公开(公告)号：WO0201685A8

公开(公告)日：2002-04-04

申请号：PCT/US0118691

申请日：2001-06-07

Applicant: CYMER INC ,  OLIVER I ROGER ,  PARTLO WILLIAM N

Inventor： OLIVER I ROGER ,  PARTLO WILLIAM N

IPC: G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

CPC classification number: H01S3/225 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H03K3/57 ,  H03K17/80

Abstract: A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over the prior art designs include: (1) a squirrel cage type fan (46A) for producing gas velocities in the discharge region of more than 67 m/s, (2) a liquid cooled drive motor having a low loss sealing member separating the motor from the motor starter and protecting the motor from the laser and breach detection device for detecting any breach of the sealing member, (3) a heat exchanger system (58A) capable of removing in excess of 16 kW of heat energy from the laser gas and (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes (18A, 20A) to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz.

Abstract translation: 一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。 与现有技术设计相比，重要的改进包括：（1）用于在放电区域产生大于67m / s的气体速度的鼠笼式风扇（46A），（2）具有低损耗密封件 将电动机与电动机起动器分离并保护电动机免受激光破裂，检测装置检测到任何泄漏密封件;（3）热交换器系统（58A）能够从 激光气体和（4）能够向电极（18A，20A）提供精确控制的电脉冲以在脉冲重复频率为5mJ至10mJ或更大范围内的期望脉冲能量产生激光脉冲的脉冲电源系统 范围4,000 Hz至6,000 Hz。

公开(公告)号：WO2005091879A2

公开(公告)日：2005-10-06

申请号：PCT/US2005005935

申请日：2005-02-24

Applicant: CYMER INC ,  PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

Inventor： PARTLO WILLIAM N ,  BOWERING NORBERT R ,  ERSHOV ALEXANDER I ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  VIATELLA JOHN ,  JACQUES ROBERT N

IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

Abstract translation: 公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集 光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度 摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。 至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。 驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交 接近所需的等离子体引发位点。 等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。 中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。 所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号 所述至少两个成像装置。 目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号 对第二成像装置中的图像进行分析。

公开(公告)号：WO2006049886A3

公开(公告)日：2009-03-05

申请号：PCT/US2005037725

申请日：2005-10-20

Applicant: CYMER INC ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  ERSHOV ALEXANDER I ,  OLDHAM WILLIAM ,  HEMBERG OSCAR ,  MARX WILLIAM F

Inventor： PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  ERSHOV ALEXANDER I ,  OLDHAM WILLIAM ,  HEMBERG OSCAR ,  MARX WILLIAM F

IPC: H01L21/302 ,  H01L21/306

CPC classification number: B08B7/00

Abstract: A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.

Abstract translation: 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

公开(公告)号：WO2008127599A3

公开(公告)日：2008-12-11

申请号：PCT/US2008004598

申请日：2008-04-09

Applicant: CYMER INC A NEVADA CORP ,  PARTLO WILLIAM N ,  JACQUES ROBERT N ,  O'BRIEN KEVIN M ,  ISHIHARA TOSHIHIKO

Inventor： PARTLO WILLIAM N ,  JACQUES ROBERT N ,  O'BRIEN KEVIN M ,  ISHIHARA TOSHIHIKO

IPC: H01S3/22

CPC classification number: H01S3/1055 ,  G02B27/646 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225 ,  H01S2301/02

Abstract: According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.

Abstract translation: 根据所公开的主题的实施例的方面，公开了一种方法和装置，其包括基于误差信号调整种子激光器中的气体放电与用于带宽控制的放大器激光器之间的差分定时，或用于控制另一个 除了带宽之外的激光操作参数，不利用任何光束放大控制，或者基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一个激光器操作参数 同时利用除带宽控制之外的光束放大控制，并且基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一激光器操作参数，同时 利用基于误差信号的带宽控制的光束放大控制。

公开(公告)号：WO2005001853A3

公开(公告)日：2005-11-24

申请号：PCT/US2004018941

申请日：2004-06-14

Applicant: CYMER INC ,  NESS RICHARD M ,  PARTLO WILLIAM N ,  MELCHER PAUL C ,  FERGUSON GEORGE X ,  SAETHRE ROBERT B

Inventor： NESS RICHARD M ,  PARTLO WILLIAM N ,  MELCHER PAUL C ,  FERGUSON GEORGE X ,  SAETHRE ROBERT B

IPC: H01F3/00 ,  H01F27/10 ,  H01S3/097 ,  H01F27/08 ,  G21C7/00

CPC classification number: H01F27/266 ,  H01F27/025 ,  H01F27/10 ,  H01S3/097

Abstract: An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member (200) having at least one core support member wall (210) is disclosed which may comprise a core support coolant inlet (282); a core support coolant outlet (283); a plurality of interconnected coolant flow passages (270) contained within the core support member wall and inter connected an arranged to pass coolant from one coolant flow passage to the next within the core support member wall along a coolant flow path within at least a substantial portion of the core support member wall from the core support coolant inlet to the core support coolant outlet. The apparatus may also comprise each core support coolant flow passage is in fluid communication with a fluid communication plenum at each end of each respective core support coolant flow passage, with each respective fluid communication plenum forming an outlet plenum for at least a first one of the respective core support coolant flow passages and an inlet plenum for at least a second one of the respective core support coolant flow passages along the coolant flow path from the core support coolant inlet to the core support coolant outlet.

Abstract translation: 公开了一种用于向具有设置在具有至少一个芯支撑构件壁（210）的中心定位的芯支撑构件（200）周围的磁芯的磁路元件提供冷却的装置和方法，其可以包括芯支撑冷却剂入口（282 ）; 芯支撑冷却剂出口（283）; 多个互连的冷却剂流动通道（270），其容纳在所述芯支撑构件壁内并且相互连接，所述多个相互连接的冷却剂流动通道（270）被布置成沿着至少大部分内的冷却剂流动路径将冷却剂从一个冷却剂流动通道传递到所述芯支撑构件壁 的芯支撑构件壁从芯支撑冷却剂入口到芯支撑冷却剂出口。 该装置还可以包括每个芯支撑冷却剂流动通道与每个相应的芯支撑冷却剂流动通道的每个端部处的流体连通通气室流体连通，每个相应的流体连通增压室形成出口压力室，用于至少第一个 相应的芯支撑冷却剂流动通道和用于沿着从芯支撑冷却剂入口到芯支撑冷却剂出口的冷却剂流动路径的相应的芯支撑冷却剂流动通道中的至少第二个的入口气室。

公开(公告)号：WO03096497A8

公开(公告)日：2004-12-29

申请号：PCT/US0312819

申请日：2003-04-23

Applicant: CYMER INC ,  YAGER THOMAS A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  PAN XIAOJIANG ,  MELCHIOR JOHN T ,  ALGOTS JOHN M ,  BALL MATTHEW ,  ERSHOV ALEXANDER I ,  FLEUROV VLADIMIR ,  GILLESPIE WALTER D ,  GLATZEL HOLGER K ,  LUBLIN LEONARD ,  MARSH ELIZABETH ,  MORTON RICHARD G ,  UJAZDOWKI RICHARD C ,  WARKENTIN DAVID J ,  WEBB R KYLE

Inventor： YAGER THOMAS A ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  PAN XIAOJIANG ,  MELCHIOR JOHN T ,  ALGOTS JOHN M ,  BALL MATTHEW ,  ERSHOV ALEXANDER I ,  FLEUROV VLADIMIR ,  GILLESPIE WALTER D ,  GLATZEL HOLGER K ,  LUBLIN LEONARD ,  MARSH ELIZABETH ,  MORTON RICHARD G ,  UJAZDOWKI RICHARD C ,  WARKENTIN DAVID J ,  WEBB R KYLE

IPC: H01S3/034 ,  G03F7/20 ,  H01S3/00 ,  H01S3/225 ,  H01S3/22

CPC classification number: G03F7/7055 ,  H01S3/005 ,  H01S3/225

Abstract: The present invention provides long life optics for a modular, high repetition rate, ultraviolet gas discharge laser systems (Fig. 1B) producing a high repetition rate high power output beam (38). The invention includes solutions to a surface damage problem discovered by Applicants on CaF2 optics (4260) (422)(424)(426) located in high pulse intensity sections (10)(26) of the output beam (14C) of prototype laser systems. Embodiments include an enclosed (4) and purged beam path (14C) with beam pointing control (40A) (40B)(6) for beam delivery of billions of output laser pulses (38). Optical components and modules described herein are capable of controlling ultraviolet laser output pulses (14A) with wavelength less than 200nm with average output pulse intensities greater than 1.75x10 Watts/cm and with peak intensity or greater 3.5x10 Watts/cm for many billions of pulses (14A) as compared to prior art components and modules which failed after only a few minutes in these pulse intensities.

Abstract translation: 本发明提供了用于产生高重复率高功率输出光束（38）的模块化高重复率紫外线气体放电激光系统（图1B）的长寿命光学器件。 本发明包括由原始激光系统的输出光束（14C）的高脉冲强度部分（10）（26）中的CaF2光学器件（4260）（422）（424）（426）发现的由申请人发现的表面损伤问题的解决方案 。 实施例包括具有用于束输送数十亿个输出激光脉冲（38）的光束指向控制（40A）（40B）（6））的封闭（4）和净化光束路径（14C）。 本文所述的光学部件和模块能够控制波长小于200nm的紫外激光输出脉冲（14A），平均输出脉冲强度大于1.75×10 6瓦/ cm 2，峰值强度或更大的3.5×10 6 与现有技术的元件和模块相比，在这些脉冲强度仅在几分钟之后就失败了，数十亿脉冲（14A）的功率>瓦特/平方厘米（2）。

公开(公告)号：WO0198012A3

公开(公告)日：2002-05-16

申请号：PCT/US0116985

申请日：2001-05-23

Applicant: CYMER INC ,  NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

Inventor： NEWMAN PETER C ,  DUFFEY THOMAS P ,  PARTLO WILLIAM N ,  SANDSTROM RICHARD L ,  MECHER PAUL C ,  JOHNS DAVID M ,  SAETHRE ROBERT B ,  FLEUROV VLADIMIR B ,  NESS RICHARD M ,  RETTIG CURTIS L ,  SHANNON ROBERT A ,  UJAZDOWSKI RICHARD C ,  ROKNI SHAHRYAR ,  PAN XIAOJIANG J ,  KULGEYKO VLADIMIR ,  SMITH SCOTT T ,  ANDERSON STUART L ,  ALGOTS JOHN M ,  SPANGLER RONALD L ,  FOMENKOV IGOR V

IPC: H01S3/134 ,  G01J1/42 ,  G01J9/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/131 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225

CPC classification number: H01S3/225 ,  G01J1/4257 ,  G01J3/027 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0387 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2308

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract translation: 本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。 优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。 具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。 在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

公开(公告)号：WO2006060359A3

公开(公告)日：2009-04-16

申请号：PCT/US2005043055

申请日：2005-11-28

Applicant: CYMER INC ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  ALGOTS J MARTIN ,  TRINTCHOUK FEDOR

Inventor： SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  ALGOTS J MARTIN ,  TRINTCHOUK FEDOR

IPC: G02B5/04 ,  H01S3/08

CPC classification number: H01S3/08009 ,  H01S3/08031 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055

Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.

Abstract translation: 公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可以包括包含在线窄模块内的分散中心波长选择光学器件，选择 用于每个脉冲的至少一个中心波长至少部分地由包含分散波长选择光学色散表面上的各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述色散表面的曲率。 第一种方式可以修改第一带宽度量，并且第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。 第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含光谱强度的某些选定百分比（EX％）的宽度。 第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致垂直于第一维度改变。 激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。 第一分散光学弯曲机构可以改变分散表面在第一尺寸中的曲率，而第二分散光学弯曲机构的第二尺寸大体上平行于第一尺寸。 激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到分散中心波长选择光学器件。 弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

公开(公告)号：WO2008105989A3

公开(公告)日：2009-02-19

申请号：PCT/US2008001349

申请日：2008-02-01

Applicant: CYMER INC ,  BYKANOV ALEXANDER N ,  BOWERING NORBERT R ,  FOMENKOV IGOR V ,  BRANDT DAVID C ,  ERSHOV ALEXANDER I ,  KHODYKIN OLEH V ,  PARTLO WILLIAM N

Inventor： BYKANOV ALEXANDER N ,  BOWERING NORBERT R ,  FOMENKOV IGOR V ,  BRANDT DAVID C ,  ERSHOV ALEXANDER I ,  KHODYKIN OLEH V ,  PARTLO WILLIAM N

IPC: G01J3/10

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

Abstract: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

Abstract translation: 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定的实施方案中，气体可以包含大于50体积％的氢气。

公开(公告)号：WO2007149282A3

公开(公告)日：2008-11-06

申请号：PCT/US2007013875

申请日：2007-06-11

Applicant: CYMER INC ,  FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

Inventor： FOMENKOV IGOR V ,  PARTLO WILLIAM N ,  REILEY DANIEL J ,  HOWEY JAMES K ,  AGULIAR STANLEY C

IPC: H01S3/22

CPC classification number: H01S3/225 ,  H01S3/03 ,  H01S3/034 ,  H01S3/08009 ,  H01S3/137 ,  H01S3/2256

Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract translation: 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。