公开(公告)号：US09141003B2

公开(公告)日：2015-09-22

申请号：US12902847

申请日：2010-10-12

申请人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G01B11/14 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/7085 ,  G01B9/02 ,  G01B9/02049 ,  G01B11/14 ,  G01B2290/70 ,  G03F7/70766 ,  G03F7/70775

摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.

摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。

公开(公告)号：US08687166B2

公开(公告)日：2014-04-01

申请号：US11802770

申请日：2007-05-24

申请人： Peter Paul Steijaert ,  Wilhelmus Josephus Box ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Albertus Adrianus Smits

发明人： Peter Paul Steijaert ,  Wilhelmus Josephus Box ,  Emiel Jozef Melanie Eussen ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Albertus Adrianus Smits

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/68

CPC分类号： G03F7/70775

摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

摘要翻译： 公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

公开(公告)号：US08457385B2

公开(公告)日：2013-06-04

申请号：US13019587

申请日：2011-02-02

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US08451454B2

公开(公告)日：2013-05-28

申请号：US12268659

申请日：2008-11-11

申请人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

发明人： Willem Herman Gertruda Anna Koenen ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC分类号： G01B11/14 ,  G03B27/42 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70508 ,  G03F7/7085

摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.

公开(公告)号：US08279407B2

公开(公告)日：2012-10-02

申请号：US12408936

申请日：2009-03-23

申请人： Ramidin Izair Kamidi ,  Henrikus Herman Marie Cox ,  Emiel Jozef Melanie Eussen ,  Ronald Casper Kunst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel François Heertjes ,  Mark Constant Johannes Baggen

发明人： Ramidin Izair Kamidi ,  Henrikus Herman Marie Cox ,  Emiel Jozef Melanie Eussen ,  Ronald Casper Kunst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marcel François Heertjes ,  Mark Constant Johannes Baggen

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70775

摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.

摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。

公开(公告)号：US20110216300A1

公开(公告)日：2011-09-08

申请号：US13022498

申请日：2011-02-07

申请人： Hans BUTLER ,  Engelbertus Antonius Fransiscus VAN DER PASCH

发明人： Hans BUTLER ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC分类号： G03B27/58 ,  G01B11/14

CPC分类号： G01B11/14 ,  G03B27/58 ,  G03F7/70775

摘要： A lithographic apparatus includes a support configured to hold an object, the support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal into a combined measurement signal representative of the position of the support relative to the reference structure in the direction.

摘要翻译： 光刻设备包括被配置为保持物体的支撑件，所述支撑件可相对于参考结构在一个方向上移动; 第一位置测量系统，被配置为在第一频率范围内提供第一测量信号，所述第一测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 第二位置测量系统，被配置为在第二频率范围内提供第二测量信号，所述第二测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 以及处理器，其被配置为（a）对所述第一测量信号进行滤波，以便衰减具有在所述第二频率范围内的频率的信号分量，（b）滤除所述第二测量信号，以便衰减具有所述第一频率的信号分量 频率范围，以及（c）将滤波的第一测量信号和滤波的第二测量信号组合成表示支撑件相对于参考结构在该方向上的位置的组合测量信号。

公开(公告)号：US20110008483A1

公开(公告)日：2011-01-13

申请号：US12821806

申请日：2010-06-23

申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

IPC分类号： B29C59/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

公开(公告)号：US20090237634A1

公开(公告)日：2009-09-24

申请号：US12392852

申请日：2009-02-25

申请人： Emiel Jozef Melanie EUSSEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Robbert Edgar VAN LEEUWEN ,  Renatus Gerardus KLAVER ,  Martijn Robert HAMERS

发明人： Emiel Jozef Melanie EUSSEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Robbert Edgar VAN LEEUWEN ,  Renatus Gerardus KLAVER ,  Martijn Robert HAMERS

IPC分类号： G03B27/54 ,  G01B11/14 ,  G06F19/00

CPC分类号： G03B27/54 ,  G01D5/24461 ,  G01D5/347 ,  G03F7/70775

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号。 测量系统包括光源和传感器。 光源和传感器安装在可移动物体之一或基本上固定的框架上。 测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。 光源被配置为朝向参考对象发射光束。 传感器被配置为检测由参考对象反射的光源的光。 该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。

公开(公告)号：US20080105026A1

公开(公告)日：2008-05-08

申请号：US11594230

申请日：2006-11-08

申请人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Onno Bram Loopstra

发明人： Erik Roelof Loopstra ,  Emiel Jozef Melanie Eussen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Onno Bram Loopstra

IPC分类号： G01B3/00

CPC分类号： G03F9/7011 ,  G03F7/70516 ,  G03F7/70775 ,  G03F9/7019

摘要： The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.

摘要翻译： 本发明涉及一种用于在两个相邻校准位置之间校准编码器测量系统的光栅的方法，所述方法包括沿着传感器对象中的另一个移动包括编码器型传感器和光栅的传感器对象中的一个， 光栅的速度，其中选择速度，使得光栅中基本上延伸的距离小于两个校准位置之间的距离的干扰不能或仅部分地由传感器对象和光栅之一进行跟踪，并且测量 在两个校准位置之间的多个位置移动传感器对象相对于光栅的位置。

公开(公告)号：US07362446B2

公开(公告)日：2008-04-22

申请号：US11226460

申请日：2005-09-15

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Erik Roelof Loopstra

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Erik Roelof Loopstra

IPC分类号： G01B11/02

CPC分类号： G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

摘要： A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

摘要翻译： 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。