Photodelineable coatings from hydrogen silsesquioxane resin
    9.
    发明公开
    Photodelineable coatings from hydrogen silsesquioxane resin 失效
    Photostrukturierbare Beschichtungen auf Basis eines Wasserstoff-Silsesquioxanharzes。

    公开(公告)号:EP0510872A1

    公开(公告)日:1992-10-28

    申请号:EP92303413.6

    申请日:1992-04-15

    IPC分类号: G03F7/075

    CPC分类号: G03F7/0757

    摘要: The present invention relates to a method of forming patterned coatings on substrates, especially electronic devices, by negative resist techniques. The method comprises applying a preceramic coating comprising hydrogen silsesquioxane resin and an initiator onto the substrate and then radiating a selected region of the coating for a time sufficient to cure the resin. The uncured coating is then rinsed away leaving the patterned coating.

    摘要翻译: 本发明涉及通过负型抗蚀剂技术在衬底上,特别是电子器件上形成图案化涂层的方法。 该方法包括将包含氢倍半硅氧烷树脂和引发剂的预陶瓷涂层施加到基底上,然后将涂层的选定区域辐射足以固化树脂的时间。 然后将未固化的涂层冲洗掉,留下图案化的涂层。