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公开(公告)号：US20120283937A1
公开(公告)日：2012-11-08
申请号：US13394416
申请日：2010-11-10
申请人： Takayoshi Kawamoto , Sumiaki Hazama , Takashi Ue , Tadao Ohwaki , Yusuke Nomura
发明人： Takayoshi Kawamoto , Sumiaki Hazama , Takashi Ue , Tadao Ohwaki , Yusuke Nomura
IPC分类号： F02N11/08
CPC分类号： F02N11/0822 , F02N2200/101 , Y02T10/48
摘要： An apparatus includes a first switch turned ON in response to depression of a pedal, and OFF in response to depression being released; a second switch that assumes a first state in response to depression of the pedal, and a second state in response to pedal release; and a control unit that determines whether the first switch is in the first state. The control unit starts the engine, if in the first state and if the engine start switch is operated.
摘要翻译： 一种装置包括响应于踏板的按压而导通的第一开关，以及响应于释放的凹陷的OFF; 第二开关，其响应于踏板的按压而呈现第一状态，响应于踏板释放而呈现第二状态; 以及控制单元，其确定所述第一开关是否处于所述第一状态。 如果处于第一状态并且发动机启动开关被操作，则控制单元启动发动机。
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公开(公告)号：US20120116657A1
公开(公告)日：2012-05-10
申请号：US13292514
申请日：2011-11-09
申请人： Takayoshi KAWAMOTO
发明人： Takayoshi KAWAMOTO
IPC分类号： F02D28/00
CPC分类号： F02N11/0803 , F02N11/06 , F02N11/0822 , F02N11/0862 , F02N2200/0801 , F02N2200/0802 , F02N2200/0803 , F02N2200/0815 , F02N2200/10 , F02N2200/102 , Y02T10/48
摘要： A vehicle control unit includes an engine switch, an idling stop controller and a power supply controller. When the engine switch is depressed in a state where the engine is automatically stopped by the idling stop controller, the idling stop controller restarts the engine in a case where a relationship between an operating time during which the engine switch is depressed and a predetermined reference time satisfies a predetermined condition, and the power supply controller switches a power supply mode in a case where the relationship between the operating time and the reference time does not satisfy the predetermined condition.
摘要翻译： 车辆控制单元包括发动机开关，怠速停止控制器和电源控制器。 在发动机由怠速停止控制器自动停止的状态下，当发动机开关被按压时，怠速停止控制器在发动机开关被压下的动作时间与规定的基准时间之间的关系的情况下重新起动发动机 满足预定条件，并且在操作时间和基准时间之间的关系不满足预定条件的情况下，电源控制器切换供电模式。
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公开(公告)号：US08855897B2
公开(公告)日：2014-10-07
申请号：US13394416
申请日：2010-11-10
申请人： Takayoshi Kawamoto , Sumiaki Hazama , Takashi Ue , Tadao Ohwaki , Yusuke Nomura
发明人： Takayoshi Kawamoto , Sumiaki Hazama , Takashi Ue , Tadao Ohwaki , Yusuke Nomura
CPC分类号： F02N11/0822 , F02N2200/101 , Y02T10/48
摘要： An apparatus includes a first switch turned ON in response to depression of a pedal, and OFF in response to depression being released; a second switch that assumes a first state in response to depression of the pedal, and a second state in response to pedal release; and a control unit that determines whether the first switch is in the first state. The control unit starts the engine, if in the first state and if the engine start switch is operated.
摘要翻译： 一种装置包括响应于踏板的按压而导通的第一开关，以及响应于释放的凹陷的OFF; 第二开关，其响应于踏板的按压而呈现第一状态，响应于踏板释放而呈现第二状态; 以及控制单元，其确定所述第一开关是否处于所述第一状态。 如果处于第一状态并且发动机启动开关被操作，则控制单元启动发动机。
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公开(公告)号：US06364752B1
公开(公告)日：2002-04-02
申请号：US08881616
申请日：1997-06-25
申请人： Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
发明人： Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
IPC分类号： B24B722
CPC分类号： B24B53/017 , B24B37/005 , B24B49/00
摘要： A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof, determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser against the polishing cloth while the turntable and the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.
摘要翻译： 通过使修整器与抛光布接触来修整安装在转台上的抛光布，以恢复抛光布的抛光能力。 通过在抛光布的径向方向的径向位置处测量抛光布的表面的高度来进行修整，根据测量的高度确定修整器相对于转盘的旋转速度的转速 并且在转台和修整器旋转的同时通过将修整器压靠抛光布来修整抛光布。 修整器具有环形金刚石颗粒层或环形SiC层。
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公开(公告)号：US5651724A
公开(公告)日：1997-07-29
申请号：US524824
申请日：1995-09-07
申请人： Norio Kimura , Takayoshi Kawamoto , You Ishii , Katsuyuki Aoki , Kunio Tateishi , Hozumi Yasuda , Keisuke Namiki
发明人： Norio Kimura , Takayoshi Kawamoto , You Ishii , Katsuyuki Aoki , Kunio Tateishi , Hozumi Yasuda , Keisuke Namiki
CPC分类号： B24B37/30
摘要： A predetermined amount of liquid such as water is supplied to a backside surface of a workpiece such as a semiconductor wafer. Such liquid is a workpiece retaining liquid and is attached to a concave workpiece holding surface of a top ring. The workpiece is positioned between a turntable and the top ring and is polished by an abrasive cloth on the turntable while the workpiece is being pressed against the turntable by the top ring. While polishing, the workpiece is deformed toward the concave workpiece holding surface of the top ring, and a curvature of the deformed workpiece is controlled by the amount of liquid between the workpiece holding surface and the backside surface of the workpiece.
摘要翻译： 将诸如水的预定量的液体供应到诸如半导体晶片的工件的背面。 这种液体是工件保持液体，并且附接到顶环的凹入的工件保持表面。 工件位于转盘和顶环之间，并通过研磨布在转台上抛光，同时工件被顶环压在转台上。 在抛光时，工件朝着顶环的凹入工件保持面变形，并且变形的工件的曲率由工件保持面与工件的背面之间的液体量控制。
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公开(公告)号：US06406364B1
公开(公告)日：2002-06-18
申请号：US09355895
申请日：1999-10-25
申请人： Norio Kimura , Hirokuni Hiyama , Yutaka Wada , Kiyotaka Kawashima , Manabu Tsujimura , Takayoshi Kawamoto
发明人： Norio Kimura , Hirokuni Hiyama , Yutaka Wada , Kiyotaka Kawashima , Manabu Tsujimura , Takayoshi Kawamoto
IPC分类号： B24B5700
CPC分类号： B24B37/04 , B24B57/02 , Y10S451/91
摘要： The object of the present invention is to provide a polishing apparatus that can supply a polishing solution having a non-varying distribution of abrading particles sizes at a steady rate. An apparatus (20) for delivering a polishing solution to a polishing apparatus (22) is disclosed. The apparatus (20) comprises: a solution passage for transporting the polishing solution; and an ultrasonic vibrator (72) being provided in at least one location of the solution passage.
摘要翻译： 本发明的目的是提供一种抛光装置，其能够以稳定的速度供给研磨粒子尺寸不变的抛光液。 公开了一种用于将抛光溶液输送到抛光装置（22）的装置（20）。 装置（20）包括：用于输送抛光溶液的溶液通道; 和超声波振动器（72）设置在溶液通道的至少一个位置。
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公开(公告)号：US08798894B2
公开(公告)日：2014-08-05
申请号：US13292514
申请日：2011-11-09
申请人： Takayoshi Kawamoto
发明人： Takayoshi Kawamoto
IPC分类号： F02D28/00
CPC分类号： F02N11/0803 , F02N11/06 , F02N11/0822 , F02N11/0862 , F02N2200/0801 , F02N2200/0802 , F02N2200/0803 , F02N2200/0815 , F02N2200/10 , F02N2200/102 , Y02T10/48
摘要： A vehicle control unit includes an engine switch, an idling stop controller and a power supply controller. When the engine switch is depressed in a state where the engine is automatically stopped by the idling stop controller, the idling stop controller restarts the engine in a case where a relationship between an operating time during which the engine switch is depressed and a predetermined reference time satisfies a predetermined condition, and the power supply controller switches a power supply mode in a case where the relationship between the operating time and the reference time does not satisfy the predetermined condition.
摘要翻译： 车辆控制单元包括发动机开关，怠速停止控制器和电源控制器。 在发动机由怠速停止控制器自动停止的状态下，当发动机开关被按压时，怠速停止控制器在发动机开关被压下的动作时间与规定的基准时间之间的关系的情况下重新起动发动机 满足预定条件，并且在操作时间和基准时间之间的关系不满足预定条件的情况下，电源控制器切换供电模式。
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公开(公告)号：US06423205B1
公开(公告)日：2002-07-23
申请号：US09646958
申请日：2000-10-27
申请人： Masaji Akahori , Takayoshi Kawamoto , Syu Nakanishi , Shinzi Miura , Toru Akiyama , Takayuki Saito , Kunio Fujiwara , Satoshi Konishi
发明人： Masaji Akahori , Takayoshi Kawamoto , Syu Nakanishi , Shinzi Miura , Toru Akiyama , Takayuki Saito , Kunio Fujiwara , Satoshi Konishi
IPC分类号： C02F140
CPC分类号： C02F1/4695 , B01D61/48 , B01J47/08 , C02F2201/46115 , C02F2201/46185 , Y02A20/134
摘要： The object of this invention is to provide an electrical deionization apparatus with which various feed water types ranging from water of high ion concentration to water of low ion concentration can be consistently deionized with high efficiency. At least part of cation-exchange membranes and anion-exchange membranes alternate between electrodes to form an alternating array of deionization and concentration compartments and the deionization compartment contains a woven or non-woven fabric made of cation-exchange fiber that is placed on the cation-exchange membrane side in a face-to-face relationship with a woven or non-woven fabric made of anion-exchange fiber that is placed on the anion-exchange membrane side, with the passageway of feed water between the two woven or non-woven fabrics containing an ion-conducting spacer provided with an ion-exchanging capability.
摘要翻译： 本发明的目的是提供一种电去离子装置，其具有从高离子浓度的水到低离子浓度的水的各种给水类型能够以高效率一致地去离子。 阳离子交换膜和阴离子交换膜的至少一部分在电极之间交替形成去离子和浓缩隔室的交替排列，去离子室包含由放置在阳离子上的阳离子交换纤维制成的织造或非织造织物 - 与由阴离子交换纤维制成的织造或非织造织物的面对面关系的交换膜侧，所述织物或非织造织物放置在阴离子交换膜侧，进料水在两个织造或非织造织物之间的通道， 含有具有离子交换能力的离子导电间隔物的无纺织物。
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公开(公告)号：US06416384B1
公开(公告)日：2002-07-09
申请号：US09126088
申请日：1998-07-30
IPC分类号： B24B4900
CPC分类号： H01L21/02024 , B24B37/015
摘要： A polishing apparatus can improve the uniformity of thickness within a workpiece or reduce thickness variation between serially polished workpieces. The polishing apparatus comprises a polishing unit having a polishing tool for providing a polishing surface and a workpiece holding device for holding the workpiece. A polishing solution or liquid supplying device is provided for supplying a polishing solution or liquid into a polishing interface between the surface of the workpiece and the polishing surface. A temperature of the polishing interface is controlled according to at least an ambient temperature of a polishing space surrounding the polishing unit, as a variable parameter.
摘要翻译： 抛光装置可以改善工件内的厚度均匀性或减少连续抛光的工件之间的厚度变化。 抛光装置包括具有用于提供抛光表面的抛光工具和用于保持工件的工件保持装置的抛光单元。 提供抛光溶液或液体供应装置，用于将抛光溶液或液体供应到工件表面和抛光表面之间的抛光界面。 作为可变参数，抛光界面的温度根据抛光单元周围的抛光空间的至少环境温度进行控制。
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公开(公告)号：US06905400B2
公开(公告)日：2005-06-14
申请号：US10060366
申请日：2002-02-01
申请人： Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
发明人： Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
CPC分类号： B24B53/017 , B24B37/005 , B24B49/00
摘要： A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.
摘要翻译： 通过使修整器与抛光布接触来修整安装在转台上的抛光布，以恢复抛光布的抛光能力。 通过在抛光布的径向位置处测量抛光布的表面的高度来确定修整器相对于转盘的转速基于测量的高度的转速来进行修整， 并且通过按下梳妆台来修整抛光布正在旋转。 修整器具有环形金刚石颗粒层或环形SiC层。
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