METHOD AND DEVICE FOR MEASURING TEMPERATURE DURING DEPOSITION OF SEMICONDUCTOR
    6.
    发明公开
    METHOD AND DEVICE FOR MEASURING TEMPERATURE DURING DEPOSITION OF SEMICONDUCTOR 有权
    方法和装置用于测量温度的半导体的分离过程中,

    公开(公告)号:EP2372752A1

    公开(公告)日:2011-10-05

    申请号:EP08879154.6

    申请日:2008-12-26

    申请人: Y Systems Ltd.

    发明人: Yves, Lacroix

    IPC分类号: H01L21/205 G01K11/12

    摘要: Provided is a method and a device for measuring a temperature which can recognize the temperature of a semiconductor layer directly with high precision when the semiconductor layer is formed by deposition. The quantity of laser light transmitted a semiconductor layer is monitored by a photodetector by using laser light having a wavelength λs at which the transmittance of light changes abruptly when the temperature of the semiconductor layer reaches Ts during or after deposition. When heat being given to the semiconductor layer is changed, the quantity of laser light monitored by the photodetector changes abruptly when the temperature of the semiconductor layer reaches Ts at a time A, B or C. Consequently, the fact that the temperature of the semiconductor layer reached Ts at a time A, B or C can be recognized exactly, and an error in temperature information observed by a device for measuring temperature variations can be calibrated, for example.

    摘要翻译: 本发明提供一种方法和用于测量能够识别直接在半导体层是通过淀积形成具有高精度的半导体层的温度的温度的装置。 激光反式量mitted的半导体层是通过光检测器通过使用具有激光监控的波长的在其中的光的变化的透射率突然当在沉积期间或之后的半导体层的温度达到TS。 当被给予到半导体层的热变化时,激光光由光电检测突然变化当半导体层的温度在时刻A,B或C.因此,factthat半导体的温度达到TS监视的量 在时刻A,B或C达到的TS层可以准确地被识别,并且在由设备用于测量温度的变化观察到的温度信息的误差可以被校准,例如。

    Apparatus and method for evaluating optical properties of an LED and method for manufacturing an LED device
    7.
    发明公开
    Apparatus and method for evaluating optical properties of an LED and method for manufacturing an LED device 审中-公开
    装置和方法的LED的光学特性评价和方法,用于制造LED器件

    公开(公告)号:EP2354773A1

    公开(公告)日:2011-08-10

    申请号:EP11153302.2

    申请日:2011-02-04

    IPC分类号: G01J1/04

    摘要: An optical property evaluation apparatus (100) includes: a light conversion filter (151,152) converting light emitted from an LED chip (50) or a bare LED package, which is to be evaluated, into a different wavelength of light, and emitting a specific color of light; and an optical property measurement unit (130,140) receiving the specific color of light emitted from the light conversion filter and measuring the optical properties of the received light.

    摘要翻译: 一种光学性能评估设备(100)包括:光转换滤光器(151,152)从到LED芯片(50)或裸LED封装件发射的光转换,所有要被评估的,成不同波长的光,并且发射特定 光的颜色; 和光学性能测量单元(130,140)接收来自所述光转换滤光器发射的光的特定颜色并测量所接收的光的光学特性。

    DEFECTIVE PARTICLE MEASURING APPARATUS AND DEFECTIVE PARTICLE MEASURING METHOD
    9.
    发明公开
    DEFECTIVE PARTICLE MEASURING APPARATUS AND DEFECTIVE PARTICLE MEASURING METHOD 审中-公开
    VORRICHTUNG VERFAHREN ZUR MESSUNG DEFEKTER PARTIKEL

    公开(公告)号:EP1862790A1

    公开(公告)日:2007-12-05

    申请号:EP06713025.2

    申请日:2006-02-03

    发明人: MORIYA, Kazuo,

    摘要: A defective particle measuring apparatus that irradiates focused laser light on a sample 14, images scattered light from the sample 14, and measures defective particles in the sample 14 based on the image result, includes a position deviation computing portion 31 which, based on an in-plane intensity distribution of scattered light of each defective particle that is imaged, obtains a deviation from a focal point position on an image point side of the scattered light of each defective particle and calculates a position deviation amount in a depth direction of the defective particle corresponding to the deviation from the focal point position, a light intensity correcting portion 32 for correcting the light intensity of the scattered light of the defective particle corresponding to the position deviation amount in the depth direction, and a size determining portion 33 for determining the defective particle size based on the light intensity corrected by the light intensity correcting portion 32. Thus, the size of the defective particles can be determined at a high precision by a simple constitution in a short time, and density distribution of the defective particles can be obtained.

    摘要翻译: 一种将聚焦激光照射在样品14上的有缺陷的粒子测量装置,根据图像结果对来自样品14的散射光进行成像,并测量样品14中的有缺陷的颗粒,包括位置偏差运算部31, 对成像的各缺陷粒子的散射光的平面强度分布,求出与各缺陷粒子的散射光的像点侧的焦点位置的偏差,算出缺陷粒子的深度方向的位置偏移量 对应于与焦点位置的偏差的光强度校正部分32,用于校正与深度方向上的位置偏差量相对应的缺陷颗粒的散射光的光强度;以及尺寸确定部分33,用于确定缺陷 基于由光强度校正端口校正的光强度的粒径 因此,可以通过简单的结构在短时间内以高精度确定有缺陷的颗粒的尺寸,并且可以获得缺陷颗粒的密度分布。