loaded into the barrel shifter (12) and is shifted and added to the value stored in the palette storage register (16), thereby completing the conversion. The five most significant bits of the six-bit palette storage register (16) are output as gray scale data. The shifting and adding of these six-bit integers allow a binary approximation of the appropriate coefficients for each block of color data.
Abstract:
A method approximates propagation delay through a logic device. Operation of the logic device is divided into a first region and a second region. A boundary between the first region and the second is based on duration of input ramp to the logic device and amount of capacitive load driven by the logic device. For example, the boundary between the first region and the second occurs where for each value of the capacitive load, an output ramp for the logic device is one half complete when the input ramp is complete. When the logic device operates in the first region, a first formula is used to obtain a first value representing delay through the logic device. The first formula varies the first value based on the duration of the input ramp to the logic device and the capacitive load driven by the logic device. When the logic device operates in the second region, a second formula is used to obtain the first value. The second formula also varies the first value based on the duration of the input ramp to the logic device and the capacitive load driven by the logic device.
Abstract:
A package design configuration for an integrated-circuit die (104) includes a leadframe having its bonding fingers (106) connected to the periphery of an electrically-insulated, heat-conductive substrate (102), formed, for example, of a ceramic material. A number of electrically conductive traces (110), or bonding islands, serve as intermediate bonding locations for shorter bonding wires (112, 116) connecting bonding pads (114) on the integrated-circuit die (104) to the bonding fingers (106) of the leadframe. The integrated-circuit die overlies the conductive traces while still providing an exposed portion of the conductive traces as a respective intermediate attachment area for respective bonding wires. The conductive traces serving as bonding islands are formed by deposition of thin-film material using semiconductor fabrication techniques or by deposition of thick-film material using printing techniques.