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公开(公告)号：US20210096468A1
公开(公告)日：2021-04-01
申请号：US17120506
申请日：2020-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus DE SCHIFFART , Michael Jozef Mathijs RENKENS , Gerard VAN SCHOTHORST , Andre Bernardus JEUNINK , Gregor Edward VAN BAARS , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN , Norbert Erwin Therenzo JANSEN , Toon HARDEMAN , George Arie Jan DE FOCKERT , Johan Frederik DIJKSMAN
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US20200183288A1
公开(公告)日：2020-06-11
申请号：US16638790
申请日：2018-07-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Yang-Shan HUANG , Andre Bernardus JEUNINK , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Victoria VORONINA
IPC: G03F7/20
Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool includes a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.
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3.发明公开公开(公告)号：US20230260820A1
公开(公告)日：2023-08-17
申请号：US18305925
申请日：2023-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robby Franciscus Josephus MARTENS , Youssef Karel Maria DE VOS , Ringo Petrus Cornelis VAN DORST , Gerhard Albert TEN BRINKE , Dirk Jerome Andre SENDEN , Coen Hubertus Matheus BALTIS , Justin Johannes Hermanus GERRITZEN , Jelmer Mattheüs KAMMINGA , Evelyn Wallis PACITTI , Thomas POIESZ , Arie Cornelis SCHEIBERLICH , Bert Dirk SCHOLTEN , André SCHREUDER , Abraham Alexander SOETHOUDT , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER
IPC: H01L21/683 , G03F7/00 , H01L21/687 , B25B11/00
CPC classification number: H01L21/6838 , G03F7/707 , G03F7/70733 , H01L21/68742 , B25B11/005
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US20180088468A1
公开(公告)日：2018-03-29
申请号：US15828523
申请日：2017-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus DE SCHIFFART , Michael Jozef Mathijs RENKENS , Gerard VAN SCHOTHORST , Andre Bernardus JEUNINK , Gregor Edward VAN BAARS , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN , Norbert Erwin Therenzo JANSEN , Toon HARDEMAN , George Arie Jan DE FOCKERT , Johan Frederik DIJKSMAN
CPC classification number: G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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5.发明申请公开(公告)号：US20170200638A1
公开(公告)日：2017-07-13
申请号：US15313515
申请日：2015-05-13
Applicant: ASML Netherlands B.V.
Inventor： Sander Frederik WUISTER , Andre Bernardus JEUNINK , Emiel PEETERS
IPC: H01L21/768 , C30B1/04 , C30B29/58 , G03F7/20 , G03F7/30
CPC classification number: H01L21/76816 , B81C1/00031 , B81C1/00396 , B81C2201/0149 , C09K13/00 , C30B1/04 , C30B29/58 , G03F7/0002 , G03F7/0041 , G03F7/2004 , G03F7/3021 , G03F7/70375 , H01L21/0271 , H01L21/3083 , H01L21/76829
Abstract: A method of forming at least one lithography feature, the method including: providing at least one lithography recess on a substrate, the or each lithography recess having at least one side-wall and a base, with the at least one side-wall having a width between portions thereof; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer including at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features of the second domain within the or each lithography recess.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190043749A1
公开(公告)日：2019-02-07
申请号：US16075754
申请日：2016-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Robby Franciscus Josephus MARTENS , Youssef Karel Maria DE VOS , Ringo Petrus Cornelis VAN DORST , Gerhard Albert TEN BRINKE , Dirk Jerome Andre SENDEN , Coen Hubertus Matheus BALTIS , Justin Johannes Hermanus GERRITZEN , Jelmer Mattheüs KAMMINGA , Evelyn Wallis PACITTI , Thomas POIESZ , Arie Cornelis SCHEIBERLICH , Bert Dirk SCHOLTEN , André SCHREUDER , Abraham Alexander SOETHOUDT , Siegfried Alexander TROMP , Yuri Johannes Gabriël VAN DE VIJVER
IPC: H01L21/683 , G03F7/20 , H01L21/687 , B25B11/00
Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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7.发明申请STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING AN OBJECT TABLE 有权阶段装置，平面设备和定位对象表的方法公开(公告)号：US20160223917A1
公开(公告)日：2016-08-04
申请号：US15077439
申请日：2016-03-22
Applicant: ASML NETHERLANDS B.V
Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH , Andre Bernardus JEUNINK , Robbert Edgar VAN LEEUWEN , Emiel Jozef Melanie EUSSEN
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70775 , G03F7/7085
Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
Abstract translation: 一种测量系统，被配置为测量对象台的与位置相关的信号，所述测量系统包括可安装在所述对象台上的至少一个传感器和可安装在基本上固定的框架上的传感器目标对象;以及安装装置，其被配置为安装所述传感器目标 物体在基本上固定的框架上，其中测量系统还包括补偿器，其被配置为补偿传感器目标物体相对于基本上固定的框架的运动和/或变形。 补偿器可以包括无源或主动阻尼器和/或反馈位置控制器。 在替代实施例中，补偿器包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。
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公开(公告)号：US20230400783A1
公开(公告)日：2023-12-14
申请号：US18027343
申请日：2021-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Michael Marinus Anna STEUR , Bas JANSEN , Andre Bernardus JEUNINK , Johannes Adrianus Cornelis Maria PIJNENBURG
IPC: G03F7/00
CPC classification number: G03F7/70716
Abstract: An object table including: a holding surface for holding an object; and an actuator arrangement configured to exert a holding force on the object for holding the object to the holding surface, wherein the actuator arrangement is further configured to decrease a strain in the object caused by the holding force by sequentially detaching and re-attaching portions of the object from the holding surface, while the object is held to the holding surface.
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公开(公告)号：US20200117097A1
公开(公告)日：2020-04-16
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US20160377997A1
公开(公告)日：2016-12-29
申请号：US15258903
申请日：2016-09-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey DEN BOEF , Andre Bernardus JEUNINK , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
Abstract translation: 公开了一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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