公开(公告)号：US09324502B2

公开(公告)日：2016-04-26

申请号：US13880762

申请日：2011-09-09

申请人： Naoshi Yasuda ,  Takashi Chiba ,  Kazuyoshi Okada ,  Kuniyasu Hiraiwa

发明人： Naoshi Yasuda ,  Takashi Chiba ,  Kazuyoshi Okada ,  Kuniyasu Hiraiwa

IPC分类号： H01G9/048 ,  H01G11/06 ,  H01G11/28 ,  H01G11/38 ,  H01G9/042 ,  H01G9/145 ,  H01G11/44

CPC分类号： H01G9/048 ,  H01G9/0425 ,  H01G9/145 ,  H01G11/06 ,  H01G11/28 ,  H01G11/38 ,  H01G11/44 ,  Y02E60/13

摘要： Provided is a lithium ion capacitor that can maintain a high capacity retention rate and suppress an increase in internal resistance even after high-load charging-discharging is repeated many times and that has long service life because the occurrence of a short circuit due to precipitation of lithium on the negative electrode is prevented.The lithium ion capacitor comprises a positive electrode, a negative electrode, and an electrolyte solution, the negative electrode including a current collector and electrode layers that contain a negative electrode active material and are formed on front and back surfaces of the current collector, wherein, in the negative electrode, ratios of deviations of respective thicknesses of the electrode layers formed on the front and back surfaces of the current collector from an average of the thicknesses of the electrode layers to the average is −10 to 10%.

摘要翻译： 提供一种锂离子电容器，其能够维持高的容量保持率，并且即使在高负荷充电 - 放电重复多次之后也能抑制内部电阻的增加，并且由于发生由于沉淀引起的短路而具有长的使用寿命 防止负极上的锂。 锂离子电容器包括正极，负极和电解质溶液，负极包括集电体和含有负极活性材料并形成在集电体的前表面和后表面上的电极层，其中， 在负极中，形成在集电体的前表面和后表面上的电极层的各自厚度的偏差与电极层的平均厚度的平均值的比率为-10至10％。

公开(公告)号：US08580482B2

公开(公告)日：2013-11-12

申请号：US13338569

申请日：2011-12-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US08298341B2

公开(公告)日：2012-10-30

申请号：US12431232

申请日：2009-04-28

申请人： Hitoshi Katoh ,  Tsuneyuki Okabe ,  Kohichi Orito ,  Takashi Chiba

发明人： Hitoshi Katoh ,  Tsuneyuki Okabe ,  Kohichi Orito ,  Takashi Chiba

IPC分类号： C23G1/02

CPC分类号： C03C23/0075

摘要： A method is used for removing a metal contaminant deposited on a quartz member selected from the group consisting of a reaction tube, wafer boat, and heat-insulating cylinder of a vertical heat processing apparatus for a semiconductor process. The method includes obtaining the quartz member unattached to the vertical heat processing apparatus; then, performing diluted hydrofluoric acid cleaning of cleaning the quartz member by use of diluted hydrofluoric acid; then, performing first purified water cleaning of cleaning the quartz member by use of purified water; then, performing hydrochloric acid cleaning of cleaning the quartz member by use of hydrochloric acid; and then, performing second purified water cleaning of cleaning the quartz member by use of purified water.

摘要翻译： 一种方法用于去除沉积在选自由用于半导体工艺的垂直热处理装置的反应管，晶片舟和隔热圆柱体组成的组中的石英构件上的金属污染物。 该方法包括获得未连接到垂直热处理装置的石英构件; 然后，使用稀释的氢氟酸进行稀释的氢氟酸清洗来清洗石英部件; 然后，使用净化水进行清洗石英部件的第一净化水清洗; 然后用盐酸进行清洗石英部件的盐酸清洗; 然后进行使用净化水清洗石英部件的第二净化水清洗。

公开(公告)号：US08247165B2

公开(公告)日：2012-08-21

申请号：US10586187

申请日：2005-01-14

申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

IPC分类号： G03C1/00 ,  G03F7/00 ,  C08F18/20

CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

摘要翻译： 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

公开(公告)号：US08236868B2

公开(公告)日：2012-08-07

申请号：US12310638

申请日：2007-06-25

申请人： Tetsuya Watanabe ,  Takashi Chiba ,  Hiroyuki Otani

发明人： Tetsuya Watanabe ,  Takashi Chiba ,  Hiroyuki Otani

IPC分类号： C08G18/10

CPC分类号： C08G18/7685 ,  C08G18/10 ,  C08G18/4238 ,  C08G18/7678 ,  C08G2101/0083 ,  C08G2350/00 ,  C08L83/00 ,  C08G18/6644 ,  C08G18/305 ,  C08G18/664

摘要： Polyurethane elastomer foams can be prepared by mixing an isocyanate-terminated prepolymer obtained by reaction of a polyol with 3,3′-dimethylbiphenyl-4,4′-diisocyanate, with a foaming agent comprising a mixture of water, a low-molecular weight glycol having a molecular weight of 48-200, and a high-molecular weight glycol having a number average molecular weight Mn of 1000-3000 under stirring to conduct foaming reaction. The polyurethane elastomer foams so produced can have a high durability, particularly under a high load, even though a low-cost, easy-to-handle diisocyanate compound is used.

摘要翻译： 聚氨酯弹性体泡沫可以通过将通过多元醇与3,3'-二甲基联苯-4,4'-二异氰酸酯反应获得的异氰酸酯封端的预聚物与包含水，低分子量二醇的混合物的发泡剂混合来制备 分子量为48-200，搅拌下数均分子量Mn为1000-3000的高分子量二醇进行发泡反应。 即使使用低成本，易于处理的二异氰酸酯化合物，所生产的聚氨酯弹性体泡沫体也可以具有高耐久性，特别是在高负载下。

公开(公告)号：US20070243420A1

公开(公告)日：2007-10-18

申请号：US11576348

申请日：2005-10-04

申请人： Takashi Chiba ,  Jun Ariake ,  Naoki Honda

发明人： Takashi Chiba ,  Jun Ariake ,  Naoki Honda

IPC分类号： G11B5/706

CPC分类号： H01F10/16 ,  G11B5/656 ,  G11B5/851

摘要： A magnetic recording medium has a recording layer formed of a magnetic material represented by the following general formula: [(Co1-mPtm)1-nCrn]100-x-yTixOy, where m and n are atomic ratios, m is 0.2 or more and 0.4 or less, n is 0 or more and 0.1 or less, x is 9 at. % or more and 13 at. % or less, and y/x is 1.8 or more and 2.3 or less.

摘要翻译： 磁记录介质具有由以下通式表示的磁性材料形成的记录层：<？in-line-formula description =“In-line Formulas”end =“lead”？> [（Co＆lt; m-1）n-1 n-1 n-1 n-1 n-1 n-1 n + 其中m和n为原子比，m为0.2以上，m为0以上， 0.4以下，n为0以上且0.1以下，x为9at。 ％以上，13点。 ％以下，y / x为1.8以上且2.3以下。

公开(公告)号：US07121773B2

公开(公告)日：2006-10-17

申请号：US10674249

申请日：2003-09-29

申请人： Toshio Mikiya ,  Keisuke Shimada ,  Munenori Yamaguchi ,  Takashi Chiba ,  Kenji Ohtsuka

发明人： Toshio Mikiya ,  Keisuke Shimada ,  Munenori Yamaguchi ,  Takashi Chiba ,  Kenji Ohtsuka

IPC分类号： B23B39/00

CPC分类号： B25H1/0071 ,  B23Q11/04 ,  Y10T408/13 ,  Y10T408/14 ,  Y10T408/16 ,  Y10T408/165 ,  Y10T408/17 ,  Y10T408/554 ,  Y10T408/65 ,  Y10T408/6779

摘要： An electric drill apparatus having a low profile is provided which comprises an annular cutter, a motor for rotating the annular cutter, a rotary shaft assembly for rotating the annular cutter attached to its leading end about a rotating, a rotation reduction mechanism disposed between the motor and rotary shaft assembly for transmitting a driving force of the motor to the annular cutter through the rotary shaft assembly, a feed mechanism responsive to an operation of a manual handle, for moving the rotary shaft assembly along with a straight line to advance or retract the annular cutter attached to the rotary shaft assembly with respect to a workpiece, and an adhesion base for securing the electric drill apparatus to the workpiece. The annular cutter has a plurality of cutting blades comprised of cemented carbide tips fixed on its lower end, thereby it is capable of rotating at a high speed. The rotary shaft assembly has a rotating shaft which rotates in a direction different from that of a rotating shaft of the motor, thereby the drill apparatus has a low profile.

摘要翻译： 提供一种具有低轮廓的电钻装置，其包括环形切割器，用于旋转环形切割器的马达，用于旋转安装在其前端周围的旋转的环形切割器的旋转轴组件，设置在马达 以及用于通过旋转轴组件将电动机的驱动力传递到环形切割器的旋转轴组件，响应于手动手柄的操作的进给机构，用于沿着直线移动旋转轴组件以推进或缩回 环形切割器相对于工件附接到旋转轴组件，以及用于将电钻装置固定到工件的粘合基座。 环形切割器具有多个切割刀片，其由固定在其下端上的硬质合金刀头组成，从而能够高速旋转。 旋转轴组件具有沿与电动机的旋转轴不同的方向旋转的旋转轴，从而钻具具有低轮廓。

公开(公告)号：US20050009457A1

公开(公告)日：2005-01-13

申请号：US10885836

申请日：2004-07-07

申请人： Toshio Mikiya ,  Takashi Chiba ,  Atsushi Miura ,  Keiichi Murakami

发明人： Toshio Mikiya ,  Takashi Chiba ,  Atsushi Miura ,  Keiichi Murakami

IPC分类号： B24B21/20 ,  B24B23/06 ,  B24B31/00

CPC分类号： B24B21/20 ,  B24B23/06

摘要： A hand-held endless belt abrading machine comprises a base portion and a main portion, which portion is rotatable relative to the base portion around an axis extending in a forward and rearward direction of the abrading machine. The main portion comprises an air motor having a rotational shaft extending in a direction transverse to the abrading machine and projecting from the left end of the air motor, so that an abrading endless belt assembly drivingly connected to the output shaft is positioned to the left relative to the motor and the base portion which is held by a hand of an operator. When a left-handed person uses the abrading machine, the main portion is turned 180° relative to the base portion to shift the abrading endless belt assembly to the right relative to the base portion, thereby enabling the operator to readily observe the abrading belt assembly in operation.

公开(公告)号：USD491782S1

公开(公告)日：2004-06-22

申请号：US29185593

申请日：2003-07-01

申请人： Takashi Chiba ,  Atsushi Miura

设计人： Takashi Chiba ,  Atsushi Miura

公开(公告)号：US4866603A

公开(公告)日：1989-09-12

申请号：US147071

申请日：1988-01-20

申请人： Takashi Chiba

发明人： Takashi Chiba

IPC分类号： G06F12/04 ,  G06F12/06 ,  G06F13/16

CPC分类号： G06F12/04 ,  G06F12/0607 ,  G06F13/1647

摘要： A memory access control system has a main memory having a plurality of memory banks divided into two groups, thus enabling parallel processing for data, a command/address bus line, a write data bus line, a read data bus line, and a device for simultaneously activating one request for access to the memory bank belonging to one group and another request for access to the memory bank belonging to the other group.

摘要翻译： 存储器访问控制系统具有主存储器，其具有分成两组的多个存储体，从而能够对数据进行并行处理，命令/地址总线，写数据总线，读数据总线和用于 同时激活访问属于一个组的存储体的一个请求以及访问属于另一个组的存储体的另一请求。