Abstract:
The present invention aims to provide electroconductive microparticles which are less likely to cause disconnection due to breakage of connection interfaces between electrodes and the electroconductive microparticles even under application of an impact by dropping or the like and are less likely to be fatigued even after repetitive heating and cooling, and an anisotropic electroconductive material and an electroconductive connection structure each produced using the electroconductive microparticles. The present invention relates to electroconductive microparticles each including at least an electroconductive metal layer, a barrier layer, a copper layer, and a solder layer containing tin that are laminated in said order on a surface of a core particle made of a resin or metal, the copper layer and the solder layer being in contact with each other directly, the copper layer directly in contact with the solder layer containing copper at a ratio of 0.5 to 5 % by weight relative to tin contained in the solder layer.
Abstract:
An adhesive film can ensure reliable continuity even if a filler and a binder composition are not sufficiently removed from between a wiring board and a semiconductor chip during flip-chip mounting of the semiconductor chip on the wiring board using an adhesive film containing a non-conductive filler. The adhesive film is formed from a binder composition including an epoxy compound, a curing agent, and the filler. The amount of the filler contained with respect to a total amount of the epoxy compound, the curing agent, and the filler is 10 to 70 mass%. The filler includes first non-conductive inorganic particles having an average particle size of 0.5 to 1.0 µm, and conductive particles formed by subjecting second non-conductive inorganic particles having an average particle size of 0.5 to 1.0 µm to an electroless plating treatment so that the average particle size of the conductive particles does not exceed 1.5 µm. The conductive particles is contained in an amount of 10 to 60 mass% of the filler.
Abstract:
An object of the present invention is to provide a polymer particulate material with a low compression modulus and a high recovery rate from compression deformation. The present invention provides a polymer particulate material obtainable by co-polymerizing comonomer components including a polyfunctional (meth)acrylate having a structure represented by the below formulas (1), (2) or (3), and a monofunctional (meth)acrylate monomer having a structure represented by the below formula (4), the polymer particulate material shows a recovery rate from compressive deformation of 70% or higher:
In the formula (1), n represents an integer within the range of 4 to 10. In the formula (2), R11 represents a hydrogen atom or a C1-4 alkyl group, R12, R13 and R14 each represent a C1-4 alkylene group, and R15, R16 and R17 each represent a hydrogen atom or a methyl group. In the formula (3), R3, R4, R5 and R6 each represent a C1-4 alkylene group, and R7, R8, R9 and R10 each represent a hydrogen atom or a methyl group. In the formula (4), R1 represents a hydrogen atom or a methyl group, and R2 represents a C5-18 alkyl group.
Abstract:
An adhesive film can ensure reliable continuity even if a filler and a binder composition are not sufficiently removed from between a wiring board and a semiconductor chip during flip-chip mounting of the semiconductor chip on the wiring board using an adhesive film containing a non-conductive filler. The adhesive film is formed from a binder composition including an epoxy compound, a curing agent, and the filler. The amount of the filler contained with respect to a total amount of the epoxy compound, the curing agent, and the filler is 10 to 70 mass%. The filler includes first non-conductive inorganic particles having an average particle size of 0.5 to 1.0 µm, and conductive particles formed by subjecting second non-conductive inorganic particles having an average particle size of 0.5 to 1.0 µm to an electroless plating treatment so that the average particle size of the conductive particles does not exceed 1.5 µm. The conductive particles is contained in an amount of 10 to 60 mass% of the filler.