Recyclable formwork
    2.
    发明授权
    Recyclable formwork 有权
    可回收模板

    公开(公告)号:US09074378B2

    公开(公告)日:2015-07-07

    申请号:US14236449

    申请日:2012-08-03

    摘要: A recyclable formwork can suitably detect temperature of concrete cast contacting with the formwork in a field without spoiling the other functions of the formwork. The recyclable formwork is provided with: a main unit (1) including a plurality of ribs (3) and (4); a case (7) being housed between the ribs (3) and (4), the case (7) being fixed on a non-contact surface (1a); and a circuit housed in the case (7). A through-hole (16) is opened at a position corresponding to where the case (7) is fixed, the through-hole (16) penetrating the main unit (1) from the non-contact surface (1a) to a contact surface (2). A sensor-housing case (17) is provided with a lower portion of the case (7), the sensor-housing case (17) being inserted into the through-hole (16), a bottom face of the sensor-housing case (17) facing concrete. And, a concrete temperature-detecting sensor (19) for detecting surface temperature of the concrete is housed in the sensor-housing case (17).

    摘要翻译: 可回收的模板可以适当地检测在一个领域与模板接触的混凝土浇铸温度,而不会破坏模板的其他功能。 可回收模板设置有:包括多个肋(3)和(4)的主单元(1); 壳体(7)容纳在所述肋(3)和(4)之间,所述壳体(7)固定在非接触表面(1a)上; 和容纳在壳体(7)中的电路。 在与壳体(7)固定的位置对应的通孔(16)中,从非接触面(1a)穿过主体单元(1)的通孔(16)到接触面 (2)。 传感器外壳(17)设置有壳体(7)的下部,传感器外壳(17)插入通孔(16)中,传感器外壳的底面 17)面对混凝土。 并且,用于检测混凝土的表面温度的混凝土温度检测传感器(19)容纳在传感器外壳(17)中。

    RECYCLABLE FORMWORK
    4.
    发明申请
    RECYCLABLE FORMWORK 有权
    可循环的工作

    公开(公告)号:US20130323343A1

    公开(公告)日:2013-12-05

    申请号:US13993467

    申请日:2011-12-15

    IPC分类号: E04G9/00

    摘要: There is disclosed to provide a recyclable formwork that can add the new function without spoiling the other functions of the recyclable formwork. The recyclable formwork includes: a main unit including a contact surface contacting with cast concrete, a non-contact surface being parallel and opposite to the contact surface, and a plurality of ribs outstanding from the non-contact surface to a side opposite to the non-contact surface and reinforcing the main unit; a case being housed between the plurality of ribs and being fixed on a side of the non-contact surface; and a circuit being stored in the case. A first highest point of the case at the side of the non-contact surface is not higher than a second highest point of upper ends of the plurality of the ribs.

    摘要翻译: 披露了提供可回收的模板,可以添加新功能,而不会破坏可回收模板的其他功能。 可回收模板包括:主体,其包括与浇注混凝土接触的接触表面,与接触表面平行且相对的非接触表面,以及从非接触表面突出到与非接触表面相对的一侧的多个肋 接触表面,加强主体; 壳体容纳在所述多个肋之间并固定在所述非接触表面的一侧; 并且存储在该壳体中的电路。 在非接触表面侧的情况下的第一最高点不高于多个肋的上端的第二高点。

    DEGREASING COMPOSITION AND PRODUCTION METHOD THEREOF
    5.
    发明申请
    DEGREASING COMPOSITION AND PRODUCTION METHOD THEREOF 审中-公开
    退火组合物及其生产方法

    公开(公告)号:US20120115766A1

    公开(公告)日:2012-05-10

    申请号:US13375095

    申请日:2010-05-31

    IPC分类号: C23G1/28

    摘要: As a method for producing a degreasing composition in the form of a slurry, crystallization of the composition during low-temperature storage being suppressed and the composition being used for preparing a cleaning liquid having little environmental impact, provided is a method including a step of obtaining a slurry by mixing a first liquid and a powdery silicate having a particle diameter ranging from 0.2 mm to 10 mm, wherein the first liquid contains an alkaline component composed of at least one of sodium hydroxide and potassium hydroxide, an alcohol having three or fewer carbon atoms, and water; and the degreasing composition contains, with respect to the total composition, 10 mass % to 60 mass % of the alkaline component, 0.1 mass % to 5 mass % of the alcohol, 1 mass % to 50 mass % of the silicate, and 20 mass % to 50 mass % of water including hydration water of the silicate, and contains no chelating agent.

    摘要翻译: 作为浆料形式的脱脂组合物的制造方法,可以抑制低温保存时的组合物的结晶化和用于制备环境影响小的清洗液的组合物,是包括以下步骤的方法: 通过混合第一液体和粒径范围为0.2mm至10mm的粉状硅酸盐的浆料,其中第一液体含有由氢氧化钠和氢氧化钾中的至少一种组成的碱性组分,具有三个或更少碳的醇 原子和水; 脱脂组合物相对于总成分含有10质量%〜60质量%的碱成分,0.1质量%〜5质量%的醇,1质量%〜50质量%的硅酸盐和20质量% 含水量为50〜50质量%的硅酸盐水合水,不含螯合剂。

    Plasma Processing Method
    6.
    发明申请
    Plasma Processing Method 审中-公开
    等离子体处理方法

    公开(公告)号:US20100297783A1

    公开(公告)日:2010-11-25

    申请号:US12849233

    申请日:2010-08-03

    IPC分类号: H01L21/302

    摘要: A method for performing a plasma process using a plasma processing apparatus which includes a vacuum process chamber, an exhaust device, a mass flow controller supplying a process gas, a stage electrode which receives and holds a workpiece by adsorption, a transfer device, and a high-frequency electrical source. The method includes a first step of performing the plasma process for the workpiece in the vacuum process chamber by a corresponding recipe of predetermined recipes, a second step of acquiring apparatus parameters showing the condition of the plasma processing apparatus when a specific recipe of the predetermined recipes is executed to diagnose whether the condition of the plasma processing apparatus is good or not based on the acquired apparatus parameters.

    摘要翻译: 一种使用等离子体处理装置进行等离子体处理的方法,所述等离子体处理装置包括真空处理室,排气装置,供给处理气体的质量流量控制器,通过吸附接收和保持工件的载物台电极,转印装置和 高频电源。 该方法包括:通过预定配方的相应配方对真空处理室中的工件进行等离子体处理的第一步骤;获取当预定配方的特定配方时显示等离子体处理装置的状态的装置参数的第二步骤 被执行以基于所获取的装置参数来诊断等离子体处理装置的状况是否良好。

    Process monitoring device for sample processing apparatus and control method of sample processing apparatus
    7.
    发明授权
    Process monitoring device for sample processing apparatus and control method of sample processing apparatus 有权
    样品处理装置的过程监控装置和样品处理装置的控制方法

    公开(公告)号:US07376479B2

    公开(公告)日:2008-05-20

    申请号:US11645680

    申请日:2006-12-27

    IPC分类号: G06F19/00

    摘要: A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.

    摘要翻译: 一种等离子体处理方法,用于通过使用基于批量单位的等离子体处理样品,包括:使用多个传感器检测作为与样品的处理状态有关的监测数据的多种信息; 选择检测到的监视数据的检测时间范围; 将所选择的检测时间范围内的监视数据转换成转换信号; 基于转换的信号预测样本的图案形状; 计算处理参数的校正量,以减小预测图案形状与标准值之间的偏差; 并且当下一个批次的下一个样本的种类与样本不同时,转换通过计算操作获得的处理参数的校正量,从而使用用于下一个样本的处理的转换的处理参数的校正量。

    Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus
    8.
    发明申请
    Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus 失效
    蚀刻装置,自偏压测定方法以及蚀刻装置的监视方法

    公开(公告)号:US20070217118A1

    公开(公告)日:2007-09-20

    申请号:US11506791

    申请日:2006-08-21

    IPC分类号: H01T23/00

    CPC分类号: H01L21/6833 H02N13/00

    摘要: The invention provides a means for estimating a self-bias voltage under arbitrary etching conditions via a simple procedure. The present invention provides a method for measuring self-bias voltage of an etching apparatus comprising an electrostatic chuck mechanism 1 and 10 for chucking a sample 2, a mechanism 13 and 14 for supplying cooling gas 12 to a rear surface of the sample 2 and controlling the pressure thereof, and a means for measuring the relative force of electrostatic chuck of the sample based on the rear surface pressure control status of the sample 2 being processed, wherein the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control of the sample 2 when high-frequency bias power is applied to the sample 2 being processed, and the relative force of electrostatic chuck of the sample and the electrostatic chuck voltage corresponding to the force of electrostatic chuck are acquired based on the rear surface pressure control status of the sample when high-frequency bias power is not applied to the sample being processed, and the self-bias voltage is estimated using the acquired forces of electrostatic chuck and the electrostatic chuck voltages corresponding to the two statuses.

    摘要翻译: 本发明提供了一种用于通过简单的过程在任意蚀刻条件下估计自偏压的装置。 本发明提供了一种用于测量蚀刻装置的自偏压的方法,该蚀刻装置包括用于夹持样品2的静电卡盘机构1和10,用于将冷却气体12供应到样品2的后表面的机构13和14,并且控制 其压力,以及用于根据正在处理的样品2的背面压力控制状态来测量样品的静电卡盘的相对力的装置,其中样品的静电卡盘的相对力和对应于 当对待处理的样品2施加高频偏置功率时,基于样品2的背面压力控制获取静电卡盘的力,并且将样品的静电卡盘与静电卡盘电压的相对力对应于 基于高频时样品的背面压力控制状态获取静电卡盘的力 y偏压功率不会被施加到正在处理的样品,并且使用所获取的静电卡盘的力和对应于两种状态的静电卡盘电压来估计自偏压。

    Plasma Processing Method And Plasma Processing Apparatus
    9.
    发明申请
    Plasma Processing Method And Plasma Processing Apparatus 失效
    等离子体处理方法和等离子体处理装置

    公开(公告)号:US20070184562A1

    公开(公告)日:2007-08-09

    申请号:US11696827

    申请日:2007-04-05

    IPC分类号: H01L21/00 H01L21/302

    摘要: A plasma processing method for processing a sample by applying a high-frequency bias power periodically for each one period (T) which is divided along a time axis into a first sub-period (T1) for which feedback control of a CD gain is executed, a second sub-period (T2) for which feedback control of a select ratio is executed, and a third sub-period (T3) for which feedback control of both the CD gain and the select ratio are executed. The applied power is set at a large value in the first sub-period, and a duty ratio T1/T is controlled in accordance with the CD gain. A plurality of samples are processed with preset process conditions, and feedback control for each processing unit of the samples is executed in accordance with a processing state of each of the samples so that an average applied power over the one period (T) is constant.

    摘要翻译: 一种等离子体处理方法,用于通过对沿着时间轴分割的每个周期(T)周期性地施加高频偏置功率来对CD增益的反馈控制的第一子周期(T 1)为 执行选择比率的反馈控制的第二子时段(T 2)和执行CD增益和选择比率的反馈控制的第三子时段(T 3)。 所施加的功率在第一子周期中被设置为大的值,并且根据CD增益来控制占空比T 1 / T。 以预设的处理条件处理多个样本,并且根据每个样本的处理状态执行样本的每个处理单元的反馈控制,使得在一个周期(T)的平均施加功率是恒定的。

    Process monitoring device for sample processing apparatus and control method of sample processing apparatus
    10.
    发明授权
    Process monitoring device for sample processing apparatus and control method of sample processing apparatus 有权
    样品处理装置的过程监控装置和样品处理装置的控制方法

    公开(公告)号:US07158848B2

    公开(公告)日:2007-01-02

    申请号:US11356099

    申请日:2006-02-17

    IPC分类号: G06F19/00

    摘要: A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.

    摘要翻译: 一种用于处理真空容器内的样品的等离子体处理装置,包括:多个传感器,用于检测与样品的处理状态相关的多种信息作为监测数据; 数据选择装置,用于选择用于监测等离子体处理装置的如此检测的监视数据的检测时间范围; 用于将所选择的检测时间范围内的监视数据转换为有效信号的信号滤波器; 模型表达单元,用于基于有效信号产生样本的图案化物理形状的预测值; 以及用于显示图案化物理形状预测值的显示屏幕; 其中显示屏幕在样品处理后不测量图案形状,显示图案化的物理形状预测值。