Abstract:
Methods and apparatus for use in signal timing analysis with respect to a circuit having at least one gate are provided. In one aspect, the invention includes the step of determining a first constraint slew sensitivity value and a second constraint slew sensitivity value for the at least one gate according to a specified bounding technique. Then, a representative signal for the gate is computed in accordance with the first and second values including an arrival time and slew rate, wherein the representative signal bounds signal paths by bounding a maximum slew sensitivity path and a minimum slew sensitivity path. Such a representative signal may be computed for a worst case late-mode analysis and/or a best case early-mode analysis. The bounding technique may be selected by a user at the time the user inputs the schematic of the circuit on which timing analysis is to be performed. The invention provides for the use of bounding techniques such as, for example, maximum slew, minimum slew, half envelope, full envelope, modified half envelope, modified max slew, modified min slew, least upper bound, and greatest lower bound. The invention may preferably be employed in accordance with static timing analysis associated with VLSI circuit design.
Abstract:
A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.
Abstract:
A system and method of employing patterning process statistics to evaluate layouts for intersect area analysis includes applying Optical Proximity Correction (OPC) to the layout, simulating images formed by the mask and applying patterning process variation distributions to influence and determine corrective actions taken to improve and optimize the rules for compliance by the layout. The process variation distributions are mapped to an intersect area distribution by creating a histogram based upon a plurality of processes for an intersect area. The intersect area is analyzed using the histogram to provide ground rule waivers and optimization.
Abstract:
A novel method and system for layout optimization relative to lithographic process windows which facilitates lithographic constraints to be non-localized in order to impart a capability of printing a given circuit with a process window beyond the process windows which are attainable with conventional simplified design rules.
Abstract:
A new clock distribution network design for VLSI circuits which effectively reduces skew without the area and power penalty associated with prior clock designs. Two wires emanating from the clock in opposite directions or, alternatively, two wires connected in series and running parallel, are used to route clock signals from the clock source to the next routing segment. The next routing segment routes clock signals to the tapping point near the circuit component by two emanated wires from the previous routing segment. Clock signals from the routing segments are fed through two-input NOR gates (alternatively, two-input NAND gates) to the clock pins. The clock signal arrival time is roughly equal to the simultaneous switching gate delay plus the average arrival times from the two paths, which turns out approximately the same across different tapping points, thus minimizing clock skews. Narrow wires may be used for routing, resulting in moderate power consumption.
Abstract:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.
Abstract:
A method of physical design for integrated circuit (IC) chip fabrication, physical design system and program product therefor. A design shape is fragmented into segments for Optical Proximity Correction (OPC) and a harmonic mean of the segments is determined. Electrical intent is determined for the shape and a harmonic mean is determined for the segments. Segments may be moved based on a effect on the harmonic mean from moving the segments, measured using a harmonic mean cost function. Finally segmented shapes are passed to OPC.
Abstract:
Techniques for improving circuit design and production are provided. In one aspect, a method for virtual fabrication of a process-sensitive circuit is provided. The method comprises the following steps. Based on a physical layout diagram of the circuit, a virtual representation of the fabricated circuit is obtained that accounts for one or more variations that can occur during a circuit production process. A quality-based metric is used to project a production yield for the virtual representation of the fabricated circuit. The physical layout diagram and/or the production process are modified. The obtaining, using and modifying steps are repeated until a desired projected production yield is attained.
Abstract:
A methodology for obtaining improved prediction of CA resistance in electronic circuits and, particularly, an improved CA resistance model adapted to capture larger than anticipated “out of spec” regime. In one embodiment, a novel bucketization scheme is implemented that is codified to provide a circuit designer with considerably better design options for handling large CA variability as seen through the design manual. The tools developed for modeling the impact of CA variable resistance phenomena provide developers with a resistance model, such as conventionally known, modified with a new CA model Basis including a novel CA intrinsic resistance model, and, a novel CA layout bucketization model.
Abstract:
A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency.